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EP1306464
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EP About this file: EP1306464
| EP1306464 - GRADED MATERIAL AND METHOD FOR SYNTHESIS THEREOF AND METHOD FOR PROCESSING THEREOF [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 12.06.2009 Database last updated on 19.10.2024 | Most recent event Tooltip | 12.06.2009 | Withdrawal of application | published on 15.07.2009 [2009/29] | Applicant(s) | For all designated states National Institute of Advanced Industrial Science and Technology 3-1, Kasumigaseki 1-chome, Chiyoda-ku Tokyo 100-0013 / JP | For all designated states Nippon Sheet Glass Co., Ltd. 7-28, Kitahama 4-chome, Chuo-ku Osaka-shi Osaka 541-0041 / JP | [N/P] |
| Former [2003/18] | For all designated states National Institute of Advanced Industrial Science and Technology 3-1, Kasumigaseki 1-chome, Chiyoda-ku Tokyo 100-0013 / JP | ||
| For all designated states Nippon Sheet Glass Co., Ltd. 7-28, Kitahama 4-chome, Chuo-ku Osaka-shi, Osaka 541-0041 / JP | Inventor(s) | 01 /
NISHII, Junji, Nat. Inst. of advanced Ind. science and Technology Kansai Sentah, 1-8-31, Midorigaoka Ikeda-shi, Osaka 563-0026 / JP | 02 /
KOYAMA, Tadashi Nippon Sheet Glass Co. Ltd. 7-28, Kitahama Chuo-ku Osaka-shi, Osaka 541-0041 / JP | 03 /
YAMAGUCHI, Jun Nippon Sheet Glass Co. Ltd. 7-28, Kitahama Chuo-ku Osaka-shi Osaka 541-0041 / JP | [2003/18] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [2003/18] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 01948029.2 | 16.07.2001 | [2003/18] | WO2001JP06138 | Priority number, date | JP20000216824 | 18.07.2000 Original published format: JP 2000216824 | [2003/18] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO0206560 | Date: | 24.01.2002 | Language: | EN | [2002/04] | Type: | A1 Application with search report | No.: | EP1306464 | Date: | 02.05.2003 | Language: | EN | The application published by WIPO in one of the EPO official languages on 24.01.2002 takes the place of the publication of the European patent application. | [2003/18] | Search report(s) | International search report - published on: | JP | 24.01.2002 | (Supplementary) European search report - dispatched on: | EP | 19.12.2007 | Classification | IPC: | H01L21/316, H01L21/308, H01L21/311, C23C16/40, C03C15/00 | [2008/03] | CPC: |
C23C16/56 (EP,US);
C03C15/00 (EP,US);
C03C17/245 (EP,US);
C03C17/3694 (EP,US);
C23C16/401 (EP,US);
H01L21/02131 (EP,US);
H01L21/02274 (EP,US);
H01L21/31629 (US);
C03C2217/213 (EP,US);
C03C2217/91 (EP,US);
C03C2218/152 (EP,US);
C03C2218/33 (EP,US);
H01L21/31111 (EP,US);
H01L21/31612 (US);
Y10T428/24355 (EP,US);
Y10T428/24942 (EP,US);
Y10T428/265 (EP,US);
Y10T428/31 (EP,US);
Y10T428/315 (EP,US)
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| Former IPC [2003/18] | C23C16/40, C03C15/00, H01L21/308 | Designated contracting states | BE, DE, FI, FR, GB [2004/22] |
| Former [2003/18] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | GRADUIERTES MATERIAL UND VERFAHREN ZU SEINER SYNTHESE UND VERFAHREN ZU SEINER VERARBEITUNG | [2003/18] | English: | GRADED MATERIAL AND METHOD FOR SYNTHESIS THEREOF AND METHOD FOR PROCESSING THEREOF | [2003/18] | French: | MATERIAU CALIBRE ET SES PROCEDES DE SYNTHESE ET DE TRAITEMENT | [2003/18] | Entry into regional phase | 17.01.2003 | Translation filed | 17.01.2003 | National basic fee paid | 17.01.2003 | Search fee paid | 17.01.2003 | Designation fee(s) paid | 17.01.2003 | Examination fee paid | Examination procedure | 19.12.2001 | Request for preliminary examination filed International Preliminary Examining Authority: JP | 17.01.2003 | Examination requested [2003/18] | 03.06.2009 | Application withdrawn by applicant [2009/29] | Fees paid | Renewal fee | 25.07.2003 | Renewal fee patent year 03 | 28.07.2004 | Renewal fee patent year 04 | 25.07.2005 | Renewal fee patent year 05 | 26.07.2006 | Renewal fee patent year 06 | 17.07.2007 | Renewal fee patent year 07 | 25.07.2008 | Renewal fee patent year 08 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY]EP0822585 (APPLIED MATERIALS INC [US]) [X] 1-5 * page 8, line 21 - page 9, line 15; figure 3; table 1 * * page 9, line 35 - page 10, line 9; figure 5 * * page 10, lines 17-21 * [Y] 6; | [XY]GB2325938 (NEC CORP [JP]) [X] 1-4 * page 6, lines 5-13,24-28 * * page 13, line 13 - page 15, line 17; figure 1 * * page 20, line 11 - page 22, line 11 * [Y] 6; | [Y]US5976973 (OHIRA KOICHIRO [JP], et al) [Y] 6 * column 1, lines 40-45 *; | [A] - ISHII K ET AL, "Effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, (19970201), vol. 81, no. 3, ISSN 0021-8979, page 1470, XP012041531 [A] 1-5 * the whole document * DOI: http://dx.doi.org/10.1063/1.363900 | International search | [X]JPS63131542 (KANSAI NIPPON ELECTRIC); | [X]JPH01232744 (MATSUSHITA ELECTRONICS CORP); | [X]JPH1187310 (KOREA ELECTRONICS TELECOMM); | [Y] - KEISUKE ISHII ET AL., "Fusso tenka ga ECVD-SiO2 hakumaku no kouzou oyobi kougaku tokusei ni oyobosu eikyou", DENKI GAKAI YUUDEN ZETSUEN ZAIRYOU KENKYUUKAI SHIRYOU, (1996), pages 109 - 117, DEI-96-144, XP002947544 |