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Extract from the Register of European Patents

EP About this file: EP1352109

EP1352109 - COMPOSITION FOR CHEMICAL MECHANICAL PLANARIZATION OF COPPER, TANTALUM AND TANTALUM NITRIDE [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  18.03.2005
Database last updated on 04.11.2024
Most recent event   Tooltip18.03.2005Application deemed to be withdrawnpublished on 04.05.2005  [2005/18]
Applicant(s)For all designated states
Honeywell International Inc.
101 Columbia Road
Morristown, NJ 07960 / US
[N/P]
Former [2003/42]For all designated states
Honeywell International Inc.
101 Columbia Road, P.O. Box 2245
Morristown, New Jersey 07960 / US
Inventor(s)01 / ZHANG, Fan
620 Sonia Way
Mountain View, CA 94040 / US
02 / TOWERY, Daniel
4998 Avenida De Los Arboles
Santa Clara, CA 95051 / US
03 / LEVERT, Joseph
1500 Shadowridge Rd., Apt. 90
Vista, CA 92083 / US
04 / MUKHERJEE, Shyama
2470 Pinto Court
Morgan Hill, CA 95037 / US
 [2003/42]
Representative(s)Hucker, Charlotte Jane
Gill Jennings & Every LLP The Broadgate Tower
20 Primrose Street
London
EC2A 2ES / GB
[N/P]
Former [2003/42]Hucker, Charlotte Jane
Gill Jennings & Every Broadgate House, 7 Eldon Street
London EC2M 7LH / GB
Application number, filing date01998054.918.12.2001
[2003/42]
WO2001US48867
Priority number, dateUS2000074526620.12.2000         Original published format: US 745266
[2003/42]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO02059393
Date:01.08.2002
Language:EN
[2002/31]
Type: A1 Application with search report 
No.:EP1352109
Date:15.10.2003
Language:EN
The application published by WIPO in one of the EPO official languages on 01.08.2002 takes the place of the publication of the European patent application.
[2003/42]
Search report(s)International search report - published on:EP01.08.2002
ClassificationIPC:C23F3/06, C09G1/02, H01L21/321
[2003/42]
CPC:
C09G1/02 (EP,US); C23F3/06 (EP,KR,US); C23F1/18 (EP,US);
C23F1/26 (EP); C23F3/04 (EP,US); H01L21/32115 (EP,US);
H01L21/3212 (EP,US); H01L21/32134 (EP,US) (-)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   TR [2003/42]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:ZUSAMMENSETZUNG FÜR DAS CHEMISCH-MECHANISCH PLANARISIEREN (CMP) VON KUPFER, TANTAL UND TANTAL NITRID[2003/42]
English:COMPOSITION FOR CHEMICAL MECHANICAL PLANARIZATION OF COPPER, TANTALUM AND TANTALUM NITRIDE[2003/42]
French:COMPOSITION FOR CHEMICAL MECHANICAL PLANARIZATION OF COPPER, TANTALUM AND TANTALUM NITRIDE[2003/42]
Entry into regional phase07.07.2003National basic fee paid 
07.07.2003Designation fee(s) paid 
07.07.2003Examination fee paid 
Examination procedure15.07.2002Request for preliminary examination filed
International Preliminary Examining Authority: EP
07.07.2003Examination requested  [2003/42]
17.06.2004Despatch of a communication from the examining division (Time limit: M04)
28.10.2004Application deemed to be withdrawn, date of legal effect  [2005/18]
03.12.2004Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2005/18]
Fees paidRenewal fee
07.07.2003Renewal fee patent year 03
Penalty fee
Additional fee for renewal fee
31.12.200404   M06   Not yet paid
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Cited inInternational search[X]WO0024842  (ARCH SPEC CHEM INC [US]) [X] 1,11-17 * claim - *;
 [X]US6063306  (KAUFMAN VLASTA BRUSIC [US], et al) [X] 1,11-17 * example 3; claim - *;
 [PX]WO0106555  (ALLIED SIGNAL INC [US]) [PX] 1,18,19 * claims 2-10 *;
 [PX]WO0194076  (HONEYWELL INT INC [US], et al) [PX] 1,2,11-19 * page 16, line 11 - page 32, line 29 *;
 [L]US2002020833  (ZHANG FAN [US], et al) [L] 1,2,11-19* the whole document *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.