PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTERNS, AND ELECTRONIC EQUIPMENT | ||||
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Application No.EP03011014 |
Publication No.EP1376231 |
ApplicantHitachi Chemical DuPont MicroSystems Ltd. |
IPC |
Status | Application No. |
Publication No. |
Proprietor | Invalidation date |
Not in force since |
Renewal fees last paid |
Record last updated |
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DE | Loading... | |||||||
FR | Loading... |
Designated contracting states | DE FR |