-
EP1373151
European procedure
- EP About this file
- EP Legal status
- EP Federated register
- EP Event history
- EP Citations
- EP Patent family
- EP All documents
Extract from the Register of European Patents
EP About this file: EP1373151
| EP1373151 - OXYGEN DOPING OF SILICON OXYFLUORIDE GLASS [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 06.04.2007 Database last updated on 03.09.2024 | Most recent event Tooltip | 06.04.2007 | Application deemed to be withdrawn | published on 09.05.2007 [2007/19] | Applicant(s) | For all designated states Corning Incorporated 1 Riverfront Plaza Corning, NY 14831 / US | [N/P] |
| Former [2004/01] | For all designated states CORNING INCORPORATED 1 Riverfront Plaza Corning, N.Y. 14831 / US | Inventor(s) | 01 /
MOORE, Lisa A. 7 West Fourth Street Corning, NY 14830 / US | 02 /
SMITH, Charlene, M. 222 Watauga Avenue Corning, NY 14830 / US | [2004/01] | Representative(s) | Isarpatent Patent- und Rechtsanwälte Barth Charles Hassa Peckmann & Partner mbB Postfach 44 01 51 80750 München / DE | [N/P] |
| Former [2005/03] | Reinhard - Skuhra - Weise & Partner Postfach 44 01 51 80750 München / DE | ||
| Former [2004/01] | Poole, Michael John, et al Corning Limited Patents & Licensing Department Quantum House, Maylands Avenue Hemel Hempstead, Herts. HP2 7DE / GB | Application number, filing date | 02714956.6 | 11.02.2002 | [2004/01] | WO2002US05237 | Priority number, date | US20010271135P | 24.02.2001 Original published format: US 271135 P | US20010997782 | 28.11.2001 Original published format: US 997782 | [2004/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO02068350 | Date: | 06.09.2002 | Language: | EN | [2002/36] | Type: | A1 Application with search report | No.: | EP1373151 | Date: | 02.01.2004 | Language: | EN | The application published by WIPO in one of the EPO official languages on 06.09.2002 takes the place of the publication of the European patent application. | [2004/01] | Search report(s) | International search report - published on: | US | 06.09.2002 | Classification | IPC: | C03B32/00, C03C23/00 | [2004/01] | CPC: |
G03F7/70216 (EP);
C03C4/00 (KR);
C03B19/14 (KR);
C03B19/1407 (EP);
C03B19/1415 (EP);
C03B19/1423 (EP);
C03B19/1453 (EP);
C03C3/06 (EP,KR);
C03C4/0085 (EP);
G03F1/60 (EP);
G03F7/70958 (EP);
C03B2201/07 (EP);
C03B2201/075 (EP);
C03B2201/12 (EP);
C03B2201/20 (EP);
C03B2201/21 (EP);
C03B2207/30 (EP);
C03B2207/32 (EP);
C03B2207/36 (EP);
C03B2207/38 (EP);
C03C2201/12 (EP);
C03C2201/20 (EP);
C03C2201/21 (EP);
C03C2201/23 (EP);
| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR [2004/01] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | SAUERSTOFFDOTIERUNG VON SILICIUMOXIDFLUORIDGLAS | [2004/01] | English: | OXYGEN DOPING OF SILICON OXYFLUORIDE GLASS | [2004/01] | French: | DOPAGE A L'OXYGENE DE VERRE D'OXYFLUORURE DE SILICIUM | [2004/01] | Entry into regional phase | 04.09.2003 | National basic fee paid | 04.09.2003 | Search fee paid | 04.09.2003 | Designation fee(s) paid | 04.09.2003 | Examination fee paid | Examination procedure | 22.07.2002 | Request for preliminary examination filed International Preliminary Examining Authority: US | 04.09.2003 | Amendment by applicant (claims and/or description) | 04.09.2003 | Examination requested [2004/01] | 29.08.2006 | Application deemed to be withdrawn, date of legal effect [2007/19] | 21.11.2006 | Despatch of communication that the application is deemed to be withdrawn, reason: designation fee not paid in time [2007/19] | Fees paid | Renewal fee | 26.04.2004 | Renewal fee patent year 03 | 22.02.2005 | Renewal fee patent year 04 | Penalty fee | Additional fee for renewal fee | 29.02.2004 | 03 M06 Fee paid on 26.04.2004 | 28.02.2006 | 05 M06 Not yet paid | 28.02.2007 | 06 M06 Not yet paid |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]US3661436 (HORWATH RONALD S, et al); | [A]US5106401 (ISHIKAWA SHINJI [JP], et al); | [A] - LEE ET AL., "Effect of post plasma treatment on reliability of ECRCVD SiOF films", INTERNATIONAL MICROPROCESSES AND NANOTECHNOLOGY CONFERENCE, (19980716), pages 231 - 232, XP002951689 |