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EP1219729
European procedure
Extract from the Register of European Patents
EP About this file: EP1219729
| EP1219729 - Electrolytic copper plating solution and method for controlling the same [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 23.11.2012 Database last updated on 24.08.2024 | Most recent event Tooltip | 23.11.2012 | No opposition filed within time limit | published on 26.12.2012 [2012/52] | Applicant(s) | For all designated states Rohm and Haas Electronic Materials LLC 455 Forest Street Marlborough, MA 01752 / US | [2012/16] |
| Former [2002/27] | For all designated states Shipley Co. L.L.C. 455 Forest Street Marlborough, MA 01752 / US | Inventor(s) | 01 /
Seita, Masaru 3-169-5, Sakae, Inamachi Kitaadachi-gun, Saitama, 362-0805 / JP | 02 /
Tsuchida, Hideki 15-26, Minuma-cho Hasuda-shi, Saitama 349-0127 / JP | 03 /
Hayashi, Shinjiro Dormitory of Meltex, 350-10, Oowada-cho 1-chome Saitama-shi, Saitama 330-0023 / JP | [2002/27] | Representative(s) | Kent, Venetia Katherine Patent Outsourcing Limited 1 King Street Bakewell Derbyshire DE45 1DZ / GB | [2012/03] |
| Former [2009/51] | Kent, Venetia Katherine Patent Outsourcing Limited 1 King Street Bakewell Derbyshire DE 45 1DZ / GB | ||
| Former [2002/27] | Kent, Venetia Katherine Rohm and Haas (UK) Ltd European Operations Patent Dept. Lennig House 2 Mason's Avenue Croydon, CR9 3NB / GB | Application number, filing date | 01310721.4 | 20.12.2001 | [2002/27] | Priority number, date | JP20000387865 | 20.12.2000 Original published format: JP 2000387865 | [2002/27] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1219729 | Date: | 03.07.2002 | Language: | EN | [2002/27] | Type: | B1 Patent specification | No.: | EP1219729 | Date: | 18.01.2012 | Language: | EN | [2012/03] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 10.05.2002 | Classification | IPC: | C25D3/38, C25D5/56, C25D7/12 | [2002/27] | CPC: |
C25D3/38 (EP,US);
C25D3/02 (KR);
C25D7/123 (EP,KR,US);
H05K3/423 (EP,US)
| Designated contracting states | DE, FR, GB, IT [2003/13] |
| Former [2002/27] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Lösung zur elektrolytischen Kupfer-Abscheidung und Verfahren zu deren Kontrolle | [2002/27] | English: | Electrolytic copper plating solution and method for controlling the same | [2002/27] | French: | Solution de placage électrolytique de cuivre et méthode de contrôle de ladite solution | [2002/27] | Examination procedure | 15.01.2002 | Examination requested [2002/27] | 04.08.2003 | Despatch of a communication from the examining division (Time limit: M06) | 12.01.2004 | Reply to a communication from the examining division | 10.10.2007 | Despatch of a communication from the examining division (Time limit: M04) | 14.02.2008 | Reply to a communication from the examining division | 31.03.2011 | Despatch of a communication from the examining division (Time limit: M04) | 27.04.2011 | Reply to a communication from the examining division | 20.07.2011 | Communication of intention to grant the patent | 04.11.2011 | Fee for grant paid | 04.11.2011 | Fee for publishing/printing paid | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 04.08.2003 | Opposition(s) | 19.10.2012 | No opposition filed within time limit [2012/52] | Fees paid | Renewal fee | 29.12.2003 | Renewal fee patent year 03 | 23.12.2004 | Renewal fee patent year 04 | 27.12.2005 | Renewal fee patent year 05 | 27.12.2006 | Renewal fee patent year 06 | 24.12.2007 | Renewal fee patent year 07 | 24.12.2008 | Renewal fee patent year 08 | 28.12.2009 | Renewal fee patent year 09 | 15.12.2010 | Renewal fee patent year 10 | 12.12.2011 | Renewal fee patent year 11 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US3798138 (OSTROW B, et al) [X] 1-6,9-12 * column 1, line 15 - column 3, line 6 * * claims 1-4,13,14 *; | US4014760 [ ] (KARDOS OTTO, et al); | [X]US4036711 (KARDOS OTTO, et al) [X] 1-12 * abstract * * column 1, lines 57-65 * * column 3, line 10 - column 6, line 55 * * column 7, lines 6-23 *; | [X]US4134803 (ECKLES WILLIAM E, et al) [X] 1-6,9-12 * column 2, line 61 - column 3, line 60 *; | [X]US4347108 (WILLIS WILLIAM J) [X] 1-6,9-12 * claims 1-6,14,17 * * column 2, line 36 - column 3, line 48 *; | [A]DE3240643 (LPW CHEMIE GMBH [DE]) [A] 1,8* abstract *; | [X]US5151170 (MONTGOMERY EDA R [US], et al) [X] 1-7,9-12 * columns 1-2 * * examples 1-3 * | by applicant | US3798138 | US4036711 | US4134803 | US4347108 | DE3240643 | US5151170 |