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EP1306464
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EP Citations: EP1306464
| Cited in | Search | Type: | Patent literature | Publication No.: | EP0822585
[XY] (APPLIED MATERIALS INC [US]) [X] 1-5 * page 8, line 21 - page 9, line 15; figure 3; table 1 * * page 9, line 35 - page 10, line 9; figure 5 * * page 10, lines 17-21 * [Y] 6; | Type: | Patent literature | Publication No.: | GB2325938
[XY] (NEC CORP [JP]) [X] 1-4 * page 6, lines 5-13,24-28 * * page 13, line 13 - page 15, line 17; figure 1 * * page 20, line 11 - page 22, line 11 * [Y] 6; | Type: | Patent literature | Publication No.: | US5976973
[Y] (OHIRA KOICHIRO [JP], et al) [Y] 6 * column 1, lines 40-45 *; | Type: | Non-patent literature | Publication information: | [A] - ISHII K ET AL, "Effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, (19970201), vol. 81, no. 3, ISSN 0021-8979, page 1470, XP012041531 [A] 1-5 * the whole document * | DOI: | http://dx.doi.org/10.1063/1.363900 | Cited in | International search | Type: | Patent literature | Publication No.: | JPS63131542
[X] (KANSAI NIPPON ELECTRIC); | Type: | Patent literature | Publication No.: | JPH01232744
[X] (MATSUSHITA ELECTRONICS CORP); | Type: | Patent literature | Publication No.: | JPH1187310
[X] (KOREA ELECTRONICS TELECOMM); | Type: | Non-patent literature | Publication information: | [Y] - KEISUKE ISHII ET AL., "Fusso tenka ga ECVD-SiO2 hakumaku no kouzou oyobi kougaku tokusei ni oyobosu eikyou", DENKI GAKAI YUUDEN ZETSUEN ZAIRYOU KENKYUUKAI SHIRYOU, (1996), pages 109 - 117, DEI-96-144, XP002947544 |