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Extract from the Register of European Patents

EP About this file: EP1526191

EP1526191 - ELECTRODE FOR ELECTRIC DISCHARGE SURFACE TREATMENT, ELECTRIC DISCHARGE SURFACE TREATMENT METHOD AND ELECTRIC DISCHARGE SURFACE TREATMENT APPARATUS [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  27.05.2011
Database last updated on 14.09.2024
Most recent event   Tooltip19.10.2012Lapse of the patent in a contracting state
New state(s): TR		published on 21.11.2012  [2012/47]
Applicant(s)For all designated states
MITSUBISHI DENKI KABUSHIKI KAISHA
7-3, Marunouchi 2-chome Chiyoda-ku
Tokyo 100-8310 / JP
For all designated states
IHI Corporation
1-1, Toyosu 3-chome
Koto-ku
Tokyo 135-8710 / JP
[N/P]
Former [2010/24]For all designated states
MITSUBISHI DENKI KABUSHIKI KAISHA
7-3, Marunouchi 2-chome Chiyoda-ku
Tokyo 100-8310 / JP
For all designated states
IHI Corporation
1-1, Toyosu 3-chome Koto-ku
Tokyo 135-8710 / JP
Former [2006/18]For all designated states
MITSUBISHI DENKI KABUSHIKI KAISHA
7-3, Marunouchi 2-chome Chiyoda-ku
Tokyo 100-8310 / JP
For all designated states
Ishikawajima-Harima Heavy Industries Co., Ltd.
2-1, Ohtemachi 2-chome
Chiyoda-ku, Tokyo 100-8182 / JP
Former [2005/17]For all designated states
MITSUBISHI DENKI KABUSHIKI KAISHA
2-3, Marunouchi 2-chome, Chiyoda-ku
Tokyo 100-8310 / JP
For all designated states
Ishikawajima-Harima Heavy Industries Co., Ltd.
2-1, Ohtemachi 2-chome
Chiyoda-ku, Tokyo 100-8182 / JP
Inventor(s)01 / GOTO, Akihiro Mitsubishi Denki Kabushiki Kaisha
2-3, Marunouchi 2-chome
Chiyoda-ku, Tokyo 100-8310 / JP
02 / AKIYOSHI, Masao Mitsubishi Denki Kabushiki Kaisha
2-3, Marunouchi 2-chome
Chiyoda-ku, Tokyo 100-8310 / JP
03 / OCHIAI, Hiroyuki
216-14, Mizuno
Sayama-shi, Saitama 350-1317 / JP
04 / WATANABE, Mitsutoshi
1-32-12, Nogata
Nakano-ku, Tokyo 165-0027 / JP
 [2005/17]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastrasse 30
81925 München / DE
[N/P]
Former [2008/31]HOFFMANN EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Former [2005/17]HOFFMANN EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Application number, filing date03771434.230.07.2003
[2005/17]
WO2003JP09687
Priority number, dateJP2002022097130.07.2002         Original published format: JP 2002220971
[2005/17]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2004011696
Date:05.02.2004
Language:EN
[2004/06]
Type: A1 Application with search report 
No.:EP1526191
Date:27.04.2005
Language:EN
The application published by WIPO in one of the EPO official languages on 05.02.2004 takes the place of the publication of the European patent application.
