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EP1338924
European procedure
Extract from the Register of European Patents
EP About this file: EP1338924
| EP1338924 - Alignment method and device manufacturing method [Right-click to bookmark this link] | |||
| Former [2003/35] | Lithographic apparatus, alignment method and device manufacturing method | ||
| [2006/24] | Status | No opposition filed within time limit Status updated on 14.09.2007 Database last updated on 26.03.2026 | Most recent event Tooltip | 14.09.2007 | No opposition filed within time limit | published on 17.10.2007 [2007/42] | Applicant(s) | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2004/39] | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | ||
| Former [2003/35] | For all designated states ASML Netherlands B.V. De Run 1110 5503 LA Veldhoven / NL | Inventor(s) | 01 /
Best, Keith 1971 N Capitol Avenue San Jose, CA 95132 / US | 02 /
Friz, Alex 1971 N Capitol Avenue San Jose, CA 95132 / US | 03 /
Consolini, Joe 1971 N Capitol Avenue San Jose, CA 95132 / US | 04 /
Van Buel, Henricus Wilhelmus Maria Verwerstraat 88 5612 EE Eindhoven / NL | 05 /
Gui, Cheng-Qun Klimheuvel 6 5685 AZ Best / NL | [2006/26] |
| Former [2003/35] | 01 /
Best, Keith 1971 N Capitol Avenue San Jose, CA 95132 / US | ||
| 02 /
Friz, Alex 1971 N Capitol Avenue San Jose, CA 95132 / US | |||
| 03 /
Consolini, Joe 1971 N Capitol Avenue San Jose, CA 95132 / US | |||
| 04 /
Van Buel, Henricus Wilhelmus Maria Maria of Verwerstraat 88 5612 EE Eindhoven / NL | |||
| 05 /
Gui, Cheng-Qun Klimheuvel 6 5685 AZ Best / NL | Representative(s) | Leeming, John Gerard J A Kemp 14 South Square Gray's Inn London WC1R 5JJ / GB | [N/P] |
| Former [2003/35] | Leeming, John Gerard J.A. Kemp & Co., 14 South Square, Gray's Inn London WC1R 5JJ / GB | Application number, filing date | 03250891.3 | 13.02.2003 | [2003/35] | Priority number, date | EP20020251030 | 15.02.2002 Original published format: EP 02251030 | [2003/35] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1338924 | Date: | 27.08.2003 | Language: | EN | [2003/35] | Type: | A3 Search report | No.: | EP1338924 | Date: | 22.12.2004 | [2004/52] | Type: | B1 Patent specification | No.: | EP1338924 | Date: | 08.11.2006 | Language: | EN | [2006/45] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 05.11.2004 | Classification | IPC: | G03F9/00 | [2003/35] | CPC: |
G03F9/7069 (EP);
G03F9/7076 (EP);
G03F9/7084 (EP)
| Designated contracting states | DE, FR, GB, IT, NL [2005/37] |
| Former [2003/35] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, SE, SI, SK, TR | Title | German: | Verfahren zur Ausrichtung und Verfahren zur Herstellung eines Artikels | [2006/24] | English: | Alignment method and device manufacturing method | [2006/24] | French: | Méthode d'alignement et méthode pour la fabrication d'un dispositif | [2006/24] |
| Former [2003/35] | Lithographischer Apparat, Verfahren zur Ausrichtung und Verfahren zur Herstellung eines Artikels | ||
| Former [2003/35] | Lithographic apparatus, alignment method and device manufacturing method | ||
| Former [2003/35] | Appareil lithographique, méthode d'alignement et méthode pour la fabrication d'un dispositif | Examination procedure | 04.04.2005 | Examination requested [2005/22] | 24.05.2005 | Despatch of a communication from the examining division (Time limit: M04) | 19.09.2005 | Reply to a communication from the examining division | 02.06.2006 | Communication of intention to grant the patent | 20.09.2006 | Fee for grant paid | 20.09.2006 | Fee for publishing/printing paid | Opposition(s) | 09.08.2007 | No opposition filed within time limit [2007/42] | Fees paid | Renewal fee | 08.02.2005 | Renewal fee patent year 03 | 15.02.2006 | Renewal fee patent year 04 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XA] EP1148390 (SVG LITHOGRAPHY SYSTEMS INC et al.) [X] 1,3-5 * figure 1; claims 1,24,26 *[A] 2,6-13 | [Y] US5950093 (WEI CHI-HUNG et al.) [Y] 1-13 * figures 2A-2F; claims 1-8 * | [Y] US4758864 (ENDO KAZUMASA et al.) [Y] 1-13 * figure 3; claims 1,2 * | [PX] EP1223469 (ASML NETHERLANDS BV et al.) [PX] 1-13 * paragraph [0022]; figure 2; claim 1 * | [XY] WONG ET AL.: "EXPERIMENTAL AND SIMULATION OF ALIGNMENT MARKS", SPIE OPTICAL/LASER PHOTOGRAPHY, vol. 1463, 1991, pages 315 - 323, XP000988982 [X] 1,3-5 * page 316, line 37 - page 317, line 15; figure 6 * [Y] 2,6-13 |