Extract from the Register of European Patents

EP About this file: EP1589549

EP1589549 - A method of producing a porous semiconductor film on a substrate [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  08.02.2008
Database last updated on 19.03.2026
Most recent event   Tooltip26.09.2008Change - representativepublished on 29.10.2008  [2008/44]
Applicant(s)For all designated states
Sony Deutschland GmbH
Kemperplatz 1
10785 Berlin / DE
[2007/24]
Former [2005/43]For all designated states
Sony Deutschland GmbH
Hugo-Eckener-Strasse 20
50829 Köln / DE
Inventor(s)01 / Dürr, Michael
Stuttgart Technology Center Hedelfinger Strasse 61
70327 Stuttgart / DE
02 / Nelles, Gabriele
Stuttgart Technology Center Hedelfinger Strasse 61
70327 Stuttgart / DE
03 / Yasuda, Akio
Stuttgart Technology Center Hedelfinger Strasse 61
70327 Stuttgart / DE
 [2005/43]
Representative(s)Appelt, Christian W.
Boehmert & Boehmert
Anwaltspartnerschaft mbB
Pettenkoferstrasse 22
80336 München / DE
[N/P]
Former [2008/44]Appelt, Christian W.
Forrester & Boehmert Pettenkoferstrasse 20-22
80336 München / DE
Former [2005/43]Appelt, Christian W.
FORRESTER & BOEHMERT Anwaltssozietät Pettenkoferstrasse 20-22
80336 München / DE
Application number, filing date04009743.823.04.2004
[2005/43]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1589549
Date:26.10.2005
Language:EN
[2005/43]
Search report(s)(Supplementary) European search report - dispatched on:EP04.02.2005
ClassificationIPC:H01G9/20, H01L31/18, H01L51/40
[2005/43]
CPC:
H10F71/00 (EP,KR,US); H01M14/00 (KR); H10F10/00 (KR);
Y02E10/50 (EP); Y10T428/12028 (EP,US)
Designated contracting statesCH,   DE,   GB,   LI [2006/27]
Former [2005/43]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Verfahren zur Herstellung eines porösen Halbleiterfilmes auf einem Substrat.[2005/43]
English:A method of producing a porous semiconductor film on a substrate[2005/43]
French:Méthode de production d'un film semiconductor poreux sur un substrat.[2005/43]
Examination procedure05.04.2006Examination requested  [2006/22]
27.04.2006Loss of particular rights, legal effect: designated state(s)
21.08.2006Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CY, CZ, DK, EE, ES, FI, FR, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR
07.03.2007Despatch of a communication from the examining division (Time limit: M06)
18.09.2007Application deemed to be withdrawn, date of legal effect  [2008/11]
24.10.2007Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2008/11]
Fees paidRenewal fee
17.03.2006Renewal fee patent year 03
12.04.2007Renewal fee patent year 04
Penalty fee
Penalty fee Rule 85a EPC 1973
02.06.2006AT   M01   Not yet paid
02.06.2006BE   M01   Not yet paid
02.06.2006BG   M01   Not yet paid
02.06.2006CY   M01   Not yet paid
02.06.2006CZ   M01   Not yet paid
02.06.2006DK   M01   Not yet paid
02.06.2006EE   M01   Not yet paid
02.06.2006ES   M01   Not yet paid
02.06.2006FI   M01   Not yet paid
02.06.2006FR   M01   Not yet paid
02.06.2006GR   M01   Not yet paid
02.06.2006HU   M01   Not yet paid
02.06.2006IE   M01   Not yet paid
02.06.2006IT   M01   Not yet paid
02.06.2006LU   M01   Not yet paid
02.06.2006MC   M01   Not yet paid
02.06.2006NL   M01   Not yet paid
02.06.2006PL   M01   Not yet paid
02.06.2006PT   M01   Not yet paid
02.06.2006RO   M01   Not yet paid
02.06.2006SE   M01   Not yet paid
02.06.2006SI   M01   Not yet paid
02.06.2006SK   M01   Not yet paid
02.06.2006TR   M01   Not yet paid
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Documents cited:Search[X] EP1271227  (NANOMAT LTD et al.) [X] 1-3,5-12,14-18,20,25,27,29,31-33 * paragraphs [0094] , [0106] , [0107] , [0109] , [0112] , [0131]; figure 1; example 3 *
 [X] US2003140959  (GAUDIANA RUSSELL et al.) [X] 1,2,6-12,14-18,20,23,25,27,29-34 * paragraphs [0022] , [0025] , [0026] , [0036] , [0044] , [0047] , [0051] - [0053] - [0055] , [0059]; figures 1a,2-4; example 2 *
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