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Extract from the Register of European Patents

EP About this file: EP1174770

EP1174770 - Lithographic apparatus [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  09.09.2016
Database last updated on 11.09.2024
Most recent event   Tooltip09.09.2016Refusal of applicationpublished on 12.10.2016  [2016/41]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/39]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2002/34]For all designated states
ASML Netherlands B.V.
De Run 1110
5503 LA Veldhoven / NL
Former [2002/04]For all designated states
ASM LITHOGRAPHY B.V.
De Run 1110
5503 LA Veldhoven / NL
Inventor(s)01 / Van Dijsseldonk, Antonius Johannes Josephus
Venbroek 22
5527 BH Hapert / NL
02 / Loopstra, Erik Roelof
Atlas 7
5591 PJ Heeze / NL
03 / Franken, Dominicus Jacobus Petrus Adrianus
Schouwberg 5
5508 JA Veldhoven / NL
 [2002/04]
Representative(s)Slenders, Petrus Johannes Waltherus, et al
ASML Netherlands B.V.
Corporate Intellectual Property
De Run 6501
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2009/23]Slenders, Petrus J. W., et al
ASML Netherlands B.V Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2009/09]Van den Hooven, Jan, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2002/04]Leeming, John Gerard
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5LX / GB
Application number, filing date01305989.411.07.2001
[2002/04]
Priority number, dateEP2000030595813.07.2000         Original published format: EP 00305958
[2002/04]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1174770
Date:23.01.2002
Language:EN
[2002/04]
Type: A3 Search report 
No.:EP1174770
Date:19.05.2004
[2004/21]
Search report(s)(Supplementary) European search report - dispatched on:EP01.04.2004
ClassificationIPC:G03F7/20, G02B26/08, G02B17/08, G02B27/00
[2004/21]
CPC:
G03F7/70141 (EP); G02B26/0825 (EP); G02B7/185 (EP);
G03F7/70258 (EP); G03F7/70266 (EP)
Former IPC [2002/04]G03F7/20, G02B7/185, G02B26/08
Designated contracting statesDE,   FR,   GB,   IT,   NL [2005/06]
Former [2002/04]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Lithographischer Apparat[2002/04]
English:Lithographic apparatus[2002/04]
French:Appareil lithographique[2002/04]
Examination procedure07.09.2004Examination requested  [2004/45]
22.12.2004Despatch of a communication from the examining division (Time limit: M04)
07.04.2005Reply to a communication from the examining division
20.07.2005Despatch of a communication from the examining division (Time limit: M06)
16.01.2006Reply to a communication from the examining division
22.09.2006Application refused, date of legal effect [2016/41]
22.09.2006Date of oral proceedings
11.10.2006Despatch of communication that the application is refused, reason: substantive examination [2016/41]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  22.12.2004
Fees paidRenewal fee
16.10.2003Renewal fee patent year 03
30.06.2004Renewal fee patent year 04
14.07.2005Renewal fee patent year 05
13.07.2006Renewal fee patent year 06
28.07.2007Renewal fee patent year 07
15.07.2008Renewal fee patent year 08
20.07.2009Renewal fee patent year 09
27.07.2010Renewal fee patent year 10
25.07.2011Renewal fee patent year 11
23.07.2012Renewal fee patent year 12
22.07.2013Renewal fee patent year 13
23.07.2014Renewal fee patent year 14
23.07.2015Renewal fee patent year 15
22.07.2016Renewal fee patent year 16
Penalty fee
Additional fee for renewal fee
31.07.200303   M06   Fee paid on   16.10.2003
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Documents cited:Search[X]EP0961149  (ZEISS CARL [DE], et al) [X] 1,21,22 * abstract * * paragraphs [0018] - [0020] - [0036] * * claims 1,5,7 * * figure 1 *;
 [XDA]US5986795  (CHAPMAN HENRY N [US], et al) [XD] 22 * the whole document * [A] 1-21;
 [XDA]US5420436  (SEYA EIICHI [JP], et al) [XD] 22 * the whole document * [A] 1-21
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.