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Extract from the Register of European Patents

EP About this file: EP1489459

EP1489459 - Positive resist composition and method of forming pattern using the same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  19.08.2016
Database last updated on 08.10.2024
Most recent event   Tooltip17.08.2018Lapse of the patent in a contracting state
New state(s): BG		published on 19.09.2018  [2018/38]
Applicant(s)For all designated states
FUJIFILM Corporation
26-30, Nishiazabu 2-chome
Minato-ku
Tokyo / JP
[N/P]
Former [2007/11]For all designated states
FUJIFILM Corporation
26-30, Nishiazabu 2-chome Minato-ku
Tokyo / JP
Former [2004/52]For all designated states
Fuji Photo Film Co., Ltd.
210 Nakanuma, Minami-Ashigara-shi
Kanagawa-ken / JP
Inventor(s)01 / Sato, Kenichiro
c/o Fuji Photo Film Co., Ltd.
4000, Kawashiri
Yoshida-cho
Haibara-gun
Shizuoka / JP
 [2015/42]
Former [2004/52]01 / Sato, Kenichiro
Fuji Photo Film Co., Ltd., 4000, Kawashiri
Yoshida-cho, Haibara-gun / JP
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2015/42]
Former [2004/52]HOFFMANN - EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Application number, filing date04014370.318.06.2004
[2004/52]
Priority number, dateJP2003017367718.06.2003         Original published format: JP 2003173677
JP2004000910416.01.2004         Original published format: JP 2004009104
[2004/52]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1489459
Date:22.12.2004
Language:EN
[2004/52]
Type: B1 Patent specification 
No.:EP1489459
Date:14.10.2015
Language:EN
[2015/42]
Search report(s)(Supplementary) European search report - dispatched on:EP15.10.2004
ClassificationIPC:G03F7/039
[2004/52]
CPC:
G03F7/0397 (EP,KR,US); G03F7/0045 (KR); Y10S430/106 (EP,KR,US);
Y10S430/111 (EP,KR,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2015/42]
Former [2004/52]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Positiv arbeitende Resistzusammensetzung und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung[2004/52]
English:Positive resist composition and method of forming pattern using the same[2004/52]
French:Composition pour réserve de type positif et procédé de fabrication de motifs employant cette composition[2004/52]
Examination procedure17.03.2005Examination requested  [2005/19]
08.03.2011Despatch of a communication from the examining division (Time limit: M04)
18.07.2011Reply to a communication from the examining division
01.10.2014Despatch of a communication from the examining division (Time limit: M04)
22.12.2014Reply to a communication from the examining division
15.05.2015Communication of intention to grant the patent
31.08.2015Fee for grant paid
31.08.2015Fee for publishing/printing paid
31.08.2015Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  08.03.2011
Opposition(s)15.07.2016No opposition filed within time limit [2016/38]
Fees paidRenewal fee
28.06.2006Renewal fee patent year 03
26.06.2007Renewal fee patent year 04
26.06.2008Renewal fee patent year 05
25.06.2009Renewal fee patent year 06
31.03.2010Renewal fee patent year 07
27.06.2011Renewal fee patent year 08
06.06.2012Renewal fee patent year 09
19.06.2013Renewal fee patent year 10
25.06.2014Renewal fee patent year 11
10.06.2015Renewal fee patent year 12
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU18.06.2004
AT14.10.2015
BE14.10.2015
BG14.10.2015
CY14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
MC14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
TR14.10.2015
GR15.01.2016
PT15.02.2016
GB18.06.2016
IE18.06.2016
LU18.06.2016
CH30.06.2016
FR30.06.2016
LI30.06.2016
[2018/38]
Former [2018/29]HU18.06.2004
AT14.10.2015
BE14.10.2015
CY14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
MC14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
TR14.10.2015
GR15.01.2016
PT15.02.2016
GB18.06.2016
IE18.06.2016
LU18.06.2016
CH30.06.2016
FR30.06.2016
LI30.06.2016
Former [2018/28]HU18.06.2004
AT14.10.2015
BE14.10.2015
CY14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
MC14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
GB18.06.2016
IE18.06.2016
CH30.06.2016
FR30.06.2016
LI30.06.2016
Former [2017/26]AT14.10.2015
BE14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
MC14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
GB18.06.2016
IE18.06.2016
CH30.06.2016
FR30.06.2016
LI30.06.2016
Former [2017/23]AT14.10.2015
BE14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
MC14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
GB18.06.2016
CH30.06.2016
FR30.06.2016
LI30.06.2016
Former [2017/07]AT14.10.2015
BE14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
MC14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
Former [2017/03]AT14.10.2015
BE14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
Former [2016/49]AT14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SI14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
Former [2016/39]AT14.10.2015
CZ14.10.2015
DK14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
Former [2016/36]AT14.10.2015
CZ14.10.2015
EE14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
NL14.10.2015
PL14.10.2015
RO14.10.2015
SE14.10.2015
SK14.10.2015
GR15.01.2016
PT15.02.2016
Former [2016/34]AT14.10.2015
CZ14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
NL14.10.2015
PL14.10.2015
SE14.10.2015
GR15.01.2016
PT15.02.2016
Former [2016/24]AT14.10.2015
ES14.10.2015
FI14.10.2015
IT14.10.2015
NL14.10.2015
PL14.10.2015
SE14.10.2015
GR15.01.2016
PT15.02.2016
Former [2016/23]ES14.10.2015
IT14.10.2015
NL14.10.2015
SE14.10.2015
Former [2016/22]ES14.10.2015
IT14.10.2015
NL14.10.2015
Former [2016/21]ES14.10.2015
IT14.10.2015
Former [2016/20]ES14.10.2015
Documents cited:Search[A]US6479211  (SATO KENICHIRO [JP], et al) [A] 1-9 * column 106, line 1 - line 50 ** page 111; examples 25d,26d; table 6 *;
 [X]JP2003005374  (FUJI PHOTO FILM CO LTD) [X] 1-9 * page 48, resin (3-1) * * page 51; example 6; table 5 * * page 52; example 6; table 6 *;
 [PX]EP1353225  (FUJI PHOTO FILM CO LTD [JP]) [PX] 1-9 * page 73, line 20 - line 30 * * page 83; example 37 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.