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EP1515362

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Extract from the Register of European Patents

EP About this file: EP1515362

EP1515362 - PLASMA PROCESSING SYSTEM, PLASMA PROCESSING METHOD, PLASMA FILM DEPOSITION SYSTEM, AND PLASMA FILM DEPOSITION METHOD [Right-click to bookmark this link]
Status	No opposition filed within time limit Status updated on 10.05.2013 Database last updated on 26.04.2025
Most recent event Tooltip	10.05.2013	No opposition filed within time limit	published on 12.06.2013 [2013/24]
Applicant(s)	For all designated states MITSUBISHI HEAVY INDUSTRIES, LTD. 16-5, Konan 2-chome, Minato-ku Tokyo 108-8215 / JP
	[2012/27]
Former [2005/11]	For all designated states Mitsubishi Heavy Industries, Ltd. 16-5, Konan 2-chome, Minato-ku Tokyo 108-8215 / JP
Inventor(s)	01 / MATSUDA, Ryuichi c/o Mitsubishi Heavy Industries, Ltd. 1-1, Arai-cho Shinhama 2-chome Takasago-shi, Hyogo 676-8686 / JP
	02 / SHIMAZU, Tadashi c/o Mitsubishi Heavy Industries, Ltd. 1-1, Arai-cho Shinhama 2-chome Takasago-shi, Hyogo 676-8686 / JP
	03 / INOUE, Masahiko c/o Mitsubishi Heavy Industries, Ltd. 1-1, Wadasaki-cho 1-chome Hyogo-ku Kobe-shi, Hyogo 652-8585 / JP
	[2012/18]
Former [2012/07]	01 / MATSUDA, Ryuichi c/o Mitsubishi Heavy Industries, Ltd. 1-1, Arai-cho Shinma 2-chome Takasago-shi, Hyogo 676-8686 / JP
	02 / SHIMAZU, Tadashi c/o Mitsubishi Heavy Industries, Ltd. 1-1, Arai-cho Shinhama 2-chome Takasago-shi, Hyogo 676-8686 / JP
	03 / INOUE, Masahiko c/o Mitsubishi Heavy Industries, Ltd. 1-1, Wadasaki-cho 1-chome Hyogo-ku Kobe-shi, Hyogo 652-8585 / JP
Former [2005/30]	01 / MATSUDA, Ryuichi, c/o Mitsubishi Heavy Ind. Ltd. 1-1, Arai-cho Shinma 2-chome Takasago-shi, Hyogo 676-8686 / JP
	02 / SHIMAZU, Tadashi, c/o Mitsubishi Heavy Ind. Ltd. 1-1, Arai-cho Shinhama 2-chome Takasago-shi, Hyogo 676-8686 / JP
	03 / INOUE, Masahiko, c/o Mitsubishi Heavy Ind. Ltd. 1-1, Wadasaki-cho 1-chome, Hyogo-ku Kobe-shi, Hyogo 652-8585 / JP
Former [2005/11]	01 / MATSUDA, Ryuichi, c/o TMitsubishi Heavy Ind. Ltd. 1-1, Arai-cho Shinma 2-chome Takasago-shi, Hyogo / JP
	02 / SHIMAZU, Tadashi, c/o Mitsubishi Heavy Ind. Ltd. 1-1, Arai-cho Shinhama 2-chome Takasago-shi, Hyogo / JP
	03 / INOUE, Masahiko, c/o Mitsubishi Heavy Ind. Ltd. 1-1, Wadasaki-cho 1-chome, Hyogo-ku Kobe-shi, Hyogo 65 / JP
Representative(s)	Henkel & Partner mbB Patentanwaltskanzlei, Rechtsanwaltskanzlei Maximiliansplatz 21 80333 München / DE
	[N/P]
Former [2012/27]	Henkel, Breuer & Partner Patentanwälte Maximiliansplatz 21 80333 München / DE
Former [2005/11]	Henkel, Feiler & Hänzel Möhlstrasse 37 81675 München / DE
Application number, filing date	03760870.0	17.06.2003
	[2005/11]
	WO2003JP07650
Priority number, date	JP20020178129	19.06.2002 Original published format: JP 2002178129
	JP20020351250	03.12.2002 Original published format: JP 2002351250
	[2005/11]
Filing language	JA
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO2004001822
	Date:	31.12.2003
	Language:	EN
	[2004/01]
	Type:	A1 Application with search report
	No.:	EP1515362
	Date:	16.03.2005
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 31.12.2003 takes the place of the publication of the European patent application.
