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Extract from the Register of European Patents

EP About this file: EP1411391

EP1411391 - Method and apparatus for cooling a reticle during lithographic exposure [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  12.03.2010
Database last updated on 25.09.2024
Most recent event   Tooltip12.03.2010Application deemed to be withdrawnpublished on 14.04.2010  [2010/15]
Applicant(s)For all designated states
ASML Holding N.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/23]For all designated states
ASML Holding N.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2004/17]For all designated states
ASML Holding N.V.
De Run 1110
5503 LA Veldhoven / NL
Inventor(s)01 / Del Puerto, Santiago
14 Lillie Lane
Milton New York 12547 / US
02 / Galburt, Daniel N.
520 Belden Hill Road
Wilton Connecticut 06897 / US
03 / McCullough, Andrew W.
20 Aunt Park Lane
Newtown Connecticut 06470 / US
04 / Roux, Stephen
17 Rocky Hill Road
New Fairfield Connecticut 06812 / US
05 / Ottens, Joost Jeroen
Opperstehei 36
Veldhoven 5508 TR / NL
 [2004/17]
Representative(s)van den Hooven, Jan, et al
ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2009/08]Van den Hooven, Jan, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2004/17]Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
Maximilianstrasse 58
80538 München / DE
Application number, filing date03023662.417.10.2003
[2004/17]
Priority number, dateUS2002027340518.10.2002         Original published format: US 273405
[2004/17]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1411391
Date:21.04.2004
Language:EN
[2004/17]
Type: A3 Search report 
No.:EP1411391
Date:12.10.2005
[2005/41]
Search report(s)(Supplementary) European search report - dispatched on:EP31.08.2005
ClassificationIPC:G03F7/20
[2004/17]
CPC:
G03F7/70716 (EP,US); H01L21/027 (KR); G03F7/70875 (EP,US);
F28F3/048 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2006/25]
Former [2004/17]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Verfahren und Vorrichtung zur Kühlung eines Retikels während einer lithographischen Belichtung[2004/17]
English:Method and apparatus for cooling a reticle during lithographic exposure[2004/17]
French:Méthode et dispositif de refroidissement d'un réticule pendant une exposition lithographique[2004/17]
Examination procedure17.11.2005Examination requested  [2006/02]
05.01.2007Despatch of a communication from the examining division (Time limit: M04)
15.05.2007Reply to a communication from the examining division
05.06.2009Despatch of a communication from the examining division (Time limit: M04)
16.10.2009Application deemed to be withdrawn, date of legal effect  [2010/15]
24.11.2009Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2010/15]
Fees paidRenewal fee
25.10.2005Renewal fee patent year 03
13.10.2006Renewal fee patent year 04
16.10.2007Renewal fee patent year 05
14.10.2008Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
31.10.200907   M06   Not yet paid
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]JPH10209042  ;
 [XY]US3171956  (COLEMAN JOHN W, et al) [X] 1,8,9,14-24,29 * column 3 - column 5 * [Y] 2-5,10-13,25-28;
 [A]US5944097  (GUNGOR MEHMET N [US], et al) [A] 30-48* the whole document *;
 [Y]EP1077393  (CANON KK [JP]) [Y] 10-13 * paragraph [0003] * * paragraph [0106] - paragraph [0107] * * figures 17,18 *;
 [XA]US6215642  (SOGARD MICHAEL [US]) [X] 30-33,38,39 * the whole document * [A] 34-37,40-48;
 [A]EP1124161  (ASM LITHOGRAPHY BV [NL]) [A] 1-29 * the whole document *;
 [XY]US2002027644  (BISSCHOPS THEODORUS HUBERTUS J [NL]) [X] 1,9,14,16-18,20-24,29 * the whole document * [Y] 2-5,10-13,25-28;
 [PXA]EP1286221  (CANON KK [JP]) [PX] 1,6-9,14,16-18,20-24,29 * the whole document * [PA] 30-48
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19981130), vol. 1998, no. 13, & JP10209042 A 19980807 (LG SEMICON CO LTD) [Y] 2-5,25-28 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.