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Extract from the Register of European Patents

EP About this file: EP1524688

EP1524688 - Method for fabricating semiconductor devices having silicided electrodes [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  15.10.2010
Database last updated on 09.09.2024
Most recent event   Tooltip19.10.2012Lapse of the patent in a contracting state
New state(s): TR		published on 21.11.2012  [2012/47]
Applicant(s)For all designated states
IMEC
Kapeldreef 75
3001 Leuven / BE
For all designated states
NXP B.V.
High Tech Campus 60
5656 AG Eindhoven / NL
[2009/33]
Former [2009/11]For all designated states
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM ( IMEC)
Kapeldreef 75
3001 Leuven / BE
For all designated states
NXP B.V.
High Tech Campus 60
5656 AG Eindhoven / NL
Former [2005/16]For all designated states
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM ( IMEC)
Kapeldreef 75
3001 Leuven / BE
For all designated states
Koninklijke Philips Electronics N.V.
Groenewoudseweg 1
5621 BA Eindhoven / NL
Inventor(s)01 / Schram, Tom
Avenue des Tourterelles 25
1330 Rixensart / BE
02 / Hooker, Jacob Christopher
Maria Theresiastraat 25/0014
3000 Leuven / BE
03 / Van Dal, Marcus Johannes Henricus
Vlamingenstraat 80
3000 Leuven / BE
 [2005/16]
Representative(s)Bird, Ariane, et al
Bird Goën & Co
Wetenschapspark Arenberg
Gaston Geenslaan 9
3001 Heverlee / BE
[N/P]
Former [2005/16]Bird, Ariane, et al
Bird Goen & Co, Klein Dalenstraat 42A
3020 Winksele / BE
Application number, filing date04077816.913.10.2004
[2005/16]
Priority number, dateBE2003000054817.10.2003         Original published format: BE 200300548
[2005/16]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1524688
Date:20.04.2005
Language:EN
[2005/16]
Type: B1 Patent specification 
No.:EP1524688
Date:09.12.2009
Language:EN
[2009/50]
Search report(s)(Supplementary) European search report - dispatched on:EP17.01.2005
ClassificationIPC:H01L21/8234
[2005/16]
CPC:
H01L21/28097 (EP,US); H01L21/823418 (EP,US); H01L21/823443 (EP,US);
H01L21/823814 (EP,US); H01L21/823835 (EP,US); H01L29/4975 (EP,US);
H01L29/6659 (EP,US); H01L29/7833 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2005/16]
TitleGerman:Herstellungsverfahren für Halbleiterbauelemente mit silizidierten Elektroden[2005/16]
English:Method for fabricating semiconductor devices having silicided electrodes[2005/16]
French:Méthode de fabrication de dispositifs semi-conducteurs comprenant des électrodes en siliciure[2005/16]
Examination procedure23.09.2005Examination requested  [2005/47]
09.06.2008Despatch of a communication from the examining division (Time limit: M04)
14.10.2008Reply to a communication from the examining division
29.04.2009Communication of intention to grant the patent
19.08.2009Fee for grant paid
19.08.2009Fee for publishing/printing paid
Opposition(s)10.09.2010No opposition filed within time limit [2010/46]
Fees paidRenewal fee
22.09.2006Renewal fee patent year 03
19.10.2007Renewal fee patent year 04
20.10.2008Renewal fee patent year 05
28.10.2009Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT09.12.2009
BE09.12.2009
CY09.12.2009
CZ09.12.2009
DK09.12.2009
EE09.12.2009
FI09.12.2009
IT09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
SK09.12.2009
TR09.12.2009
BG09.03.2010
GR10.03.2010
ES20.03.2010
PT09.04.2010
HU10.06.2010
[2012/47]
Former [2012/42]AT09.12.2009
BE09.12.2009
CY09.12.2009
CZ09.12.2009
DK09.12.2009
EE09.12.2009
FI09.12.2009
IT09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
SK09.12.2009
BG09.03.2010
GR10.03.2010
ES20.03.2010
PT09.04.2010
HU10.06.2010
Former [2011/14]AT09.12.2009
BE09.12.2009
CY09.12.2009
CZ09.12.2009
DK09.12.2009
EE09.12.2009
FI09.12.2009
IT09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
SK09.12.2009
BG09.03.2010
GR10.03.2010
ES20.03.2010
PT09.04.2010
Former [2011/07]AT09.12.2009
BE09.12.2009
CY09.12.2009
CZ09.12.2009
DK09.12.2009
EE09.12.2009
FI09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
SK09.12.2009
BG09.03.2010
GR10.03.2010
ES20.03.2010
PT09.04.2010
Former [2010/50]AT09.12.2009
BE09.12.2009
CY09.12.2009
CZ09.12.2009
EE09.12.2009
FI09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
SK09.12.2009
BG09.03.2010
GR10.03.2010
ES20.03.2010
PT09.04.2010
Former [2010/39]AT09.12.2009
BE09.12.2009
CZ09.12.2009
EE09.12.2009
FI09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
SK09.12.2009
BG09.03.2010
ES20.03.2010
PT09.04.2010
Former [2010/38]AT09.12.2009
BE09.12.2009
CZ09.12.2009
EE09.12.2009
FI09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
BG09.03.2010
ES20.03.2010
PT09.04.2010
Former [2010/36]AT09.12.2009
CZ09.12.2009
EE09.12.2009
FI09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
BG09.03.2010
ES20.03.2010
PT09.04.2010
Former [2010/35]AT09.12.2009
EE09.12.2009
FI09.12.2009
NL09.12.2009
PL09.12.2009
RO09.12.2009
SE09.12.2009
SI09.12.2009
BG09.03.2010
ES20.03.2010
PT09.04.2010
Former [2010/32]AT09.12.2009
FI09.12.2009
PL09.12.2009
SE09.12.2009
SI09.12.2009
ES20.03.2010
Former [2010/30]AT09.12.2009
FI09.12.2009
PL09.12.2009
SE09.12.2009
SI09.12.2009
Former [2010/23]FI09.12.2009
PL09.12.2009
SE09.12.2009
SI09.12.2009
Former [2010/22]FI09.12.2009
SE09.12.2009
Documents cited:Search[A]EP0935285  (IBM [US]) [A] 1,13* abstract *;
 [A]US6200834  (BRONNER GARY B [US], et al) [A] 1,13 * abstract *;
 [AD]EP1211729  (TEXAS INSTRUMENTS INC [US]) [AD] 1,13 * abstract *;
 [A]US2002086491  (KIZILYALLI ISIK C [US], et al) [A] 1,13 * abstract * * paragraphs [0030] - [0034] *;
 [A]US6512296  (GAUTHIER JR ROBERT J [US], et al) [A] 1,13 * abstract *;
 [A]US2003143825  (MATSUO KOUJI [JP], et al) [A] 1,13 * abstract * * paragraphs [0033] - [0035] *
ExaminationEP1328017
by applicantEP1211729
 US6440851
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.