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EP1474825
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EP About this file: EP1474825
| EP1474825 - METHOD AND DEVICE TO FORM HIGH QUALITY OXIDE LAYERS OF DIFFERENT THICKNESS IN ONE PROCESSING STEP [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 07.10.2011 Database last updated on 02.11.2024 | Most recent event Tooltip | 07.10.2011 | Application deemed to be withdrawn | published on 09.11.2011 [2011/45] | Applicant(s) | For all designated states NXP B.V. High Tech Campus 60 5656 AG Eindhoven / NL | [2007/31] |
| Former [2004/46] | For all designated states Koninklijke Philips Electronics N.V. Groenewoudseweg 1 5621 BA Eindhoven / NL | Inventor(s) | 01 /
LOO, Josine, J., G., P. Prof. Holstlaan 6 NL-5656 AA Eindhoven / NL | 02 /
PONOMAREV, Youri Prof. Holstlaan 6 NL-5656 AA Eindhoven / NL | 03 /
SCHAIJK, Robertus, T., F. Prof. Holstlaan 6 NL-5656 AA Eindhoven / NL | [2004/46] | Representative(s) | Schouten, Marcus Maria, et al NXP B.V. Intellectual Property & Licensing High Tech Campus 60 5656 AG Eindhoven / NL | [N/P] |
| Former [2009/44] | Schouten, Marcus Maria, et al NXP B.V. IP & L Department High Tech Campus 32 5656 AE Eindhoven / NL | ||
| Former [2008/14] | van der Veer, Johannis Leendert, et al NXP Semiconductors Intellectual Property Department High Tech Campus 60 5656 AG Eindhoven / NL | ||
| Former [2007/01] | Pennings, Johannes, et al NXP Semiconductors Intellectual Property Department High Tech Campus 60 5656 AG Eindhoven / NL | ||
| Former [2004/46] | Eleveld, Koop Jan Philips Intellectual Property & Standards, P.O. Box 220 5600 AE Eindhoven / NL | Application number, filing date | 03734785.3 | 20.01.2003 | [2004/46] | WO2003IB00136 | Priority number, date | EP20020075425 | 01.02.2002 Original published format: EP 02075425 | [2004/46] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO03065437 | Date: | 07.08.2003 | Language: | EN | [2003/32] | Type: | A2 Application without search report | No.: | EP1474825 | Date: | 10.11.2004 | Language: | EN | The application published by WIPO in one of the EPO official languages on 07.08.2003 takes the place of the publication of the European patent application. | [2004/46] | Search report(s) | International search report - published on: | EP | 13.11.2003 | Classification | IPC: | H01L21/316, H01L21/8247, H01L21/28, H01L21/8234, H01L21/8238, H01L27/102 | [2004/46] | CPC: |
H01L21/823462 (EP,KR,US);
H01L21/225 (KR);
H10B41/30 (EP,US);
H01L21/02554 (KR);
H01L21/32055 (KR);
H01L21/823468 (EP,KR,US);
H01L29/40114 (EP,US);
H01L29/66825 (EP,KR,US);
H10B41/35 (EP,KR,US);
H10B69/00 (EP,US);
H01L21/02238 (EP);
H01L21/02255 (EP);
H01L21/31662 (US)
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| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, SE, SI, SK, TR [2004/46] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | Title | German: | EINSTUFIGES VERFAHREN ZUR HERSTELLUNG VON OXIDSCHICHTEN HOHER QUALITÄT UND UNTERSCHIEDLICHER DICKE | [2004/46] | English: | METHOD AND DEVICE TO FORM HIGH QUALITY OXIDE LAYERS OF DIFFERENT THICKNESS IN ONE PROCESSING STEP | [2004/46] | French: | PROCEDE ET DISPOSITIF DE FORMATION, EN UNE SEULE ETAPE DE TRAITEMENT, DE COUCHES D'OXYDES DE HAUTE QUALITE DE DIFFERENTES EPAISSEURS. | [2004/46] | Entry into regional phase | 01.09.2004 | National basic fee paid | 01.09.2004 | Designation fee(s) paid | 01.09.2004 | Examination fee paid | Examination procedure | 01.09.2004 | Examination requested [2004/46] | 04.01.2011 | Despatch of a communication from the examining division (Time limit: M04) | 17.05.2011 | Application deemed to be withdrawn, date of legal effect [2011/45] | 22.06.2011 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2011/45] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 04.01.2011 | Fees paid | Renewal fee | 31.01.2005 | Renewal fee patent year 03 | 31.01.2006 | Renewal fee patent year 04 | 31.01.2007 | Renewal fee patent year 05 | 31.01.2008 | Renewal fee patent year 06 | 02.02.2009 | Renewal fee patent year 07 | 01.02.2010 | Renewal fee patent year 08 | 31.01.2011 | Renewal fee patent year 09 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [XA]JPS56157024 ; | [A]JPS5662366 ; | [A]JPS5975654 ; | [A]EP0465045 (AMERICAN TELEPHONE & TELEGRAPH [US]); | [XA]US5918116 (CHITTIPEDDI SAILESH [US]); | [XA]US6274429 (MISRA SUDHANSHU [US]); | [PXA]US2002127806 (CHEN WEI-WEN [TW]) | Examination | US4210993 | US5208175 | US5970352 |