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Extract from the Register of European Patents

EP About this file: EP1440466

EP1440466 - METHOD FOR PLANARIZATION ETCH WITH i IN-SITU /i MONITORING BY INTERFEROMETRY PRIOR TO RECESS ETCH [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  23.09.2011
Database last updated on 13.11.2024
Most recent event   Tooltip23.09.2011Application deemed to be withdrawnpublished on 26.10.2011  [2011/43]
Applicant(s)For all designated states
LAM RESEARCH CORPORATION
4650 Cushing Parkway
Fremont, CA 94538-6401 / US
[2004/31]
Inventor(s)01 / BRALY, Linda
1208 Marin Avenue
Albany, CA 94706 / US
02 / VAHEDI, Vahid
1503 Posen Avenue
Albany, CA 94706 / US
03 / EDELBERG, Erik
2027 18th Street
San Francisco, CA 94107 / US
04 / MILLER, Alan
265 Corliss Drive
Moraga, Ca 94556 / US
 [2004/31]
Representative(s)Walker, Ross Thomson, et al
Forresters IP LLP
Skygarden
Erika-Mann-Strasse 11
80636 München / DE
[N/P]
Former [2011/22]Walker, Ross Thomson, et al
Potts, Kerr & Co. 15 Hamilton Square Birkenhead
Merseyside CH41 6BR / GB
Former [2004/31]Thomson, Paul Anthony, et al
Potts, Kerr & Co. 15, Hamilton Square
Birkenhead Merseyside CH41 6BR / GB
Application number, filing date02776412.530.10.2002
[2004/31]
WO2002US35058
Priority number, dateUS2001000267631.10.2001         Original published format: US 2676
[2004/31]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO03038890
Date:08.05.2003
Language:EN
[2003/19]
Type: A2 Application without search report 
No.:EP1440466
Date:28.07.2004
Language:EN
The application published by WIPO in one of the EPO official languages on 08.05.2003 takes the place of the publication of the European patent application.
[2004/31]
Search report(s)International search report - published on:EP18.12.2003
ClassificationIPC:H01L21/66, H01L21/321
[2004/31]
CPC:
H01L21/7684 (EP,US); H01L21/304 (KR); H01L21/32115 (EP,US);
H01L21/32137 (EP,US); H01L21/763 (EP,US); H01L22/00 (KR)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   SK,   TR [2004/31]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:VERFAHREN ZUM PLANARISIERUNG-ÄTZEN MIT IN-SITU-ÜBERWACHUNG DURCH INTERFEROMETRIE VOR EINEM GRABENÄTZEN[2004/31]
English:METHOD FOR PLANARIZATION ETCH WITH i IN-SITU /i MONITORING BY INTERFEROMETRY PRIOR TO RECESS ETCH[2004/31]
French:PROCEDE DE GRAVURE DE PLANARISATION A REGULATION I IN SITU /I PAR INTERFEROMETRIE AVANT GRAVURE D'EVIDEMENTS[2004/31]
Entry into regional phase03.05.2004National basic fee paid 
03.05.2004Designation fee(s) paid 
03.05.2004Examination fee paid 
Examination procedure23.05.2003Request for preliminary examination filed
International Preliminary Examining Authority: EP
06.05.2004Examination requested  [2004/31]
10.02.2009Despatch of a communication from the examining division (Time limit: M04)
16.06.2009Reply to a communication from the examining division
03.05.2011Application deemed to be withdrawn, date of legal effect  [2011/43]
10.06.2011Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2011/43]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  10.02.2009
Fees paidRenewal fee
25.10.2004Renewal fee patent year 03
27.10.2005Renewal fee patent year 04
27.10.2006Renewal fee patent year 05
29.10.2007Renewal fee patent year 06
27.10.2008Renewal fee patent year 07
26.10.2009Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.10.201009   M06   Not yet paid
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Cited inInternational search[A]US6270622  (KLIPPERT II WALTER E [US], et al);
 [Y]EP1126513  (SEMICONDUCTOR 300 GMBH & CO KG [DE]);
 [Y]US6284665  (LILL THORSTEN [US], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.