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Extract from the Register of European Patents

EP About this file: EP1127900

EP1127900 - Polymer and photoresist compositions [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  03.03.2006
Database last updated on 05.10.2024
Most recent event   Tooltip13.11.2009Change - representativepublished on 16.12.2009  [2009/51]
Applicant(s)For all designated states
Shipley Company LLC
455 Forest Street
Marlborough, MA 01752 / US
[2001/35]
Inventor(s)01 / Szmanda, Charles R.
4 Crossman Avenue
Westborough, Massachusetts 01581 / US
02 / Barclay, George G.
1566 Main Street
Jefferson, Massachusetts 01522 / US
03 / Trefonas, Peter
40 Summerhill Road
Medway, Massachusetts 02053 / US
04 / Yueh, Wang
22 Farmington Drive
Shrewsbury, Massachusetts 01545 / US
 [2001/35]
Representative(s)Kent, Venetia Katherine
Patent Outsourcing Limited 1 King Street Bakewell
Derbyshire DE45 1DZ / GB
[N/P]
Former [2009/51]Kent, Venetia Katherine
Patent Outsourcing Limited 1 King Street Bakewell
Derbyshire DE 45 1DZ / GB
Former [2001/35]Kent, Venetia Katherine
Rohm and Haas (UK) Ltd European Operations Patent Dept. Lennig House 2 Mason's Avenue
Croydon, CR9 3NB / GB
Application number, filing date01301598.722.02.2001
[2001/35]
Priority number, dateUS2000051172624.02.2000         Original published format: US 511726
[2001/35]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1127900
Date:29.08.2001
Language:EN
[2001/35]
Type: B1 Patent specification 
No.:EP1127900
Date:27.04.2005
Language:EN
[2005/17]
Search report(s)(Supplementary) European search report - dispatched on:EP26.06.2001
ClassificationIPC:C08F32/08, G03F7/039, G03F7/004
[2001/35]
CPC:
G03F7/0395 (EP,US); C08F10/00 (KR); C08F32/08 (EP,US);
G03F7/0045 (EP,US); G03F7/039 (EP,US); G03F7/0397 (EP,US);
Y10S430/108 (EP,US) (-)
Designated contracting statesDE,   FR,   GB,   IE,   IT,   NL [2002/21]
Former [2001/35]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Polymer und Photoresistzusammensetzungen[2001/35]
English:Polymer and photoresist compositions[2001/35]
French:Polymère et compositions pour photoréserves[2001/35]
Examination procedure03.03.2001Examination requested  [2001/35]
12.08.2004Communication of intention to grant the patent
10.01.2005Fee for grant paid
10.01.2005Fee for publishing/printing paid
Opposition(s)30.01.2006No opposition filed within time limit [2006/16]
Fees paidRenewal fee
25.02.2003Renewal fee patent year 03
23.02.2004Renewal fee patent year 04
22.02.2005Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipIT27.04.2005
NL27.04.2005
[2007/36]
Former [2006/22]NL27.04.2005
Documents cited:Search[A]EP0492982  (NIPPON ZEON CO [JP]);
 [DA]WO9942510  (GOODRICH CO B F [US])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.