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EP1296358
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EP About this file: EP1296358
| EP1296358 - Process for producing semiconductor substrates [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 23.02.2007 Database last updated on 14.03.2026 | Most recent event Tooltip | 23.02.2007 | Application deemed to be withdrawn | published on 28.03.2007 [2007/13] | Applicant(s) | For all designated states CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. 580 Horikawa-cho, Saiwai-ku Kawasaki-shi Kanagawa 210-0013 / JP | [N/P] |
| Former [2003/13] | For all designated states Catalysts & Chemicals Industries Co., Ltd. 580 Horikawa-cho, Saiwai-ku Kawasaki-shi, Kanagawa 210-0013 / JP | Inventor(s) | 01 /
Egami, Miki, c/o Wakamatsu Plant, Catalyst & Chem. Ind. Co., Ltd, 13-1 Kitaminato-machi, Wakamatsu-ku Kitakyushu-shi, Fukuoka 808-0027 / JP | 02 /
Muraguchi, Ryo, Wakamatsu Plant, Catalyst & Chem. Ind. Co., Ltd, 13-1 Kitaminato-machi, Wakamatsu-ku Kitakyushu-shi, Fukuoka 808-0027 / JP | [2003/13] | Representative(s) | Thomson, James Burgess Dehns St Bride's House 10 Salisbury Square London EC4Y 8JD / GB | [N/P] |
| Former [2003/13] | Thomson, James B. Frank B. Dehn & Co. 179 Queen Victoria Street London EC4V 4EL / GB | Application number, filing date | 02256469.4 | 18.09.2002 | [2003/13] | Priority number, date | JP20010289258 | 21.09.2001 Original published format: JP 2001289258 | [2003/13] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1296358 | Date: | 26.03.2003 | Language: | EN | [2003/13] | Type: | A3 Search report | No.: | EP1296358 | Date: | 04.01.2006 | [2006/01] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 18.11.2005 | Classification | IPC: | H01L21/00, H01L21/31, C23C18/00 | [2003/13] | CPC: |
C23C18/1212 (EP,US);
H10P14/60 (KR);
C23C18/122 (EP);
H10P14/6534 (EP,US);
H10P14/6682 (EP,US);
H10P95/062 (EP,US);
H10P95/08 (EP,US);
H10P14/6342 (EP,US);
H10P14/6689 (EP,US);
| Designated contracting states | (deleted) [2006/36] |
| Former [2003/13] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, SK, TR | Title | German: | Herstellungsverfahren für Halbleitersubstrate | [2003/13] | English: | Process for producing semiconductor substrates | [2003/13] | French: | Procédé de fabrication de substrats semiconducteurs | [2003/13] | Examination procedure | 05.07.2006 | Application deemed to be withdrawn, date of legal effect [2007/13] | 31.10.2006 | Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time [2007/13] | Fees paid | Renewal fee | 28.09.2004 | Renewal fee patent year 03 | 23.09.2005 | Renewal fee patent year 04 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 14.08.2006 | DE M01 Not yet paid | 14.08.2006 | FR M01 Not yet paid | 14.08.2006 | IT M01 Not yet paid | 14.08.2006 | NL M01 Not yet paid | Penalty fee Rule 85b EPC 1973 | 14.08.2006 | M01 Not yet paid | Additional fee for renewal fee | 30.09.2006 | 05 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY] US5939139 (FUJIMOTO AKIHIRO et al.) [X] 1,3-9 * abstract *[Y] 2 | [XY] US4510176 (CUTHBERT JOHN D et al.) [X] 1,3-9 * column 6; claim 1 *[Y] 2 | [Y] EP0890623 (CATALYSTS & CHEM IND CO et al.) [Y] 2 * abstract * |