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Extract from the Register of European Patents

EP About this file: EP1176021

EP1176021 - Printing system that utilizes print masks with resolutions that are non-integral multiples of each other [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  27.10.2006
Database last updated on 24.08.2024
Most recent event   Tooltip13.11.2009Change - representativepublished on 16.12.2009  [2009/51]
Applicant(s)For all designated states
Hewlett-Packard Company
3000 Hanover Street
Palo Alto, CA 94304-1112 / US
[N/P]
Former [2008/38]For all designated states
Hewlett-Packard Company
3000 Hanover Street
Palo Alto CA 94304-1112 / US
Former [2002/05]For all designated states
Hewlett-Packard Company
3000 Hanover Street
Palo Alto, CA 94304 / US
Inventor(s)01 / Askeland, Ronald A.
11371 Penanova Street
San Diego, CA 92129 / US
02 / Wykoff, Chris
17696 Corazon Place
San Diego, CA 92127 / US
03 / Osborne, William S.
9721 NE Livingston MT CT
Camas, WA 98607 / US
 [2002/05]
Representative(s)Jackson, Richard Eric, et al
Carpmaels & Ransford LLP
One Southampton Row
London WC1B 5HA / GB
[N/P]
Former [2009/51]Jackson, Richard Eric, et al
Carpmaels & Ransford 43-45 Bloomsbury Square
London WC1A 2RA / GB
Former [2002/05]Jackson, Richard Eric, et al
Carpmaels & Ransford, 43 Bloomsbury Square
London WC1A 2RA / GB
Application number, filing date01305542.126.06.2001
[2002/05]
Priority number, dateUS2000062812128.07.2000         Original published format: US 628121
[2002/05]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1176021
Date:30.01.2002
Language:EN
[2002/05]
Type: B1 Patent specification 
No.:EP1176021
Date:21.12.2005
Language:EN
[2005/51]
Search report(s)(Supplementary) European search report - dispatched on:EP14.11.2001
ClassificationIPC:B41J2/21, B41J2/505, G06K15/10
[2002/05]
CPC:
B41J2/5058 (EP,US); B41J2/2132 (EP,US); G06K15/107 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [2002/42]
Former [2002/05]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Druckanordnung die Maskenmuster verwendet mit Auflösungen, die nicht ganzzahlige Vielfache voneinander sind[2002/05]
English:Printing system that utilizes print masks with resolutions that are non-integral multiples of each other[2002/05]
French:Système d'impression utilisant des masques d'impression à résolutions qui sont des multiples non-entiers l'une par rapport à l'autre[2002/05]
Examination procedure23.01.2002Examination requested  [2002/14]
07.04.2004Despatch of a communication from the examining division (Time limit: M04)
12.08.2004Reply to a communication from the examining division
08.07.2005Communication of intention to grant the patent
12.09.2005Fee for grant paid
12.09.2005Fee for publishing/printing paid
Opposition(s)22.09.2006No opposition filed within time limit [2006/48]
Fees paidRenewal fee
23.06.2003Renewal fee patent year 03
23.06.2004Renewal fee patent year 04
21.06.2005Renewal fee patent year 05
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Documents cited:Search[XA]US5971524  (NICOLOFF JR NICHOLAS [US], et al) [X] 1-3,5-7,10 * column 4, line 64 - column 5, line 7 * * column 6, line 25 - line 44 * [A] 4,8,11
by applicantUS4490728
 US4313684
 US5648805
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.