blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP1507172

EP1507172 - Lithographic apparatus and apparatus adjustment method [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  12.08.2005
Database last updated on 03.09.2024
Most recent event   Tooltip12.08.2005Application deemed to be withdrawnpublished on 28.09.2005  [2005/39]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2005/07]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Representative(s)Prins, Adrianus Willem, et al
V.O.
Johan de Wittlaan 7
2517 JR Den Haag / NL
[N/P]
Former [2005/07]Prins, Adrianus Willem, Mr. Ir., et al
Vereenigde, Nieuwe Parklaan 97
2587 BN Den Haag / NL
Application number, filing date03077530.812.08.2003
[2005/07]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1507172
Date:16.02.2005
Language:EN
[2005/07]
Search report(s)(Supplementary) European search report - dispatched on:EP09.07.2004
ClassificationIPC:G03F7/20
[2005/07]
CPC:
G03F7/707 (EP,US); G03F7/20 (KR); G03F7/70783 (EP,US);
G03F7/70925 (EP,US); G03F7/70975 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   RO,   SE,   SI,   SK,   TR [2005/07]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:Lithographischer Apparat und Verfahren zur Justierung des Apparats[2005/07]
English:Lithographic apparatus and apparatus adjustment method[2005/07]
French:Appareil lithographique et procédé d'ajustement d'un appareil[2005/07]
Examination procedure15.03.2005Application deemed to be withdrawn, date of legal effect  [2005/39]
20.04.2005Despatch of communication that the application is deemed to be withdrawn, reason: A.91(5)  [2005/39]
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US4213698  (FIRTION VICTOR A [US], et al) [A] 1,8 * abstract * * figures 1-3 * * column 2, line 65 - column 3, line 47 * * column 3, line 62 - column 5, line 53 *;
 [A]US5643472  (ENGELSBERG AUDREY C [US], et al) [A] 1,8 * abstract * * table 1 * * figures 1,7 * * column 4, line 29 - line 44 * * column 5, line 49 - column 6, line 44 ** column 26, line 50 - column 27, line 13 *;
 [A]EP1229575  (SPEEDFAM CO LTD [JP]) [A] 1,8 * abstract * * figure 1 * * paragraph [0001] * * paragraph [0016] - paragraph [0042] *;
 [A]US2002117792  (LEIDY ROBERT K [US], et al) [A] 1,8 * abstract * * figure 3 * * paragraph [0001] - paragraph [0002] * * paragraph [0014] - paragraph [0016] * * paragraph [0021] - paragraph [0024] * * paragraph [0027] - paragraph [0028] * * paragraph [0030] *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.