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EP1443126
European procedure
Extract from the Register of European Patents
EP About this file: EP1443126
| EP1443126 - SILICON MONOXIDE VAPOR DEPOSITION MATERIAL AND METHOD FOR PREPARATION THEREOF [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 13.03.2009 Database last updated on 13.07.2024 | Most recent event Tooltip | 13.03.2009 | No opposition filed within time limit | published on 15.04.2009 [2009/16] | Applicant(s) | For all designated states OSAKA Titanium Technologies Co., Ltd. 1, Higashihama-cho Amagasaki-shi, Hyogo 660-8533 / JP | [2008/13] |
| Former [2004/32] | For all designated states Sumitomo Titanium Corporation 1, Higashihamacho Amagasaki-shi, Hyogo 660-8533 / JP | Inventor(s) | 01 /
NISHIOKA, Kazuo 330-8, Ikejiri 3-chome Itami-shi, Hyogo 664-0027 / JP | [2004/32] | Representative(s) | Butler, Lance Barker Brettell LLP First Floor, Atrium Court 15-17 Jockey's Fields London WC1R 4QR / GB | [N/P] |
| Former [2004/32] | Butler, Lance Barker Brettell 10-12 Priests Bridge London SW15 5JE / GB | Application number, filing date | 02765557.0 | 13.09.2002 | [2004/32] | WO2002JP09472 | Priority number, date | JP20010281524 | 17.09.2001 Original published format: JP 2001281524 | [2004/32] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO03025246 | Date: | 27.03.2003 | Language: | EN | [2003/13] | Type: | A1 Application with search report | No.: | EP1443126 | Date: | 04.08.2004 | Language: | EN | The application published by WIPO in one of the EPO official languages on 27.03.2003 takes the place of the publication of the European patent application. | [2004/32] | Type: | B1 Patent specification | No.: | EP1443126 | Date: | 07.05.2008 | Language: | EN | [2008/19] | Search report(s) | International search report - published on: | JP | 27.03.2003 | (Supplementary) European search report - dispatched on: | EP | 02.04.2007 | Classification | IPC: | C23C14/24, C01B33/113 | [2004/32] | CPC: |
C23C14/24 (EP,US);
C01B33/113 (KR);
C23C14/10 (EP,US);
C23C14/225 (EP,US)
| Designated contracting states | DE, FR, GB [2008/19] |
| Former [2004/32] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, SK, TR | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | MATERIAL ZUR DAMPFABSCHEIDUNG VON SILICIUMMONOXID UND HERSTELLUNGSVERFAHREN DAFÜR | [2004/32] | English: | SILICON MONOXIDE VAPOR DEPOSITION MATERIAL AND METHOD FOR PREPARATION THEREOF | [2004/32] | French: | MATERIAU DE MONOXYDE DE SILICIUM POUR DEPOT PAR EVAPORATION SOUS VIDE ET PROCEDE DE PREPARATION DE CELUI-CI | [2004/32] | Entry into regional phase | 13.04.2004 | Translation filed | 13.04.2004 | National basic fee paid | 13.04.2004 | Search fee paid | 13.04.2004 | Designation fee(s) paid | 13.04.2004 | Examination fee paid | Examination procedure | 13.04.2004 | Examination requested [2004/32] | 04.07.2007 | Despatch of a communication from the examining division (Time limit: M04) | 08.10.2007 | Reply to a communication from the examining division | 15.11.2007 | Communication of intention to grant the patent | 20.03.2008 | Fee for grant paid | 20.03.2008 | Fee for publishing/printing paid | Opposition(s) | 10.02.2009 | No opposition filed within time limit [2009/16] | Fees paid | Renewal fee | 03.09.2004 | Renewal fee patent year 03 | 03.09.2005 | Renewal fee patent year 04 | 04.09.2006 | Renewal fee patent year 05 | 04.09.2007 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0216649 (KAWASAKI STEEL CO [JP]) [A] 1,2 * page 9, line 29 - page 11, line 7 * * page 11, line 25 - page 12, line 5 * * figures 1,2 *; | [A]JP2001226113 (DEGUSSA) [A] 1,2* abstract * | International search | [A]JPH05171412 (MITSUBISHI HEAVY IND LTD); | [A]JPH09110412 (SUMITOMO SITIX CORP); | [A]JP2001220122 (SHINETSU CHEMICAL CO); | [A]JP4081524B ; | [A]JPS4022050B |