[2005/17]
Type: B1 Patent specification 
No.:EP1526191
Date:21.07.2010
Language:EN
[2010/29]
Search report(s)International search report - published on:JP05.02.2004
(Supplementary) European search report - dispatched on:EP07.10.2008
ClassificationIPC:C23C26/00
[2005/17]
CPC:
C23C26/00 (EP,KR,US); B22F1/0003 (KR); B22F3/004 (KR);
B22F7/00 (KR); Y10T428/31678 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   SI,   SK,   TR [2005/17]
TitleGerman:ELEKTRODE FÜR DIE BEHANDLUNG VON OBERFLÄCHEN MIT ELEKTRISCHEN ENTLADUNGEN, VERFAHREN ZUR BEHANDLUNG VON OBERFLÄCHEN MIT ELEKTRISCHEN ENTLADUNGEN UND VORRICHTUNG ZUR BEHANDLUNG VON OBERFLÄCHEN MIT ELEKTRISCHEN ENTLADUNGEN[2005/17]
English:ELECTRODE FOR ELECTRIC DISCHARGE SURFACE TREATMENT, ELECTRIC DISCHARGE SURFACE TREATMENT METHOD AND ELECTRIC DISCHARGE SURFACE TREATMENT APPARATUS[2005/17]
French:ELECTRODE DESTINEE A UN TRAITEMENT DE SURFACE PAR DECHARGE ELECTRIQUE, PROCEDE DE TRAITEMENT DE SURFACE PAR DECHARGE ELECTRIQUE ET APPAREIL DE TRAITEMENT DE SURFACE PAR DECHARGE ELECTRIQUE[2005/17]
Entry into regional phase05.11.2004Translation filed 
05.11.2004National basic fee paid 
05.11.2004Search fee paid 
05.11.2004Designation fee(s) paid 
05.11.2004Examination fee paid 
Examination procedure05.11.2004Amendment by applicant (claims and/or description)
05.11.2004Examination requested  [2005/17]
02.04.2009Despatch of a communication from the examining division (Time limit: M04)
29.07.2009Reply to a communication from the examining division
04.01.2010Communication of intention to grant the patent
14.05.2010Fee for grant paid
14.05.2010Fee for publishing/printing paid
Opposition(s)26.04.2011No opposition filed within time limit [2011/26]
Fees paidRenewal fee
25.07.2005Renewal fee patent year 03
26.07.2006Renewal fee patent year 04
17.07.2007Renewal fee patent year 05
25.07.2008Renewal fee patent year 06
16.07.2009Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT21.07.2010
BE21.07.2010
CY21.07.2010
CZ21.07.2010
DK21.07.2010
EE21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
SK21.07.2010
TR21.07.2010
IE30.07.2010
LU30.07.2010
CH31.07.2010
LI31.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
HU22.01.2011
[2012/47]
Former [2012/44]AT21.07.2010
BE21.07.2010
CY21.07.2010
CZ21.07.2010
DK21.07.2010
EE21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
SK21.07.2010
IE30.07.2010
LU30.07.2010
CH31.07.2010
LI31.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
HU22.01.2011
Former [2012/42]AT21.07.2010
BE21.07.2010
CY21.07.2010
CZ21.07.2010
DK21.07.2010
EE21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
SK21.07.2010
IE30.07.2010
CH31.07.2010
LI31.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
HU22.01.2011
Former [2011/35]AT21.07.2010
BE21.07.2010
CY21.07.2010
CZ21.07.2010
DK21.07.2010
EE21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
SK21.07.2010
IE30.07.2010
CH31.07.2010
LI31.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
Former [2011/23]AT21.07.2010
BE21.07.2010
CY21.07.2010
CZ21.07.2010
DK21.07.2010
EE21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
SK21.07.2010
CH31.07.2010
LI31.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
Former [2011/20]AT21.07.2010
BE21.07.2010
CY21.07.2010
DK21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
CH31.07.2010
LI31.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
Former [2011/19]AT21.07.2010
BE21.07.2010
CY21.07.2010
DK21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
Former [2011/16]AT21.07.2010
BE21.07.2010
CY21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
Former [2011/15]AT21.07.2010
CY21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
MC31.07.2010
BG21.10.2010
GR22.10.2010
PT22.11.2010
Former [2011/13]AT21.07.2010
CY21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
MC31.07.2010
BG21.10.2010
PT22.11.2010
Former [2011/11]AT21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
MC31.07.2010
BG21.10.2010
PT22.11.2010
Former [2011/10]AT21.07.2010
FI21.07.2010
NL21.07.2010
SI21.07.2010
PT22.11.2010
Former [2011/08]AT21.07.2010
NL21.07.2010
Documents cited:Search[X]JPH0770761  (JAPAN RES DEV CORP) [X] 1,3,5,10-12,15,18,23,25,27 * page 3, paragraph 15 * * paragraph [0024] * * page 4, paragraph 35 * * abstract *;
 [A]WO9958744  (MITSUBISHI ELECTRIC CORP [JP], et al) [A] 1-31 * page 7, paragraph 52 - page 8, line 4 *;
 [A]EP1035231  (ISHIZUKA RESEARCH INST LTD [JP], et al) [A] 1-31 * page 4, paragraph 31 * * abstract *;
 [X]JP2001138141  (SAWAGUCHI KAZUO, et al) [X] 1-31 * abstract * * page 3, paragraph 15 * * page 4, paragraph 19 * * paragraph [0021] * * paragraph [0024] * * page 5, paragraph 28 *;
 CH695188  [ ] (MITSUBISHI ELECTRIC CORP [JP])
International search[A]JPH0770761  (JAPAN RES DEV CORP)
by applicantJPH0770761
 JP2001138141
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.