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Extract from the Register of European Patents

EP About this file: EP1324006

EP1324006 - Simultaneous self-calibrated sub-aperture stitching for surface figure measurement ( interferometer ) [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.02.2007
Database last updated on 19.10.2024
Most recent event   Tooltip12.12.2008Lapse of the patent in a contracting state
New state(s): CY		published on 14.01.2009  [2009/03]
Applicant(s)For all designated states
QED TECHNOLOGIES INTERNATIONAL, INC.
870 N. Commons Drive
Aurora, IL 60504 / US
[2006/52]
Former [2003/27]For all designated states
QED Technologies, Inc.
1040 University Avenue
Rochester, NY 14607 / US
Inventor(s)01 / Golini, Donald
31 Palmerston Road
Rochester, New York, 14618 USA / US
02 / Forbes, Gregory
16 Douglas Avenue, N. Epping
Sydney, 2121 Australia / AU
03 / Murphy, Paul E.
122 Lattimore Road
Rochester, New York, 14620 USA / US
 [2003/27]
Representative(s)Wagner, Karl H., et al
Wagner & Geyer Partnerschaft mbB
Patent- und Rechtsanwälte
Gewürzmühlstrasse 5
80538 München / DE
[N/P]
Former [2008/33]Wagner, Karl H., et al
Wagner & Geyer Partnerschaft Patent- und Rechtsanwälte Gewürzmühlstrasse 5
80538 München / DE
Former [2003/27]Wagner, Karl H., Dipl.-Ing., et al
WAGNER & GEYER Patentanwälte Gewürzmühlstrasse 5
80538 München / DE
Application number, filing date02027674.712.12.2002
[2003/27]
Priority number, dateUS2002030323625.11.2002         Original published format: US 303236
US20010341549P18.12.2001         Original published format: US 341549 P
[2003/27]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1324006
Date:02.07.2003
Language:EN
[2003/27]
Type: B1 Patent specification 
No.:EP1324006
Date:29.03.2006
Language:EN
[2006/13]
Search report(s)(Supplementary) European search report - dispatched on:EP13.03.2003
ClassificationIPC:G01B11/255, G06T11/00, G01M11/00, G02B7/00
[2003/27]
CPC:
G01M11/0271 (EP,US); G01B11/255 (EP,US); G01B9/02074 (EP,US);
G01B9/02085 (EP,US); G01M11/0264 (EP,US); G01B2210/52 (EP,US);
G01B2290/65 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   SI,   SK,   TR [2003/27]
TitleGerman:Gleichzeitige und sich selbst kalibrierende Anpassung von Subaperturen zur Messung von Oberflächenformen ( Interferometer )[2003/27]
English:Simultaneous self-calibrated sub-aperture stitching for surface figure measurement ( interferometer )[2003/27]
French:Adaption simultanée et auto-étalonnée des ouvertures partielles pour mesurer la forme d'une surface ( interferomètre )[2003/27]
Examination procedure29.12.2003Examination requested  [2004/10]
26.10.2004Despatch of a communication from the examining division (Time limit: M04)
03.03.2005Reply to a communication from the examining division
25.04.2005Communication of intention to grant the patent
05.09.2005Fee for grant paid
05.09.2005Fee for publishing/printing paid
29.09.2005Despatch of a communication from the examining division (Time limit: M04)
26.01.2006Reply to a communication from the examining division
Opposition(s)02.01.2007No opposition filed within time limit [2007/11]
Fees paidRenewal fee
29.12.2004Renewal fee patent year 03
28.12.2005Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT29.03.2006
BE29.03.2006
CY29.03.2006
CZ29.03.2006
EE29.03.2006
FI29.03.2006
IT29.03.2006
SI29.03.2006
SK29.03.2006
TR29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
GR30.06.2006
ES10.07.2006
PT29.08.2006
IE12.12.2006
LU12.12.2006
MC31.12.2006
[2009/03]
Former [2008/37]AT29.03.2006
BE29.03.2006
CZ29.03.2006
EE29.03.2006
FI29.03.2006
IT29.03.2006
SI29.03.2006
SK29.03.2006
TR29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
GR30.06.2006
ES10.07.2006
PT29.08.2006
IE12.12.2006
LU12.12.2006
MC31.12.2006
Former [2008/28]AT29.03.2006
BE29.03.2006
CZ29.03.2006
EE29.03.2006
FI29.03.2006
IT29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
GR30.06.2006
ES10.07.2006
PT29.08.2006
IE12.12.2006
MC31.12.2006
Former [2008/22]AT29.03.2006
BE29.03.2006
CZ29.03.2006
IT29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
GR30.06.2006
ES10.07.2006
PT29.08.2006
IE12.12.2006
MC31.12.2006
Former [2008/20]AT29.03.2006
BE29.03.2006
IT29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
GR30.06.2006
ES10.07.2006
PT29.08.2006
IE12.12.2006
MC31.12.2006
Former [2007/48]AT29.03.2006
BE29.03.2006
IT29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
ES10.07.2006
PT29.08.2006
IE12.12.2006
MC31.12.2006
Former [2007/38]AT29.03.2006
BE29.03.2006
IT29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
ES10.07.2006
PT29.08.2006
MC31.12.2006
Former [2007/13]AT29.03.2006
BE29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
ES10.07.2006
PT29.08.2006
Former [2007/11]AT29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
DK29.06.2006
SE29.06.2006
ES10.07.2006
PT29.08.2006
Former [2007/03]AT29.03.2006
SI29.03.2006
SK29.03.2006
BG29.06.2006
SE29.06.2006
ES10.07.2006
Former [2006/50]AT29.03.2006
SI29.03.2006
BG29.06.2006
SE29.06.2006
ES10.07.2006
Former [2006/48]AT29.03.2006
SI29.03.2006
BG29.06.2006
SE29.06.2006
Former [2006/46]AT29.03.2006
SI29.03.2006
SE29.06.2006
Former [2006/43]AT29.03.2006
SI29.03.2006
Former [2006/40]SI29.03.2006
Documents cited:Search[A]  - M. OTSUBO ET AL., "Measurement of large plane surface shapes by connecting small-aperture interferogramms", OPTICAL ENGINEERING, Bellingham, WA (US), (1994), vol. 33, no. 2, pages 608 - 613, XP000429932 [A] 1 * page 613; figures 1-3 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.