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Extract from the Register of European Patents

EP About this file: EP1391470

EP1391470 - Process for preparing polymer compound for resist [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  05.09.2008
Database last updated on 02.09.2024
Most recent event   Tooltip05.09.2008No opposition filed within time limitpublished on 08.10.2008  [2008/41]
Applicant(s)For all designated states
GUN EI CHEMICAL INDUSTRY CO., LTD.
700, Shukuoorui-machi Takasaki-shi
Gunma-ken 370 / JP
[2007/44]
Former [2004/09]For all designated states
GUN EI CHEMICAL INDUSTRY CO., LTD.
700, Shukuoorui-machi
Takasaki-shi, Gunma-ken 370 / JP
Inventor(s)01 / Maruyama, Katsuhiro
GUN EI CHEMICAL INDUSTRY CO., LTD., 700 Shukuoorui
machi, Takasaki-shi, Gunma-ken / JP
02 / Yoshida, Satoru
GUN EI CHEMICAL INDUSTRY CO., LTD., 700 Shukuoorui
machi, Takasaki-shi, Gunma-ken / JP
03 / Kitano, Satoru
GUN EI CHEMICAL INDUSTRY CO., LTD., 700 Shukuoorui
machi, Takasaki-shi, Gunma-ken / JP
04 / Mashio, Hitoshi
GUN EI CHEMICAL INDUSTRY CO., LTD., 700 Shukuoorui
machi, Takasaki-shi, Gunma-ken / JP
 [2004/09]
Representative(s)Munk, Ludwig
Patentanwälte Munk
Prinzregentenstrasse 3
86150 Augsburg / DE
[N/P]
Former [2004/09]Munk, Ludwig, Dipl.-Ing.
Patentanwalt Prinzregentenstrasse 1
86150 Augsburg / DE
Application number, filing date02018007.112.08.2002
[2004/09]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1391470
Date:25.02.2004
Language:EN
[2004/09]
Type: B1 Patent specification 
No.:EP1391470
Date:31.10.2007
Language:EN
[2007/44]
Search report(s)(Supplementary) European search report - dispatched on:EP07.02.2003
ClassificationIPC:C08F12/22, G03F7/039
[2004/09]
CPC:
C08F12/22 (EP,US)
Designated contracting statesDE,   GB [2004/47]
Former [2004/09]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  SK,  TR 
TitleGerman:Verfahren zur Herstellung von Polymeren für Resist[2004/09]
English:Process for preparing polymer compound for resist[2004/09]
French:Procédé de préparation de polymères pour photoréserve[2004/09]
Examination procedure30.03.2004Examination requested  [2004/22]
26.08.2004Loss of particular rights, legal effect: designated state(s)
23.12.2004Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GR, IE, IT, LU, MC, NL, PT, SE, SK, TR
14.06.2007Communication of intention to grant the patent
05.09.2007Fee for grant paid
05.09.2007Fee for publishing/printing paid
Opposition(s)01.08.2008No opposition filed within time limit [2008/41]
Fees paidRenewal fee
23.07.2004Renewal fee patent year 03
03.08.2005Renewal fee patent year 04
11.08.2006Renewal fee patent year 05
14.08.2007Renewal fee patent year 06
Penalty fee
Penalty fee Rule 85a EPC 1973
29.09.2004AT   M01   Not yet paid
29.09.2004BE   M01   Not yet paid
29.09.2004BG   M01   Not yet paid
29.09.2004CH   M01   Not yet paid
29.09.2004CY   M01   Not yet paid
29.09.2004CZ   M01   Not yet paid
29.09.2004DK   M01   Not yet paid
29.09.2004EE   M01   Not yet paid
29.09.2004ES   M01   Not yet paid
29.09.2004FI   M01   Not yet paid
29.09.2004FR   M01   Not yet paid
29.09.2004GR   M01   Not yet paid
29.09.2004IE   M01   Not yet paid
29.09.2004IT   M01   Not yet paid
29.09.2004LU   M01   Not yet paid
29.09.2004MC   M01   Not yet paid
29.09.2004NL   M01   Not yet paid
29.09.2004PT   M01   Not yet paid
29.09.2004SE   M01   Not yet paid
29.09.2004SK   M01   Not yet paid
29.09.2004TR   M01   Not yet paid
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Documents cited:Search[A]EP0277721  (HOECHST CELANESE CORP [US]);
 [A]EP0466359  (HOECHST CELANESE CORP [US])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.