	[2005/11]
	Type:	B1 Patent specification
	No.:	EP1515362
	Date:	04.07.2012
	Language:	EN
	[2012/27]
Search report(s)	International search report - published on:	JP	31.12.2003
	(Supplementary) European search report - dispatched on:	EP	16.06.2009
Classification	IPC:	H01J37/32, C23C16/507	[2012/01]
	CPC:	H01J37/321 (EP,KR,US); C23C16/507 (EP,KR,US)
	Former IPC [2005/11]	H01L21/205, H01L21/31, C23C16/507
Designated contracting states	DE, FR, GB [2005/41]
Former [2005/11]	AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, RO, SE, SI, SK, TR
Title	German:	PLASMAVERARBEITUNGSSYSTEM, PLASMAVERARBEITUNGSVERFAHREN, PLASMAFILMABLAGERUNGSSYSTEM UND PLASMAFILMABLAGERUNGSVERFAHREN	[2005/11]
	English:	PLASMA PROCESSING SYSTEM, PLASMA PROCESSING METHOD, PLASMA FILM DEPOSITION SYSTEM, AND PLASMA FILM DEPOSITION METHOD	[2005/11]
	French:	SYSTEME DE TRAITEMENT AU PLASMA, PROCEDE DE TRAITEMENT AU PLASMA, SYSTEME DE DEPOT DE FILM AU PLASMA ET PROCEDE DE DEPOT DE FILM AU PLASMA	[2005/11]
Entry into regional phase	05.11.2004	Translation filed
	05.11.2004	National basic fee paid
	05.11.2004	Search fee paid
	05.11.2004	Designation fee(s) paid
	05.11.2004	Examination fee paid
Examination procedure	05.11.2004	Amendment by applicant (claims and/or description)
	05.11.2004	Examination requested [2005/11]
	03.02.2010	Despatch of a communication from the examining division (Time limit: M04)
	07.06.2010	Reply to a communication from the examining division
	23.01.2012	Communication of intention to grant the patent
	18.05.2012	Fee for grant paid
	18.05.2012	Fee for publishing/printing paid
Divisional application(s)	EP10166701.2 / EP2224468
	The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 03.02.2010
Opposition(s)	05.04.2013	No opposition filed within time limit [2013/24]
Fees paid	Renewal fee
	29.06.2005	Renewal fee patent year 03
	29.06.2006	Renewal fee patent year 04
	29.06.2007	Renewal fee patent year 05
	31.03.2008	Renewal fee patent year 06
	26.06.2009	Renewal fee patent year 07
	29.06.2010	Renewal fee patent year 08
	30.06.2011	Renewal fee patent year 09
	31.03.2012	Renewal fee patent year 10
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[Y]WO0000993 (LAM RES CORP [US]) [Y] 2,8 * page 5, line 25 - page 7, line 22; figure 3 *;
		[A]WO0205308 (APPLIED MATERIALS INC [US]) [A] 1-11 * page 17, paragraph 2 - page 18, paragraph 1; figure 8 *;
		[A]US6350347 (ISHII NOBUO [JP], et al) [A] 1-11* column 9, line 59 - column 10, line 35; figure 8 *;
		[XAY]US6401652 (MOHN JONATHAN D [US], et al) [X] 1,4-7,10,11 * column 2, line 57 - column 3, line 15 * * column 6, line 58 - line 65; figures 7A,7C * * figures 10,11 * * column 8, line 18 - line 25 * [A] 3,9 [Y] 2,8
	International search	[A]JPH07245195 (MATSUSHITA ELECTRIC IND CO LTD);
		[A]JPH08279493 (ANELVA CORP);
		[A]EP0759632 (TOKYO ELECTRON LTD [JP]);
		[X]JPH1070108 (NEC CORP, et al);
		[A]JPH11260596 (HITACHI LTD);
		[A]JP2000068254 (MATSUSHITA ELECTRONICS CORP);
		[X]US6093457 (OKUMURA TOMOHIRO [JP], et al);
		[A]EP1079671 (JUSUNG ENG CO LTD [KR], et al)
	by applicant	US6401652

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