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Extract from the Register of European Patents

EP About this file: EP1482366

EP1482366 - Maskless lithography using spatial light modulators [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  19.02.2010
Database last updated on 21.09.2024
Most recent event   Tooltip19.02.2010Application deemed to be withdrawnpublished on 24.03.2010  [2010/12]
Applicant(s)For all designated states
ASML Holding N.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/49]For all designated states
ASML Holding N.V.
De Run 6501
5504 DR Veldhoven / NL
Inventor(s)01 / Bleeker, Arno
Steenovens 67
5563 CE Westerhoven / NL
02 / Cebuhar, Wenceslao A.
514 Foxboro Drive
Norwalk, Connecticut 06851 / US
03 / Hintersteiner, Jason D.
26 Kristy Drive
Bethel, Connecticut 06801 / US
04 / Mc Cullough, Andrew W.
20 Aunt Park Lane
Newton, Connecticut 06470 / US
05 / Wassermann, Solomon S.
145 East Penn Street
Long Beach, New York 11561 / US
 [2004/49]
Representative(s)van den Hooven, Jan, et al
ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2009/08]Van den Hooven, Jan, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2004/49]Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
Maximilianstrasse 58
80538 München / DE
Application number, filing date04011778.018.05.2004
[2004/49]
Priority number, dateUS2003044990830.05.2003         Original published format: US 449908
[2004/49]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1482366
Date:01.12.2004
Language:EN
[2004/49]
Type: A3 Search report 
No.:EP1482366
Date:10.10.2007
[2007/41]
Search report(s)(Supplementary) European search report - dispatched on:EP12.09.2007
ClassificationIPC:G03F7/20
[2004/49]
CPC:
G03F7/70466 (EP,KR,US); G03F7/2057 (KR); G03F7/70283 (EP,KR,US);
G03F7/70291 (EP,KR,US); G03F7/70358 (EP,KR,US); G03F7/70558 (EP,KR,US)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2008/25]
Former [2004/49]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Maskenlose Lithographie unter Verwendung räumlicher Lichtmodulatoren[2004/49]
English:Maskless lithography using spatial light modulators[2004/49]
French:Lithographie sans masque utilisant des modulateurs spatiaux de lumière[2004/49]
Examination procedure10.04.2008Examination requested  [2008/22]
11.04.2008Loss of particular rights, legal effect: designated state(s)
20.05.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, LU, MC, PL, PT, RO, SE, SI, SK, TR
11.07.2008Despatch of a communication from the examining division (Time limit: M04)
03.11.2008Reply to a communication from the examining division
29.04.2009Despatch of a communication from the examining division (Time limit: M04)
10.09.2009Application deemed to be withdrawn, date of legal effect  [2010/12]
15.10.2009Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2010/12]
Fees paidRenewal fee
30.03.2006Renewal fee patent year 03
14.05.2007Renewal fee patent year 04
13.03.2008Renewal fee patent year 05
25.05.2009Renewal fee patent year 06
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Documents cited:Search[X]US5870176  (SWEATT WILLIAM C [US], et al) [X] 1 * column 3, lines 38-54 * * figure 4 *;
 [X]WO0212961  (BALL SEMICONDUCTOR INC [US]) [X] 1 * page 5, lines 13-15 * * page 8, lines 1-26 ** figure 7 *;
 [X]EP1280007  (ASML NETHERLANDS BV [NL]) [X] 1-39 * paragraphs [0015] , [0041] , [0047] , [0048] * * figures 1,3,11,14-20 *
by applicantUS5870176
 WO0212961
 EP1280007
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.