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EP About this file: EP1534873

EP1534873 - REPAIRING DEFECTS ON PHOTOMASKS USING A CHARGED PARTICLE BEAM AND TOPOGRAPHICAL DATA FROM A SCANNING PROBE MICROSCOPE [Right-click to bookmark this link]
Status	Examination is in progress Status updated on 22.05.2010 Database last updated on 02.11.2024
Most recent event Tooltip	30.09.2010	New entry: Additional fee for renewal fee: despatch of communication + time limit
Applicant(s)	For all designated states FEI COMPANY 5350 NE Dawson Creek Drive Hillsboro, Oregon 97124-5793 / US
	[N/P]
Former [2005/22]	For all designated states FEI Company 5350 NE Dawson Creek Drive Hillsboro, Oregon 97124-5793 / US
Inventor(s)	01 / FERRANTI, David, C. 158 Riverdale Road Concord, MA 01742 / US
	02 / RAY, Valery 4 Colimar Street, District Vista Hermosa Oriental Zone, Santo Domingo / DO
	03 / SMITH, Gerald 10 Lutheran Drive Nashua, NH 03063 / US
	04 / MUSIL, Christian R. 90 Hansell Rd New Providence, NJ 07974 / US
	[2007/01]
Former [2005/22]	01 / FERRANTI, David, C. 158 Riverdale Road Concord, MA 01742 / US
	02 / RAY, Valery 103 Laurel Ave. Haverhill, MA 01835 / US
	03 / SMITH, Gerald 10 Lutheran Drive Nashua, NH 03063 / US
	04 / MUSIL, Christian R. 353 Harvard Street, Apt. 26 Cambridge, MA 02138 / US
Representative(s)	Bakker, Hendrik, et al FEI Company Patent Department P.O. Box 1745 5602 BS Eindhoven / NL
	[N/P]
Former [2008/17]	Bakker, Hendrik, et al FEI Company Patent Department P.O. Box 1745 5602 BS Eindhoven / NL
Former [2006/42]	Bakker, Hendrik, et al FEI Company Patent Department P.O. Box 80066 5600 KA Eindhoven / NL
Former [2005/22]	Bakker, Hendrik FEI Company, Patent Department, Postbus 80066 5600 KA Eindhoven / NL
Application number, filing date	03785301.7	08.08.2003
	[2005/22]
	WO2003US25801
Priority number, date	US20020402010P	08.08.2002 Original published format: US 402010 P
	US20030636309	07.08.2003 Original published format: US 636309
	[2005/22]
Filing language	EN
Procedural language	EN
Publication	Type:	A2 Application without search report
	No.:	WO2004015496
	Date:	19.02.2004
	Language:	EN
	[2004/08]
	Type:	A2 Application without search report
	No.:	EP1534873
	Date:	01.06.2005
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 19.02.2004 takes the place of the publication of the European patent application.
	[2005/22]
Search report(s)	International search report - published on:	US	07.04.2005
	(Supplementary) European search report - dispatched on:	EP	20.08.2009
Classification	IPC:	C23C14/58	[2005/22]
	CPC:	G03F1/74 (EP,US)
Designated contracting states	DE, FR, GB [2005/48]
Former [2005/22]	AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, RO, SE, SI, SK, TR
Extension states	AL	Not yet paid
	LT	Not yet paid
	LV	Not yet paid
	MK	Not yet paid
Title	German:	REPARATUR VON DEFEKTEN AUF FOTOMASKEN MIT EINEM GELADENEN TEILCHENSTRAHL UND TOPOGRAPHISCHE DATEN AUS EINEM RASTER SONDENMIKROSKOP	[2005/22]
	English:	REPAIRING DEFECTS ON PHOTOMASKS USING A CHARGED PARTICLE BEAM AND TOPOGRAPHICAL DATA FROM A SCANNING PROBE MICROSCOPE	[2005/22]
	French:	REPARATION DE DEFAUTS SUR DES PHOTOMASQUES A L'AIDE D'UN FAISCEAU DE PARTICULES CHARGEES ET DE DONNEES TOPOGRAPHIQUES OBTENUES A PARTIR D'UN MICROSCOPE-SONDE A BALAYAGE	[2005/22]
Entry into regional phase	06.01.2005	National basic fee paid
	06.01.2005	Search fee paid
	06.01.2005	Designation fee(s) paid
	06.01.2005	Examination fee paid
Examination procedure	06.01.2005	Examination requested [2005/22]
	27.01.2010	Despatch of a communication from the examining division (Time limit: M06)
	14.09.2010	Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
Fees paid	Renewal fee
	19.08.2005	Renewal fee patent year 03
	29.08.2006	Renewal fee patent year 04
	29.08.2007	Renewal fee patent year 05
	25.08.2008	Renewal fee patent year 06
	25.08.2009	Renewal fee patent year 07
	Penalty fee
	Additional fee for renewal fee
	31.08.2010	08 M06 Not yet paid
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[XY]US6322935 (SMITH ERYN [US]) [X] 1-10,14-24,4,5,9,18,19,24 * column 5, line 61 - column 6, line 28; figure 12 * * column 1, lines 6-10 * * column 6, lines 29-51 * * column 7, lines 19-61 * [Y] 11-13;
		[Y]US6322672 (SHUMAN RICHARD F [US], et al) [Y] 11-13* the whole document *
	International search	[Y]US5116782 (YAMAGUCHI HIROSHI [JP], et al);
		[Y]US5569392 (MIYOSHI MOTOSUKE [JP], et al);
		[Y]US6042738 (CASEY JR J DAVID [US], et al);
		[Y]US6322672 (SHUMAN RICHARD F [US], et al);
		[X]US6322935 (SMITH ERYN [US]);
		[YP]US2003047691 (MUSIL CHRISTIAN R [US], et al);
		[XP]US6703626 (TAKAOKA OSAMU [JP], et al);
		[Y] - MORGAN ET AL., "Progress for characterization and advanced reticle repair", SOLID STATE TECHNOLOGY, (200007), XP000936450
		[Y] - NAGASHIGE ET AL., "Detection and repair of multiphase defects on alternating phase-shreft mask for DUV lithography", 19TH ANNUAL BACUS, (199909), vol. 3873, pages 127 - 136, XP008042436 DOI: http://dx.doi.org/10.1117/12.373308

The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.

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