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EP1453082
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EP About this file: EP1453082
| EP1453082 - GAS FOR PLASMA REACTION, PROCESS FOR PRODUCING THE SAME, AND USE [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 20.01.2012 Database last updated on 03.09.2024 | Most recent event Tooltip | 20.01.2012 | Withdrawal of application | published on 22.02.2012 [2012/08] | Applicant(s) | For all designated states Zeon Corporation 6-1, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-0005 / JP | [N/P] |
| Former [2004/36] | For all designated states Zeon Corporation 6-1, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-0005 / JP | Inventor(s) | 01 /
SUGAWARA, Mitsuru, c/o ZEON CORPORATION 6-1, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-0005 / JP | 02 /
YAMADA, Toshiro, c/o ZEON CORPORATION 6-1, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-0005 / JP | 03 /
SUGIMOTO, Tatsuya, c/o ZEON CORPORATION 6-1, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-0005 / JP | 04 /
TANAKA, Kimiaki, c/o ZEON CORPORATION 6-1, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-0005 / JP | [2004/36] | Representative(s) | Albrecht, Thomas Kraus & Weisert Patentanwälte PartGmbB Thomas-Wimmer-Ring 15 80539 München / DE | [N/P] |
| Former [2004/36] | Albrecht, Thomas, Dr. Kraus & Weisert Patent- und Rechtsanwälte Thomas-Wimmer-Ring 15 80539 München / DE | Application number, filing date | 02775447.2 | 31.10.2002 | [2004/36] | WO2002JP11360 | Priority number, date | JP20010342791 | 08.11.2001 Original published format: JP 2001342791 | JP20020081893 | 22.03.2002 Original published format: JP 2002081893 | [2004/36] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO03041148 | Date: | 15.05.2003 | Language: | EN | [2003/20] | Type: | A1 Application with search report | No.: | EP1453082 | Date: | 01.09.2004 | Language: | EN | The application published by WIPO in one of the EPO official languages on 15.05.2003 takes the place of the publication of the European patent application. | [2004/36] | Search report(s) | International search report - published on: | JP | 15.05.2003 | (Supplementary) European search report - dispatched on: | EP | 18.09.2007 | Classification | IPC: | H01L21/3065, H01L21/311 | [2007/29] | CPC: |
C07C21/22 (EP,US);
H01L21/3065 (EP,KR,US);
C07C17/25 (EP,US);
C23C16/26 (EP,US);
C23C16/30 (EP,US);
C23F4/00 (EP,US);
H01L21/31116 (EP,US)
(-)
| C-Set: |
C07C17/25, C07C21/22 (EP,US)
|
| Former IPC [2004/36] | H01L21/3065 | Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, SK, TR [2004/36] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | GAS FÜR EINE PLASMAREAKTION, PROZESS ZUR HERSTELLUNG DES GASES UND VERWENDUNG | [2004/36] | English: | GAS FOR PLASMA REACTION, PROCESS FOR PRODUCING THE SAME, AND USE | [2004/36] | French: | GAZ POUR REACTION DE PLASMA, SON PROCEDE DE PRODUCTION ET D'UTILISATION | [2004/36] | Entry into regional phase | 07.06.2004 | Translation filed | 07.06.2004 | National basic fee paid | 07.06.2004 | Search fee paid | 07.06.2004 | Designation fee(s) paid | 07.06.2004 | Examination fee paid | Examination procedure | 31.10.2002 | Request for preliminary examination filed International Preliminary Examining Authority: JP | 07.06.2004 | Examination requested [2004/36] | 18.02.2009 | Despatch of a communication from the examining division (Time limit: M04) | 18.02.2009 | Invitation to provide information on prior art | 18.06.2009 | Reply to a communication from the examining division | 08.07.2009 | Reply to the invitation to provide information on prior art | 16.01.2012 | Application withdrawn by applicant [2012/08] | 18.01.2012 | Cancellation of oral proceeding that was planned for 07.02.2012 | 07.02.2012 | Date of oral proceedings (cancelled) | Divisional application(s) | EP11154316.1 / EP2317543 | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 18.02.2009 | Fees paid | Renewal fee | 14.10.2004 | Renewal fee patent year 03 | 26.10.2005 | Renewal fee patent year 04 | 26.10.2006 | Renewal fee patent year 05 | 12.10.2007 | Renewal fee patent year 06 | 14.10.2008 | Renewal fee patent year 07 | 13.10.2009 | Renewal fee patent year 08 | 11.10.2010 | Renewal fee patent year 09 | 11.10.2011 | Renewal fee patent year 10 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US5990368 (NAKANO MITSURU [JP], et al) [X] 10* column 2, line 6 - line 21 *; | [A]US6174451 (HUNG RAYMOND [US], et al) [A] 1-16 * abstract * | International search | [X]JPH09191002 (SONY CORP); | [X]WO0059021 (APPLIED MATERIAL INC [US]); | [Y]EP0499984 (DAIKIN IND LTD [JP]) |