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Extract from the Register of European Patents

EP About this file: EP1357576

EP1357576 - Highly heat-resistant plasma etching electrode and dry etching device including the same [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  25.06.2010
Database last updated on 06.07.2024
Most recent event   Tooltip25.06.2010Application deemed to be withdrawnpublished on 28.07.2010  [2010/30]
Applicant(s)For all designated states
Nisshinbo Industries, Inc.
31-11, Nihonbashi Ningyocho 2-chome Chuo-ku
Tokyo 103-8650 / JP
[N/P]
Former [2003/44]For all designated states
Nisshinbo Industries, Inc.
31-11, Nihonbashi Ningyocho 2-chome
Chuo-ku, Tokyo 103-8650 / JP
Inventor(s)01 / Yamaguchi, Akira
Kawagoe Plant, Nisshinbo Industies,Inc.,4-10,Higa
shitamachi, Kawagoe-shi, Saitama 350-1114 / JP
02 / Tomita, Hideshi
Rsrch and Dev. Center,Nisshinbo Industries,Inc.,1
-2-3, Ohnodai, Midori-ku, Chiba 267-0056 / JP
 [2006/31]
Former [2003/44]01 / Yamaguchi, Akira
Kawagoe Plant, Nisshinbo Industies,Inc.,4-10,Higa
shitamachi, Kawagoe-shi, Saitama 350-1114 / JP
02 / Tomita, Shuji
Rsrch and Dev. Center,Nisshinbo Industries,Inc.,1
-2-3, Ohnodai, Midori-ku, Chiba 267-0056 / JP
Representative(s)Moinas, Michel
Cabinet Michel Moinas
13 Chemin du Levant
01210 Ferney-Voltaire / FR
[N/P]
Former [2003/44]Moinas, Michel
Cabinet Michel Moinas 13 Chemin du Levant
01210 Ferney-Voltaire / FR
Application number, filing date02356151.731.07.2002
[2003/44]
Priority number, dateJP2002011886122.04.2002         Original published format: JP 2002118861
JP2002018752927.06.2002         Original published format: JP 2002187529
[2003/44]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1357576
Date:29.10.2003
Language:EN
[2003/44]
Type: A3 Search report 
No.:EP1357576
Date:26.04.2006
[2006/17]
Search report(s)(Supplementary) European search report - dispatched on:EP10.03.2006
ClassificationIPC:H01J37/32, C08L63/00, C08G18/09, C08K3/04
[2003/44]
CPC:
H01J37/3255 (EP,US); H01L21/3065 (KR); C09J163/00 (EP,US);
H01J37/32009 (EP,US); C08K3/04 (EP,US); C08L2666/20 (EP,US);
C08L79/08 (EP,US) (-)
C-Set:
C09J163/00, C08L2666/20 (EP,US)
Designated contracting statesDE [2007/01]
Former [2003/44]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  SK,  TR 
TitleGerman:Hitzebeständige Elektrode zum Plasmaätzen, und Plasmaätzvorrichtung mit dieser Elektrode[2003/44]
English:Highly heat-resistant plasma etching electrode and dry etching device including the same[2003/44]
French:Electrode résistante à la chaleur pour décapage à plasma, et dispositif pour décapage à plasma comportant celle-ci[2003/44]
Examination procedure07.08.2006Examination requested  [2006/38]
27.10.2006Loss of particular rights, legal effect: designated state(s)
14.02.2007Despatch of a communication from the examining division (Time limit: M04)
19.02.2007Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, SK, TR
08.06.2007Reply to a communication from the examining division
02.02.2010Application deemed to be withdrawn, date of legal effect  [2010/30]
09.03.2010Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2010/30]
Fees paidRenewal fee
28.07.2004Renewal fee patent year 03
27.07.2005Renewal fee patent year 04
26.07.2006Renewal fee patent year 05
31.07.2007Renewal fee patent year 06
14.07.2008Renewal fee patent year 07
Penalty fee
Penalty fee Rule 85a EPC 1973
04.12.2006AT   M01   Not yet paid
04.12.2006BE   M01   Not yet paid
04.12.2006BG   M01   Not yet paid
04.12.2006CH   M01   Not yet paid
04.12.2006CY   M01   Not yet paid
04.12.2006CZ   M01   Not yet paid
04.12.2006DK   M01   Not yet paid
04.12.2006EE   M01   Not yet paid
04.12.2006ES   M01   Not yet paid
04.12.2006FI   M01   Not yet paid
04.12.2006FR   M01   Not yet paid
04.12.2006GB   M01   Not yet paid
04.12.2006GR   M01   Not yet paid
04.12.2006IE   M01   Not yet paid
04.12.2006IT   M01   Not yet paid
04.12.2006LU   M01   Not yet paid
04.12.2006MC   M01   Not yet paid
04.12.2006NL   M01   Not yet paid
04.12.2006PT   M01   Not yet paid
04.12.2006SE   M01   Not yet paid
04.12.2006SK   M01   Not yet paid
04.12.2006TR   M01   Not yet paid
Additional fee for renewal fee
31.07.200908   M06   Not yet paid
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Documents cited:Search[A]JP2000290468  ;
 [A]JPH0616907  ;
 [A]JPH09241353  ;
 [A]US5079326  (SUZUKI TOSHIO [JP], et al) [A] 1,3-7 * abstract * * column 1, lines 52-54 * * column 13, line 35 - column 14, line 65 * * column 5, lines 14,15 *;
 [A]US5223584  (LENKE GERD M [US], et al) [A] 1-7 * abstract * * column 2, lines 38-58 * * column 7, line 23 - column 13, line 50 *;
 [A]US5576398  (TAKAHASHI MASAYUKI [JP], et al) [A] 1,3-7 * abstract * * column 2, line 43 - column 4, line 22 * * column 8, line 5 - column 10, line 45 *;
 [A]EP0803897  (NISSHIN SPINNING [JP]) [A] 1,10-12 * abstract * * page 1, line 55 - page 2, line 49; figures 1,5 *;
 [A]EP0928825  (NISSHIN SPINNING [JP]) [A] 1-7 * abstract * * paragraphs [0014] - [0037] *;
 [A]EP0943642  (NISSHIN SPINNING [JP]) [A] 1* paragraphs [0001] , [0049] *;
 [X]US2002043335  (YAMAGUCHI AKIRA [JP], et al) [X] 1-12 * the whole document * * paragraphs [0014] - [0059]; figure 1; example 8; claims 1-6 *
 [A]  - PATENT ABSTRACTS OF JAPAN, (20010205), vol. 2000, no. 13, & JP2000290468 A 20001017 (SUMITOMO BAKELITE CO LTD) [A] 1-7 * abstract * * paragraphs [0008] - [0017] *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19940421), vol. 018, no. 222, Database accession no. (C - 1193), & JP06016907 A 19940125 (NISSHINBO IND INC;OTHERS: 01) [A] 1,2,6 * abstract * * paragraphs [0001] , [0009] , [0014] , [0023] *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19980130), vol. 1998, no. 01, & JP09241353 A 19970916 (JAPAN SYNTHETIC RUBBER CO LTD) [A] 1-7 * abstract * * paragraphs [0005] - [0008] - [0010] , [0013] *
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