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EP1491957
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EP About this file: EP1491957
| EP1491957 - Immersion photolithography apparatus with projection system positioned below the substrate [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 20.08.2010 Database last updated on 26.03.2026 | Most recent event Tooltip | 20.08.2010 | Application deemed to be withdrawn | published on 22.09.2010 [2010/38] | Applicant(s) | For all designated states ASML Holding N.V. De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2005/01] | For all designated states ASML Holding N.V. De Run 6501 5504 DR Veldhoven / NL | Inventor(s) | 01 /
Sewell, Harry 138 Haviland Road Ridgefield, Connecticut 06877 / US | [2005/01] | Representative(s) | Corcoran, Gregory Martin Mason, et al ASML Netherlands B.V. Corporate Intellectual Property De Run 6501 P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/23] | Corcoran, Gregory Martin Mason, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2009/08] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2005/01] | Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München / DE | Application number, filing date | 04014393.5 | 18.06.2004 | [2005/01] | Priority number, date | US20030607170 | 27.06.2003 Original published format: US 607170 | [2005/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1491957 | Date: | 29.12.2004 | Language: | EN | [2004/53] | Type: | A3 Search report | No.: | EP1491957 | Date: | 21.06.2006 | [2006/25] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 24.05.2006 | Classification | IPC: | G03F7/20 | [2005/01] | CPC: |
G03F7/70341 (EP,KR,US);
B82Y10/00 (KR);
B82Y40/00 (KR);
G03F7/70233 (EP,KR,US)
| Designated contracting states | DE, FR, GB, IT, NL [2007/09] |
| Former [2005/01] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Gerät für die Immersionsphotolithographie mit einem unter dem Substrat angeordneten Projektionssystem | [2005/01] | English: | Immersion photolithography apparatus with projection system positioned below the substrate | [2005/01] | French: | Dispositif de lithographie à immersion avec un système de projection disposé sous la plaquette semi-conductrice | [2005/01] | Examination procedure | 27.07.2006 | Examination requested [2006/36] | 05.09.2006 | Despatch of a communication from the examining division (Time limit: M04) | 15.01.2007 | Reply to a communication from the examining division | 09.06.2008 | Despatch of a communication from the examining division (Time limit: M06) | 12.12.2008 | Reply to a communication from the examining division | 19.10.2009 | Cancellation of oral proceeding that was planned for 22.10.2009 | 22.10.2009 | Date of oral proceedings | 22.10.2009 | Date of oral proceedings (cancelled) | 19.11.2009 | Communication of intention to grant the patent | 30.03.2010 | Application deemed to be withdrawn, date of legal effect [2010/38] | 07.05.2010 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2010/38] | Fees paid | Renewal fee | 12.06.2006 | Renewal fee patent year 03 | 14.06.2007 | Renewal fee patent year 04 | 28.03.2008 | Renewal fee patent year 05 | 16.06.2009 | Renewal fee patent year 06 | Penalty fee | Additional fee for renewal fee | 30.06.2010 | 07 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [E] EP1612850 (NIKON CORP et al.) [E] 1,2,4,10,11,15-17,19,25,26,30-34,39,40 * abstract * * figure 5 * * paragraph [0002] * * paragraph [0009] * * paragraph [0017] * * paragraph [0044] - paragraph [0051] * | [A] JP2000012453 | [A] PATENT ABSTRACTS OF JAPAN vol. 2000, no. 04 31 August 2000 (2000-08-31) [A] 1,16,31,32,38,39 * abstract * * figure 1 * * paragraph [0001] * * paragraph [0014] * |