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Extract from the Register of European Patents

EP About this file: EP1400855

EP1400855 - Device inspection [Right-click to bookmark this link]
Status	The application is deemed to be withdrawn Status updated on 21.05.2010 Database last updated on 22.08.2024
Most recent event Tooltip	21.05.2010	Application deemed to be withdrawn	published on 23.06.2010 [2010/25]
Applicant(s)	For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL
	[N/P]
Former [2004/39]	For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL
Former [2004/13]	For all designated states ASML Netherlands B.V. De Run 1110 5503 LA Veldhoven / NL
Inventor(s)	01 / Den Boef, Arie Jeffrey Het Fort 35 5581 AB Waalre / NL
	02 / Bornebroek, Frank Jan Luikenstraat 41 5615 JL Eindhoven / NL
	03 / Cramer, Hugo Augustinus Joseph Diepmeerven 72 5646 HB Eindhoven / NL
	04 / Dusa, Mircea 1645 Westmont Ave. Campbell CA 95008-5134 / US
	05 / Van Haren, Richard Johannes Franciscus Lei 115 5501 DT Veldhoven / NL
	06 / Kiers, Antione Gaston Marie Lei 53 5501 DW Veldhoven / NL
	07 / Kreuzer, Justin Lloyd 7 Brandy Lane Trumbull CT 06611 / US
	08 / Van der Schaar, Maurits Schepelhei 24 5508 PA Veldhoven / NL
	09 / Van Wijnen, Paul Jacques Heike 11 5508 PA Veldhoven / NL
	10 / Mos, Everhardus Cornelis Laurierstraat 12 5643 AX Eindhoven / NL
	11 / Jager, Pieter Wilhelm Herman Buitenbassinweg 142 3063 TB Rotterdam / NL
	12 / Van der Laan, Hans Olmebeek 6 5501 CL Veldhoven / NL
	13 / Luehrmann, Paul Frank PMB No.294, 223 N. Guadalupe Street Santa Fe, NM 87501-1850, New Mexico / US
	[2004/13]
Representative(s)	Raukema, Age, et al ASML Netherland B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL
	[N/P]
Former [2009/49]	Raukema, Age, et al ASML Netherland B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL
Former [2009/23]	Doolaar, Frans, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL
Former [2009/09]	Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL
Former [2004/13]	van Westenbrugge, Andries Nederlandsch Octrooibureau Scheveningseweg 82 P.O. Box 29720 2502 LS Den Haag / NL
Application number, filing date	03077975.5	19.09.2003
	[2004/13]
Priority number, date	US20020411861P	20.09.2002 Original published format: US 411861 P
	US20020413601P	26.09.2002 Original published format: US 413601 P
	EP20030075954	01.04.2003 Original published format: EP 03075954
	EP20030076422	12.05.2003 Original published format: EP 03076422
	[2004/13]
Filing language	EN
Procedural language	EN
Publication	Type:	A2 Application without search report
	No.:	EP1400855
	Date:	24.03.2004
	Language:	EN
	[2004/13]
	Type:	A3 Search report
	No.:	EP1400855
	Date:	08.04.2009
	[2009/15]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	06.03.2009
Classification	IPC:	G03F7/20	[2004/13]
	CPC:	G03F7/70633 (EP); G01N21/4788 (EP); G03F7/70616 (EP); G03F7/70625 (EP)
Designated contracting states	DE, FR, GB, IT, NL [2009/51]
Former [2004/13]	AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, RO, SE, SI, SK, TR
Title	German:	Inspektion eines Artikels	[2004/13]
	English:	Device inspection	[2004/13]
	French:	Inspection d'un dispositif	[2004/13]
Examination procedure	06.05.2009	Examination requested [2009/25]
	23.06.2009	Despatch of a communication from the examining division (Time limit: M06)
	09.10.2009	Loss of particular rights, legal effect: designated state(s)
	16.11.2009	Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, LU, MC, PT, RO, SE, SI, SK, TR
	09.02.2010	Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2010/25]
	04.03.2010	Application deemed to be withdrawn, date of legal effect [2010/25]
Fees paid	Renewal fee
	15.09.2005	Renewal fee patent year 03
	14.09.2006	Renewal fee patent year 04
	13.09.2007	Renewal fee patent year 05
	11.09.2008	Renewal fee patent year 06
	23.09.2009	Renewal fee patent year 07
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]US5674650 (DIRKSEN PETER [NL], et al) [A] 1,66 * abstract *;
		[XA]US6297876 (BORNEBROEK FRANK [NL]) [X] 61 * abstract * [A] 56;
		[A]WO0225723 (NOVA MEASURING INSTR LTD [IL], et al) [A] 1-7,41,56-60,67 * the whole document *;
		[AX]US2002041373 (LITTAU MICHAEL EUGENE [US], et al) [A] 1,56,66 * the whole document * [X] 61;
		[A]WO02069390 (TIMBRE TECH INC [US]) [A] 1-37,47-60,64,65* the whole document *;
		[AX]WO02070985 (ACCENT OPTICAL TECH INC [US], et al) [A] 1,56,64,68 * the whole document * [X] 61;
		[A]US2002131040 (NIU XINHUI [US], et al) [A] 1-7,41,56-60,67 * figures 5-7 *;
		[PX]US2003002043 (ABDULHALIM IBRAHIM [IL], et al) [PX] 1,2,5-10,50-61,64 * abstract * * page 4, paragraph 50 - page 5, paragraph 50 * * page 6, paragraph 69 - page 7, paragraph 73 *;
		[PX] - HUANG H. ET AL, "Scatterometry-Based Overlay Metrology", PROCEEDINGS OF THE SPIE, (200305), vol. 5038, pages 126 - 137, XP002511176 [PX] 1,3,5-15,50-55,61,64 * Conference date: 24-02-2003; paragraph [2.2.2] * DOI: http://dx.doi.org/10.1117/12.483668
		[PAX] - YANG W. ET AL, "A novel diffraction based spectroscopic method for overlay metrology", PROCEEDINGS OF THE SPIE, (200305), vol. 5038, pages 200 - 207, XP002511177 [PA] 1,3,5-15,50-55,64 * Conference date: 24-02-2003;; figures 2,3 * [PX] 61 DOI: http://dx.doi.org/10.1117/12.483476
		[X] - BISCHOFF J ET AL, "LIGHT DIFFRACTION BASED OVERLAY MEASUREMENT", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA; US, (20010226), vol. 4344, pages 222 - 227, XP008025166 [X] 1,2,5-10,50-61 * Conclusions;; figures 1,2 * DOI: http://dx.doi.org/10.1117/12.436745
		[AX] - J. NEIJZEN ET AL., "Improved wafer stepper alignment performance using an enhanced phase grating alignment system", PROCEEDINGS OF THE SPIE, (1999), vol. 3677, pages 382 - 394, XP002511591 [A] 1-60,62-68 * the whole document * [X] 61
		[A] - XINHUI NIU ET AL, "Specular Spectroscopic Scatterometry", IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, (20010501), vol. 14, no. 2, ISSN 0894-6507, XP011055868 [A] 1-7,41,56-60,67 * the whole document *

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