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EP1420302
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EP About this file: EP1420302
| EP1420302 - Lithographic apparatus and device manufacturing method [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 27.11.2015 Database last updated on 03.01.2025 | Most recent event Tooltip | 27.11.2015 | Application deemed to be withdrawn | published on 30.12.2015 [2015/53] | Applicant(s) | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2004/39] | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | ||
| Former [2004/21] | For all designated states ASML Netherlands B.V. De Run 1110 5503 LA Veldhoven / NL | Inventor(s) | 01 /
Bleeker, Arno Jan Steenovens 67 5563 CE Westerhoven / NL | [2004/21] | Representative(s) | Corcoran, Gregory Martin Mason, et al ASML Netherlands B.V. Corporate Intellectual Property De Run 6501 P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/23] | Corcoran, Gregory Martin Mason, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2009/09] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2004/21] | Leeming, John Gerard J.A. Kemp & Co., 14 South Square, Gray's Inn London WC1R 5JJ / GB | Application number, filing date | 03257194.5 | 14.11.2003 | [2004/21] | Priority number, date | EP20020257938 | 18.11.2002 Original published format: EP 02257938 | [2004/21] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1420302 | Date: | 19.05.2004 | Language: | EN | [2004/21] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 01.03.2004 | Classification | IPC: | G03F7/20 | [2004/21] | CPC: |
G03F7/70341 (EP)
| Designated contracting states | DE, FR, GB, IT, NL [2005/06] |
| Former [2004/21] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, RO, SE, SI, SK, TR | Title | German: | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | [2004/21] | English: | Lithographic apparatus and device manufacturing method | [2004/21] | French: | Appareil lithographique et méthode de fabrication d'un dispositif | [2004/21] | Examination procedure | 13.05.2004 | Examination requested [2004/29] | 16.08.2004 | Despatch of a communication from the examining division (Time limit: M06) | 19.04.2005 | Reply to a communication from the examining division | 05.11.2009 | Despatch of a communication from the examining division (Time limit: M06) | 03.05.2010 | Reply to a communication from the examining division | 14.04.2014 | Despatch of a communication from the examining division (Time limit: M04) | 06.08.2014 | Reply to a communication from the examining division | 23.03.2015 | Despatch of a communication from the examining division (Time limit: M04) | 04.08.2015 | Application deemed to be withdrawn, date of legal effect [2015/53] | 26.08.2015 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2015/53] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 16.08.2004 | Request for further processing for: | 19.04.2005 | Request for further processing filed | 19.04.2005 | Full payment received (date of receipt of payment) Request granted | 03.05.2005 | Decision despatched | Fees paid | Renewal fee | 14.11.2005 | Renewal fee patent year 03 | 13.11.2006 | Renewal fee patent year 04 | 16.11.2007 | Renewal fee patent year 05 | 17.11.2008 | Renewal fee patent year 06 | 24.11.2009 | Renewal fee patent year 07 | 23.11.2010 | Renewal fee patent year 08 | 23.11.2011 | Renewal fee patent year 09 | 23.11.2012 | Renewal fee patent year 10 | 28.11.2013 | Renewal fee patent year 11 | 25.11.2014 | Renewal fee patent year 12 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]JPH10303114 ; | [X]DD224448 (ZEISS JENA VEB CARL [DD]) [X] 1-4,10 * page 3, paragraph 1 - page 6, paragraph 2 * * figure - *; | [A]EP0605103 (CANON KK [JP]) [A] 1,10 * column 5, line 41 - column 6, line 45 ** figure 1 *; | [A]US2002163629 (SWITKES MICHAEL [US], et al) [A] 1,10 * paragraph [0028] - paragraph [0051] * * figure 5 * | [X] - PATENT ABSTRACTS OF JAPAN, (19990226), vol. 1999, no. 02, & JP10303114 A 19981113 (NIKON CORP) [X] 1-3,10 * abstract * * figure 8 * | by applicant | DD221563 | DD224448 | WO9840791 | JPH10303114 | US5969441 |