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EP1205574
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EP About this file: EP1205574
| EP1205574 - Atomic layer deposition of Ta205 and high-K dielectrics [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 07.02.2003 Database last updated on 02.11.2024 | Most recent event Tooltip | 07.02.2003 | Withdrawal of application | published on 26.03.2003 [2003/13] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, CA 95054 / US | [N/P] |
| Former [2002/20] | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, California 95054 / US | Inventor(s) | 01 /
Ravi, Jallepally 1655 Betty Court Santa Clara, CA 95051 / US | 02 /
Duboust, Alain 668 Bryan Avenue Sunnyvale, CA 94086 / US | 03 /
Li, Shih-Hung 998 Nr. A La Mesa Terrace Sunnyvale, CA 94086 / US | 04 /
Song, Kevin 2981 Nieman Blvd. Nr. 326 San Jose, CA 95148 / US | 05 /
Majewski, Robert B. 375 Clifford Avenue Nr. 120 Watsonville, CA 95076 / US | 06 /
Chen, Liang-Yuh 1400 Melbourne Street Foster City, CA 94404 / US | 07 /
Carl, Daniel A. 2161 Promezia Court Pleasanton, CA 94566 / US | [2002/28] |
| Former [2002/20] | 01 /
Ravi, Jallepally 3707 Poinciana Drive, Apt. Nr. 50 Santa Clara, CA 95051 / US | ||
| 02 /
Duboust, Alain 668 Bryan Avenue Sunnyvale, CA 94086 / US | |||
| 03 /
Li, Shih-Hung 998 Nr. A La Mesa Terrace Sunnyvale, CA 94086 / US | |||
| 04 /
Song, Kevin 2981 Nieman Blvd. Nr. 326 San Jose, CA 95148 / US | |||
| 05 /
Majewski, Robert B. 375 Clifford Avenue Nr. 120 Watsonville, CA 95076 / US | |||
| 06 /
Chen, Liang-Yuh 1400 Melbourne Street Foster City, CA 94404 / US | |||
| 07 /
Carl, Daniel A. 2161 Promezia Court Pleasanton, CA 94566 / US | Representative(s) | Setna, Rohan P., et al Boult Wade Tennant Verulam Gardens 70 Gray's Inn Road London WC1X 8BT / GB | [N/P] |
| Former [2002/20] | Setna, Rohan P., et al Boult Wade Tennant Verulam Gardens 70 Gray's Inn Road London WC1X 8BT / GB | Application number, filing date | 01309503.9 | 09.11.2001 | [2002/20] | Priority number, date | US20000712633 | 13.11.2000 Original published format: US 712633 | [2002/20] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1205574 | Date: | 15.05.2002 | Language: | EN | [2002/20] | Classification | IPC: | C23C16/40, H01L21/316 | [2002/20] | CPC: |
C23C16/308 (EP);
H01L21/20 (KR);
H01L21/0228 (EP,KR,US);
C23C16/40 (EP);
C23C16/405 (EP);
C23C16/45531 (EP);
| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR [2002/20] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | Abscheidung von Atomschichten aus Ta2O5 und aus Dielektrika mit hohem K-Wert | [2002/20] | English: | Atomic layer deposition of Ta205 and high-K dielectrics | [2002/20] | French: | Dépot de couches atomiques de Ta2O5 et de diélectriques à coefficient K élevé | [2002/20] | Examination procedure | 28.01.2003 | Application withdrawn by applicant [2003/13] |
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