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EP1265103
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EP About this file: EP1265103
| EP1265103 - ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 05.12.2008 Database last updated on 08.10.2024 | Most recent event Tooltip | 05.12.2008 | Withdrawal of application | published on 07.01.2009 [2009/02] | Applicant(s) | For all designated states KRI, Inc. 134, Chudoji Minami-machi Shimogyo-ku Kyoto-shi, Kyoto 600-8813 / JP | [N/P] |
| Former [2004/17] | For all designated states KRI, Inc. 134, Chudoji Minami-machi Shimogyo-ku Kyoto-shi Kyoto 600-8813 / JP | ||
| Former [2002/50] | For all designated states Kansai Research Institute, Inc. 1-2, Hiranomachi 4-chome, Chuo-ku Osaka-shi, Osaka 541-0046 / JP | Inventor(s) | 01 /
HANABATA, Makoto, Kansai Research Institute, Inc. Kyoto Research Park, 17, Chudoji Minami-Machi Shimogyo-ku, Kyoto-shi, Kyoto 600-8813 / JP | 02 /
SATO, Masahiro, Kansai Research Institute, Inc. Kyoto Research Park, 17, Chudoji Minami-Machi Shimogyo-ku, Kyoto-shi, Kyoto 600-8813 / JP | 03 /
KATAYAMA, Junko, Kansai Research Institute, Inc. Kyoto Research Park, 17, Chudoji Minami-Machi Shimogyo-ku, Kyoto-shi, Kyoto 600-8813 / JP | 04 /
KITAJIMA, Satsuki, Kansai Research Institute, Inc. Kyoto Research Park, 17, Chudoji Minami-Machi Shimogyo-ku, Kyoto-shi, Kyoto 600-8813 / JP | [2002/50] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
| Former [2002/50] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 01999860.8 | 04.12.2001 | [2002/50] | WO2001JP10571 | Priority number, date | JP20000370205 | 05.12.2000 Original published format: JP 2000370205 | JP20010010797 | 18.01.2001 Original published format: JP 2001010797 | [2002/50] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO0246841 | Date: | 13.06.2002 | Language: | EN | [2002/24] | Type: | A1 Application with search report | No.: | EP1265103 | Date: | 11.12.2002 | Language: | EN | The application published by WIPO in one of the EPO official languages on 13.06.2002 takes the place of the publication of the European patent application. | [2002/50] | Search report(s) | International search report - published on: | JP | 13.06.2002 | Classification | IPC: | G03F7/039, G03F7/004, H01L21/027 | [2002/50] | CPC: |
G03F7/0757 (EP,US);
G03F7/039 (KR);
G03F7/0382 (EP,US);
G03F7/0392 (EP,US)
| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR [2002/50] | Title | German: | AKTIVE KOMPONENTEN UND LICHTEMPFINDLICHE DIESE ENTHALTENDE HARZZUSAMMENSETZUNGEN | [2002/50] | English: | ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME | [2002/50] | French: | CONSTITUANTS ACTIFS ET COMPOSITIONS DE RESINE PHOTOSENSIBLE LES CONTENANT | [2002/50] | Entry into regional phase | 02.08.2002 | Translation filed | 02.08.2002 | National basic fee paid | 02.08.2002 | Search fee paid | 02.08.2002 | Designation fee(s) paid | 02.08.2002 | Examination fee paid | Examination procedure | 02.08.2002 | Amendment by applicant (claims and/or description) | 02.08.2002 | Examination requested [2002/50] | 24.11.2008 | Application withdrawn by applicant [2009/02] | Fees paid | Renewal fee | 19.12.2003 | Renewal fee patent year 03 | 27.12.2004 | Renewal fee patent year 04 | 20.12.2005 | Renewal fee patent year 05 | 21.12.2006 | Renewal fee patent year 06 | 19.12.2007 | Renewal fee patent year 07 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [X]US5612170 (TAKEMURA KATSUYA [JP], et al); | [YP]JP2001194796 (HITACHI CHEM DUPONT MICROSYS) |