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Extract from the Register of European Patents

EP About this file: EP1444308

EP1444308 - CERIUM-BASED POLISH AND CERIUM-BASED POLISH SLURRY [Right-click to bookmark this link]
Former [2004/33]CERIUM-BASED POLISH AND CERIUM-BASED POLISH SLURRY
[2010/52]
StatusNo opposition filed within time limit
Status updated on  18.11.2011
Database last updated on 03.09.2024
Most recent event   Tooltip27.09.2013Lapse of the patent in a contracting state
New state(s): TR		published on 30.10.2013  [2013/44]
Applicant(s)For all designated states
Showa Denko K.K.
13-9, Shiba Daimon, 1-chome, Minato-ku
Tokyo 105-8518 / JP
[2011/02]
Former [2004/33]For all designated states
SHOWA DENKO K.K.
13-9, Shiba Daimon, 1-chome, Minato-ku
Tokyo 105-8518 / JP
Inventor(s)01 / Bessho, Naoki, c/o Tohoku Kinzoku Kagaku K.K.
10, Aza Gechiuchi, Tairanakakabeya
Iwaki-shi, Fukushima 970-8021 / JP
 [2004/33]
Representative(s)Strehl Schübel-Hopf & Partner
Maximilianstrasse 54
80538 München / DE
[2004/33]
Application number, filing date02785937.015.11.2002
[2004/33]
WO2002JP11925
Priority number, dateJP2001035096816.11.2001         Original published format: JP 2001350968
US20010331614P20.11.2001         Original published format: US 331614 P
[2004/33]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO03042321
Date:22.05.2003
Language:EN
[2003/21]
Type: A1 Application with search report 
No.:EP1444308
Date:11.08.2004
Language:EN
The application published by WIPO in one of the EPO official languages on 22.05.2003 takes the place of the publication of the European patent application.
[2004/33]
Type: B1 Patent specification 
No.:EP1444308
Date:12.01.2011
Language:EN
[2011/02]
Search report(s)International search report - published on:JP22.05.2003
(Supplementary) European search report - dispatched on:EP13.05.2009
ClassificationIPC:C09K3/14, C01F17/00, B24B37/00, H01L21/304
[2004/33]
CPC:
C09K3/1463 (EP,US); C09K3/14 (KR); C01F17/235 (EP,US);
C09G1/02 (EP,US); C09K3/1409 (EP,US); C01P2002/60 (EP,US);
C01P2004/61 (EP,US); C01P2004/62 (EP,US); C01P2006/10 (EP,US);
C01P2006/12 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   SK,   TR [2004/33]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:CERBASIERENDES POLIERMITTEL UND CERBASIERENDE POLIERSUSPENSION[2004/33]
English:CERIUM-BASED POLISH AND CERIUM-BASED POLISH SLURRY[2010/52]
French:PRODUIT A POLIR A BASE DE CERIUM ET BOUE DE POLISSAGE A BASE DE CERIUM[2004/33]
Former [2004/33]CERIUM-BASED POLISH AND CERIUM-BASED POLISH SLURRY
Entry into regional phase04.12.2003National basic fee paid 
04.12.2003Search fee paid 
04.12.2003Designation fee(s) paid 
04.12.2003Examination fee paid 
Examination procedure04.12.2003Examination requested  [2004/33]
04.08.2009Despatch of a communication from the examining division (Time limit: M04)
04.09.2009Reply to a communication from the examining division
22.06.2010Communication of intention to grant the patent
02.11.2010Fee for grant paid
02.11.2010Fee for publishing/printing paid
Opposition(s)13.10.2011No opposition filed within time limit [2011/51]
Fees paidRenewal fee
05.11.2004Renewal fee patent year 03
14.11.2005Renewal fee patent year 04
13.11.2006Renewal fee patent year 05
16.11.2007Renewal fee patent year 06
17.11.2008Renewal fee patent year 07
24.11.2009Renewal fee patent year 08
23.11.2010Renewal fee patent year 09
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT12.01.2011
BE12.01.2011
CY12.01.2011
CZ12.01.2011
DK12.01.2011
EE12.01.2011
FI12.01.2011
NL12.01.2011
SE12.01.2011
SK12.01.2011
TR12.01.2011
BG12.04.2011
GR13.04.2011
ES23.04.2011
PT12.05.2011
[2013/44]
Former [2011/51]AT12.01.2011
BE12.01.2011
CY12.01.2011
CZ12.01.2011
DK12.01.2011
EE12.01.2011
FI12.01.2011
NL12.01.2011
SE12.01.2011
SK12.01.2011
BG12.04.2011
GR13.04.2011
ES23.04.2011
PT12.05.2011
Former [2011/47]AT12.01.2011
BE12.01.2011
CY12.01.2011
DK12.01.2011
EE12.01.2011
FI12.01.2011
NL12.01.2011
SE12.01.2011
BG12.04.2011
GR13.04.2011
ES23.04.2011
PT12.05.2011
Former [2011/40]AT12.01.2011
BE12.01.2011
CY12.01.2011
FI12.01.2011
NL12.01.2011
SE12.01.2011
BG12.04.2011
GR13.04.2011
ES23.04.2011
PT12.05.2011
Former [2011/37]BE12.01.2011
CY12.01.2011
FI12.01.2011
SE12.01.2011
BG12.04.2011
GR13.04.2011
ES23.04.2011
PT12.05.2011
Former [2011/35]SE12.01.2011
GR13.04.2011
ES23.04.2011
PT12.05.2011
Documents cited:Search[X]EP0875547  (SEIMI CHEM KK [JP]) [X] 1-14 * abstract * * page 1, lines 24-28 * * page 2, lines 1-7,22-30; examples 1-3 * * claims 1-5 *;
 [A]EP0939431  (HITACHI CHEMICAL CO LTD [JP]) [A] 1-14 * abstract * * paragraphs [0004] - [0013] ** examples 1-4 *
International search[X]EP1043379  (HITACHI CHEMICAL CO LTD [JP]);
 [X]WO0073211  (HITACHI CHEMICAL CO LTD [JP], et al);
 [X]JP2001031951  (HITACHI CHEMICAL CO LTD)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.