EP1352109 - COMPOSITION FOR CHEMICAL MECHANICAL PLANARIZATION OF COPPER, TANTALUM AND TANTALUM NITRIDE [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 18.03.2005 Database last updated on 04.11.2024 | Most recent event Tooltip | 18.03.2005 | Application deemed to be withdrawn | published on 04.05.2005 [2005/18] | Applicant(s) | For all designated states Honeywell International Inc. 101 Columbia Road Morristown, NJ 07960 / US | [N/P] |
Former [2003/42] | For all designated states Honeywell International Inc. 101 Columbia Road, P.O. Box 2245 Morristown, New Jersey 07960 / US | Inventor(s) | 01 /
ZHANG, Fan 620 Sonia Way Mountain View, CA 94040 / US | 02 /
TOWERY, Daniel 4998 Avenida De Los Arboles Santa Clara, CA 95051 / US | 03 /
LEVERT, Joseph 1500 Shadowridge Rd., Apt. 90 Vista, CA 92083 / US | 04 /
MUKHERJEE, Shyama 2470 Pinto Court Morgan Hill, CA 95037 / US | [2003/42] | Representative(s) | Hucker, Charlotte Jane Gill Jennings & Every LLP The Broadgate Tower 20 Primrose Street London EC2A 2ES / GB | [N/P] |
Former [2003/42] | Hucker, Charlotte Jane Gill Jennings & Every Broadgate House, 7 Eldon Street London EC2M 7LH / GB | Application number, filing date | 01998054.9 | 18.12.2001 | [2003/42] | WO2001US48867 | Priority number, date | US20000745266 | 20.12.2000 Original published format: US 745266 | [2003/42] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO02059393 | Date: | 01.08.2002 | Language: | EN | [2002/31] | Type: | A1 Application with search report | No.: | EP1352109 | Date: | 15.10.2003 | Language: | EN | The application published by WIPO in one of the EPO official languages on 01.08.2002 takes the place of the publication of the European patent application. | [2003/42] | Search report(s) | International search report - published on: | EP | 01.08.2002 | Classification | IPC: | C23F3/06, C09G1/02, H01L21/321 | [2003/42] | CPC: |
C09G1/02 (EP,US);
C23F3/06 (EP,KR,US);
C23F1/18 (EP,US);
C23F1/26 (EP);
C23F3/04 (EP,US);
H01L21/32115 (EP,US);
| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR [2003/42] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | ZUSAMMENSETZUNG FÜR DAS CHEMISCH-MECHANISCH PLANARISIEREN (CMP) VON KUPFER, TANTAL UND TANTAL NITRID | [2003/42] | English: | COMPOSITION FOR CHEMICAL MECHANICAL PLANARIZATION OF COPPER, TANTALUM AND TANTALUM NITRIDE | [2003/42] | French: | COMPOSITION FOR CHEMICAL MECHANICAL PLANARIZATION OF COPPER, TANTALUM AND TANTALUM NITRIDE | [2003/42] | Entry into regional phase | 07.07.2003 | National basic fee paid | 07.07.2003 | Designation fee(s) paid | 07.07.2003 | Examination fee paid | Examination procedure | 15.07.2002 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 07.07.2003 | Examination requested [2003/42] | 17.06.2004 | Despatch of a communication from the examining division (Time limit: M04) | 28.10.2004 | Application deemed to be withdrawn, date of legal effect [2005/18] | 03.12.2004 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2005/18] | Fees paid | Renewal fee | 07.07.2003 | Renewal fee patent year 03 | Penalty fee | Additional fee for renewal fee | 31.12.2004 | 04   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [X]WO0024842 (ARCH SPEC CHEM INC [US]) [X] 1,11-17 * claim - *; | [X]US6063306 (KAUFMAN VLASTA BRUSIC [US], et al) [X] 1,11-17 * example 3; claim - *; | [PX]WO0106555 (ALLIED SIGNAL INC [US]) [PX] 1,18,19 * claims 2-10 *; | [PX]WO0194076 (HONEYWELL INT INC [US], et al) [PX] 1,2,11-19 * page 16, line 11 - page 32, line 29 *; | [L]US2002020833 (ZHANG FAN [US], et al) [L] 1,2,11-19* the whole document * |