EP1479103 - METHOD OF CREATING HIGH-QUALITY RELAXED SiGe-ON-INSULATOR FOR STRAINED Si CMOS APPLICATIONS [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 10.06.2005 Database last updated on 31.08.2024 | Most recent event Tooltip | 10.06.2005 | Withdrawal of application | published on 27.07.2005 [2005/30] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
Former [2004/48] | For all designated states International Business Machines Corporation New Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
BEDELL, Stephen, W. 32 Nicole Drive Wappingers Falls, NY 12590 / US | 02 /
CHU, Jack, O. 44 Shelburne Lane Manhasset Hills, NY 11040 / US | 03 /
FOGEL, KEITH E. IBM UK Ltd.,INTELL.PROP.LAW, HURSLEY PARK WINCHESTER, HAMPSHIRE, SO21 2JN / GB | 04 /
KOESTER, Stephen, J. 5 Iroquois Road Ossining, NY 10562 / US | 05 /
SADANA, Devendra, K. 90 Sky Top Drive Pleasantville, NY 10570 / US | 06 /
OTT, John, Albrecht, 37 Lindon Avenue Greenwood Lake Orange County, NY 10925 / US | [2005/05] |
Former [2004/48] | 01 /
BEDELL, Stephen, W. 32 Nicole Drive Wappingers Falls, NY 12590 / US | ||
02 /
CHU, Jack, O. 44 Shelburne Lane Manhasset Hills, NY 11040 / US | |||
03 /
FOGEL, Keith, E. 4 Lucs Lane Mohegan Lake, NY 10547 / US | |||
04 /
KOESTER, Stephen, J. 5 Iroquois Road Ossining, NY 10562 / US | |||
05 /
SADANA, Devendra, K. 90 Sky Top Drive Pleasantville, NY 10570 / US | |||
06 /
OTT, John, Albrecht, 37 Lindon Avenue Greenwood Lake Orange County, NY 10925 / US | Representative(s) | Gascoyne, Belinda Jane IBM United Kingdom Limited MP 110 Hursley Park Winchester Hampshire SO21 2JN / GB | [N/P] |
Former [2004/48] | Mather, Belinda IBM United Kingdom Ltd., MP 110, Hursley Park Winchester, Hampshire SO21 2JN / GB | Application number, filing date | 03731957.1 | 16.01.2003 | [2004/48] | WO2003US01431 | Priority number, date | US20020055138 | 23.01.2002 Original published format: US 55138 | [2004/48] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO03063229 | Date: | 31.07.2003 | Language: | EN | [2003/31] | Type: | A1 Application with search report | No.: | EP1479103 | Date: | 24.11.2004 | Language: | EN | The application published by WIPO in one of the EPO official languages on 31.07.2003 takes the place of the publication of the European patent application. | [2004/48] | Search report(s) | International search report - published on: | US | 31.07.2003 | (Supplementary) European search report - dispatched on: | EP | 30.12.2004 | Classification | IPC: | H01L21/762, H01L21/225, H01L21/324, H01L21/20, H01L21/331 | [2005/06] | CPC: |
H01L21/02378 (EP,US);
H01L21/20 (KR);
H01L21/02612 (EP,US);
H01L21/02381 (EP,US);
H01L21/02488 (EP,US);
H01L21/02532 (EP,US);
H01L21/2251 (EP,US);
H01L21/324 (EP,US);
H01L21/76243 (EP,US);
H01L29/66916 (EP,US);
H01L27/1203 (EP,US);
Y10S438/938 (EP,US);
|
Former IPC [2004/48] | H01L21/331 | Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, SE, SI, SK, TR [2004/48] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | Title | German: | VERFAHREN ZUR ERZEUGUNG EINES QUALITATIV HOCHWERTIGEN RELAXIERTEN SiGe-ON-ISOLATORS FÜR CMOS-ANWENDUNGEN MIT VERSPANNTEM Si | [2004/48] | English: | METHOD OF CREATING HIGH-QUALITY RELAXED SiGe-ON-INSULATOR FOR STRAINED Si CMOS APPLICATIONS | [2004/48] | French: | PROCEDE DE PRODUCTION DE SIGE SUR ISOLANT DE HAUTE QUALITE A RELAXATION POUR APPLICATIONS CMOS SI CONTRAINT | [2004/48] | Entry into regional phase | 11.08.2004 | National basic fee paid | 11.08.2004 | Search fee paid | 11.08.2004 | Designation fee(s) paid | 11.08.2004 | Examination fee paid | Examination procedure | 20.08.2003 | Request for preliminary examination filed International Preliminary Examining Authority: US | 11.08.2004 | Amendment by applicant (claims and/or description) | 11.08.2004 | Examination requested [2004/48] | 29.03.2005 | Application withdrawn by applicant [2005/30] | Fees paid | Renewal fee | 17.01.2005 | Renewal fee patent year 03 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY]JP2000243946 ; | [DXY]US5759898 (EK BRUCE A [US], et al) [DX] 1-3,8,9,12-17 * column 1, line 10 - line 41 * * column 1, line 57 - column 2, line 34 * * column 2, line 63 - column 4, line 6, paragraphs 1,2 * [Y] 6,7,10-12,17; | [XAY]WO9953539 (MASSACHUSETTS INST TECHNOLOGY [US]) [X] 13-15 * page 8, line 29 - page 9, line 6 * * page 18, line 4 - line 9 * * page 18, line 16 - line 25; figure 10 * [A] 1-3,8-12 [Y] 16; | [PXA]WO0215244 (CHENG ZHI YUAN [US]) [PX] 13-15,17 * page 1, line 10 - line 18 * * page 5, line 22 - line 27; figure 1C * * page 5, line 28 - line 34; figure 3 *[PA] 1-3,8-12; | [PXA]EP1248294 (CANON KK [JP]) [PX] 1-4,8,9,12-17 * column 7, line 55 - column 8, line 9; figure 1A * * column 8, line 55 - line 58 * * column 9, line 55 - column 10, line 22; figure 1B * * column 11, line 13 - line 43; figures 1D,1E * * column 11, line 53 - column 12, line 35; figures 2A,2B * * column 13, line 23 - line 32 * * column 16, line 29 - line 42; figure 3D * * column 16, line 55 - column 17, line 3; figure 3E * [PA] 5,6; | [PXA]WO02082514 (MASSACHUSETTS INST TECHNOLOGY [US]) [PX] 13-15,17 * page 1, line 8 - line 12 * * page 3, line 27 - line 31 * * page 4, line 27 - line 34 * * page 5, line 9 - line 34; figures 1D,1E * * page 6, line 1 - line 7; figure 3 * [PA] 1-3,8-12 | [XY] - PATENT ABSTRACTS OF JAPAN, (20010103), vol. 2000, no. 12, & JP2000243946 A 20000908 (TOSHIBA CORP) [X] 1-5,8,9,13-17 * abstract * * paragraph [0060] - paragraph [0062]; figure 5 * * paragraph [0068] - paragraph [0076] * * paragraph [0078] - paragraph [0081]; figure 8 * [Y] 6,7,10-12,16,17 | International search | [Y]US5846867 (GOMI TAKAYUKI [JP], et al); | [Y]US6190975 (KUBO MINORU [JP], et al) |