EP1400855 - Device inspection [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 21.05.2010 Database last updated on 22.08.2024 | Most recent event Tooltip | 21.05.2010 | Application deemed to be withdrawn | published on 23.06.2010 [2010/25] | Applicant(s) | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | [N/P] |
Former [2004/39] | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | ||
Former [2004/13] | For all designated states ASML Netherlands B.V. De Run 1110 5503 LA Veldhoven / NL | Inventor(s) | 01 /
Den Boef, Arie Jeffrey Het Fort 35 5581 AB Waalre / NL | 02 /
Bornebroek, Frank Jan Luikenstraat 41 5615 JL Eindhoven / NL | 03 /
Cramer, Hugo Augustinus Joseph Diepmeerven 72 5646 HB Eindhoven / NL | 04 /
Dusa, Mircea 1645 Westmont Ave. Campbell CA 95008-5134 / US | 05 /
Van Haren, Richard Johannes Franciscus Lei 115 5501 DT Veldhoven / NL | 06 /
Kiers, Antione Gaston Marie Lei 53 5501 DW Veldhoven / NL | 07 /
Kreuzer, Justin Lloyd 7 Brandy Lane Trumbull CT 06611 / US | 08 /
Van der Schaar, Maurits Schepelhei 24 5508 PA Veldhoven / NL | 09 /
Van Wijnen, Paul Jacques Heike 11 5508 PA Veldhoven / NL | 10 /
Mos, Everhardus Cornelis Laurierstraat 12 5643 AX Eindhoven / NL | 11 /
Jager, Pieter Wilhelm Herman Buitenbassinweg 142 3063 TB Rotterdam / NL | 12 /
Van der Laan, Hans Olmebeek 6 5501 CL Veldhoven / NL | 13 /
Luehrmann, Paul Frank PMB No.294, 223 N. Guadalupe Street Santa Fe, NM 87501-1850, New Mexico / US | [2004/13] | Representative(s) | Raukema, Age, et al ASML Netherland B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
Former [2009/49] | Raukema, Age, et al ASML Netherland B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
Former [2009/23] | Doolaar, Frans, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
Former [2009/09] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
Former [2004/13] | van Westenbrugge, Andries Nederlandsch Octrooibureau Scheveningseweg 82 P.O. Box 29720 2502 LS Den Haag / NL | Application number, filing date | 03077975.5 | 19.09.2003 | [2004/13] | Priority number, date | US20020411861P | 20.09.2002 Original published format: US 411861 P | US20020413601P | 26.09.2002 Original published format: US 413601 P | EP20030075954 | 01.04.2003 Original published format: EP 03075954 | EP20030076422 | 12.05.2003 Original published format: EP 03076422 | [2004/13] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1400855 | Date: | 24.03.2004 | Language: | EN | [2004/13] | Type: | A3 Search report | No.: | EP1400855 | Date: | 08.04.2009 | [2009/15] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 06.03.2009 | Classification | IPC: | G03F7/20 | [2004/13] | CPC: |
G03F7/70633 (EP);
G01N21/4788 (EP);
G03F7/70616 (EP);
G03F7/70625 (EP)
| Designated contracting states | DE, FR, GB, IT, NL [2009/51] |
Former [2004/13] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, RO, SE, SI, SK, TR | Title | German: | Inspektion eines Artikels | [2004/13] | English: | Device inspection | [2004/13] | French: | Inspection d'un dispositif | [2004/13] | Examination procedure | 06.05.2009 | Examination requested [2009/25] | 23.06.2009 | Despatch of a communication from the examining division (Time limit: M06) | 09.10.2009 | Loss of particular rights, legal effect: designated state(s) | 16.11.2009 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, LU, MC, PT, RO, SE, SI, SK, TR | 09.02.2010 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2010/25] | 04.03.2010 | Application deemed to be withdrawn, date of legal effect [2010/25] | Fees paid | Renewal fee | 15.09.2005 | Renewal fee patent year 03 | 14.09.2006 | Renewal fee patent year 04 | 13.09.2007 | Renewal fee patent year 05 | 11.09.2008 | Renewal fee patent year 06 | 23.09.2009 | Renewal fee patent year 07 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US5674650 (DIRKSEN PETER [NL], et al) [A] 1,66 * abstract *; | [XA]US6297876 (BORNEBROEK FRANK [NL]) [X] 61 * abstract * [A] 56; | [A]WO0225723 (NOVA MEASURING INSTR LTD [IL], et al) [A] 1-7,41,56-60,67 * the whole document *; | [AX]US2002041373 (LITTAU MICHAEL EUGENE [US], et al) [A] 1,56,66 * the whole document * [X] 61; | [A]WO02069390 (TIMBRE TECH INC [US]) [A] 1-37,47-60,64,65* the whole document *; | [AX]WO02070985 (ACCENT OPTICAL TECH INC [US], et al) [A] 1,56,64,68 * the whole document * [X] 61; | [A]US2002131040 (NIU XINHUI [US], et al) [A] 1-7,41,56-60,67 * figures 5-7 *; | [PX]US2003002043 (ABDULHALIM IBRAHIM [IL], et al) [PX] 1,2,5-10,50-61,64 * abstract * * page 4, paragraph 50 - page 5, paragraph 50 * * page 6, paragraph 69 - page 7, paragraph 73 *; | [PX] - HUANG H. ET AL, "Scatterometry-Based Overlay Metrology", PROCEEDINGS OF THE SPIE, (200305), vol. 5038, pages 126 - 137, XP002511176 [PX] 1,3,5-15,50-55,61,64 * Conference date: 24-02-2003; paragraph [2.2.2] * DOI: http://dx.doi.org/10.1117/12.483668 | [PAX] - YANG W. ET AL, "A novel diffraction based spectroscopic method for overlay metrology", PROCEEDINGS OF THE SPIE, (200305), vol. 5038, pages 200 - 207, XP002511177 [PA] 1,3,5-15,50-55,64 * Conference date: 24-02-2003;; figures 2,3 * [PX] 61 DOI: http://dx.doi.org/10.1117/12.483476 | [X] - BISCHOFF J ET AL, "LIGHT DIFFRACTION BASED OVERLAY MEASUREMENT", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA; US, (20010226), vol. 4344, pages 222 - 227, XP008025166 [X] 1,2,5-10,50-61 * Conclusions;; figures 1,2 * DOI: http://dx.doi.org/10.1117/12.436745 | [AX] - J. NEIJZEN ET AL., "Improved wafer stepper alignment performance using an enhanced phase grating alignment system", PROCEEDINGS OF THE SPIE, (1999), vol. 3677, pages 382 - 394, XP002511591 [A] 1-60,62-68 * the whole document * [X] 61 | [A] - XINHUI NIU ET AL, "Specular Spectroscopic Scatterometry", IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, (20010501), vol. 14, no. 2, ISSN 0894-6507, XP011055868 [A] 1-7,41,56-60,67 * the whole document * |