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Extract from the Register of European Patents

EP About this file: EP1348778

EP1348778 - Method for obtaining high quality InGaAsN semiconductor [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  12.01.2007
Database last updated on 12.11.2024
Most recent event   Tooltip12.01.2007No opposition filed within time limitpublished on 14.02.2007  [2007/07]
Applicant(s)For all designated states
Avago Technologies ECBU IP (Singapore) Pte. Ltd.
No. 1 Yishun Avenue 7
Singapore 768923 / SG
[N/P]
Former [2006/52]For all designated states
Avago Technologies ECBU IP (Singapore) Pte. Ltd.
No 1 Yishun Avenue 7
Singapore 768923 / SG
Former [2006/10]For all designated states
Agilent Technologies, Inc.
395 Page Mill Road
Palo Alto CA 94306 / US
Former [2003/40]For all designated states
Agilent Technologies, Inc.
395 Page Mill Road
Palo Alto, CA 94306 / US
Inventor(s)01 / Takeuchi, Tetsuya
3500 Deer Creek Road, M/S 26M-10
Palo Alto, CA 94304 / US
02 / Chang, Ying-Lan
3500 Deer Creek Road, M/S 26-M-10
Palo Alto, CA 94304 / US
03 / Bour, David P.
3500 Deer Creek Road, M/S 26M-10
Palo Alto, CA 94304 / US
04 / leary, Michael H.
3500 Deer Creek Road, M/S 26M-10
Palo Alto, CA 94304 / US
05 / Tan, Michael R. T.
3500 Deer Creek Road, M/S 26M-10
Palo Alto, CA 94304 / US
06 / Luan, Andy
350 Trimble Avenue, M/S 90UB
San Jose, CA 95131 / US
 [2003/40]
Representative(s)Liesegang, Eva, et al
Boehmert & Boehmert
Anwaltspartnerschaft mbB
Pettenkoferstrasse 22
80336 München / DE
[N/P]
Former [2003/40]Liesegang, Eva, et al
Forrester & Boehmert, Pettenkoferstrasse 20-22
80336 München / DE
Application number, filing date02023298.917.10.2002
[2003/40]
Priority number, dateUS2002010647225.03.2002         Original published format: US 106472
[2003/40]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1348778
Date:01.10.2003
Language:EN
[2003/40]
Type: B1 Patent specification 
No.:EP1348778
Date:08.03.2006
Language:EN
[2006/10]
Search report(s)(Supplementary) European search report - dispatched on:EP05.06.2003
ClassificationIPC:C23C16/30, C30B25/02, H01L21/205
[2003/40]
CPC:
C30B25/02 (EP,US); C23C16/301 (EP,US); C23C16/4401 (EP,US);
C23C16/4405 (EP,US); C30B29/403 (EP,US); H01L21/02395 (EP,US);
H01L21/02463 (EP,US); H01L21/02507 (EP,US); H01L21/0254 (EP,US);
H01L21/02546 (EP,US); H01L21/02579 (EP,US); H01L21/0262 (EP,US) (-)
Designated contracting statesDE,   FR,   GB [2004/26]
Former [2003/40]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  SK,  TR 
TitleGerman:Verfahren zur Herstellung eines InGaAsN Halbleiters mit hoher Qualität[2005/41]
English:Method for obtaining high quality InGaAsN semiconductor[2003/40]
French:Méthode pour obtenir un semiconducteur InGaAsN de haute qualité[2003/40]
Former [2003/40]Verfahren zur Herstellung eines hochqualitativen InGaAsN Halbleiters
Examination procedure03.03.2004Examination requested  [2004/19]
14.04.2005Despatch of a communication from the examining division (Time limit: M04)
11.08.2005Reply to a communication from the examining division
12.09.2005Communication of intention to grant the patent
05.01.2006Fee for grant paid
05.01.2006Fee for publishing/printing paid
Opposition(s)11.12.2006No opposition filed within time limit [2007/07]
Fees paidRenewal fee
25.10.2004Renewal fee patent year 03
27.10.2005Renewal fee patent year 04
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Documents cited:Search[A]US5944913  (HOU HONG Q [US], et al) [A] 1-6* the whole document *;
 [X]WO0152373  (INFINEON TECHNOLOGIES AG [DE], et al) [X] 1,6 * page 4, lines 4-18 * * page 5, lines 19-26 *;
    [DXAY] - HEROUX J B ET AL, "GALNNAS RESONANT-CAVITY-ENHANCED PHOTODETECTOR OPERATING AT 1.3 MUM", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, (19991101), vol. 75, no. 18, ISSN 0003-6951, pages 2716 - 2718, XP000875922 [DX] 1,2,6 * figure 1 * [A] 5 [Y] 4

DOI:   http://dx.doi.org/10.1063/1.125126
 [DX]  - R.R. KING ET AL, "NEXT-GENERATION , HIGH-EFFICIENCY III-V MUTLIJUNCTION SOLAR CELLS", 28TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE, (2000), pages 998 - 1001, XP001151872 [DX] 1,3 * figure 1 * * page 999, column L, line 26 *
 [Y]  - MIYAMOTO T ET AL, "CBE and MOCVD growth of GaInNAs", JOURNAL OF CRYSTAL GROWTH, NORTH-HOLLAND PUBLISHING CO. AMSTERDAM, NL, (200002), vol. 209, no. 2-3, ISSN 0022-0248, pages 339 - 344, XP004186701 [Y] 4 * abstract *

DOI:   http://dx.doi.org/10.1016/S0022-0248(99)00567-9
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