EP1440466 - METHOD FOR PLANARIZATION ETCH WITH i IN-SITU /i MONITORING BY INTERFEROMETRY PRIOR TO RECESS ETCH [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 23.09.2011 Database last updated on 13.11.2024 | Most recent event Tooltip | 23.09.2011 | Application deemed to be withdrawn | published on 26.10.2011 [2011/43] | Applicant(s) | For all designated states LAM RESEARCH CORPORATION 4650 Cushing Parkway Fremont, CA 94538-6401 / US | [2004/31] | Inventor(s) | 01 /
BRALY, Linda 1208 Marin Avenue Albany, CA 94706 / US | 02 /
VAHEDI, Vahid 1503 Posen Avenue Albany, CA 94706 / US | 03 /
EDELBERG, Erik 2027 18th Street San Francisco, CA 94107 / US | 04 /
MILLER, Alan 265 Corliss Drive Moraga, Ca 94556 / US | [2004/31] | Representative(s) | Walker, Ross Thomson, et al Forresters IP LLP Skygarden Erika-Mann-Strasse 11 80636 München / DE | [N/P] |
Former [2011/22] | Walker, Ross Thomson, et al Potts, Kerr & Co. 15 Hamilton Square Birkenhead Merseyside CH41 6BR / GB | ||
Former [2004/31] | Thomson, Paul Anthony, et al Potts, Kerr & Co. 15, Hamilton Square Birkenhead Merseyside CH41 6BR / GB | Application number, filing date | 02776412.5 | 30.10.2002 | [2004/31] | WO2002US35058 | Priority number, date | US20010002676 | 31.10.2001 Original published format: US 2676 | [2004/31] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO03038890 | Date: | 08.05.2003 | Language: | EN | [2003/19] | Type: | A2 Application without search report | No.: | EP1440466 | Date: | 28.07.2004 | Language: | EN | The application published by WIPO in one of the EPO official languages on 08.05.2003 takes the place of the publication of the European patent application. | [2004/31] | Search report(s) | International search report - published on: | EP | 18.12.2003 | Classification | IPC: | H01L21/66, H01L21/321 | [2004/31] | CPC: |
H01L21/7684 (EP,US);
H01L21/304 (KR);
H01L21/32115 (EP,US);
H01L21/32137 (EP,US);
H01L21/763 (EP,US);
H01L22/00 (KR)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, SK, TR [2004/31] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | VERFAHREN ZUM PLANARISIERUNG-ÄTZEN MIT IN-SITU-ÜBERWACHUNG DURCH INTERFEROMETRIE VOR EINEM GRABENÄTZEN | [2004/31] | English: | METHOD FOR PLANARIZATION ETCH WITH i IN-SITU /i MONITORING BY INTERFEROMETRY PRIOR TO RECESS ETCH | [2004/31] | French: | PROCEDE DE GRAVURE DE PLANARISATION A REGULATION I IN SITU /I PAR INTERFEROMETRIE AVANT GRAVURE D'EVIDEMENTS | [2004/31] | Entry into regional phase | 03.05.2004 | National basic fee paid | 03.05.2004 | Designation fee(s) paid | 03.05.2004 | Examination fee paid | Examination procedure | 23.05.2003 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 06.05.2004 | Examination requested [2004/31] | 10.02.2009 | Despatch of a communication from the examining division (Time limit: M04) | 16.06.2009 | Reply to a communication from the examining division | 03.05.2011 | Application deemed to be withdrawn, date of legal effect [2011/43] | 10.06.2011 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2011/43] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 10.02.2009 | Fees paid | Renewal fee | 25.10.2004 | Renewal fee patent year 03 | 27.10.2005 | Renewal fee patent year 04 | 27.10.2006 | Renewal fee patent year 05 | 29.10.2007 | Renewal fee patent year 06 | 27.10.2008 | Renewal fee patent year 07 | 26.10.2009 | Renewal fee patent year 08 | Penalty fee | Additional fee for renewal fee | 31.10.2010 | 09   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]US6270622 (KLIPPERT II WALTER E [US], et al); | [Y]EP1126513 (SEMICONDUCTOR 300 GMBH & CO KG [DE]); | [Y]US6284665 (LILL THORSTEN [US], et al) |