blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP1538484

EP1538484 - EUV illumination system and lithographic apparatus [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  26.10.2007
Database last updated on 20.09.2024
Most recent event   Tooltip18.07.2008Change - representativepublished on 20.08.2008  [2008/34]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2005/23]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Inventor(s)01 / Ivanov, Vladimir Vitalevitch
Garibaldi str 4/2 app 54
Moscow 117313 / RU
02 / Banine, Vadim Yevgenyevich
Nierslaan 2
5704 NK Helmond / NL
03 / Koshelev, Konstantin Nikolaevitch
4 Shkolnaya str.
Moscow Region, Troitzk / RU
 [2005/23]
Representative(s)Winckels, Johannes Hubertus F., et al
Vereenigde
Johan de Wittlaan 7
2517 JR Den Haag / NL
[N/P]
Former [2008/34]Winckels, Johannes Hubertus F., et al
Vereenigde Johan de Wittlaan 7
2517 JR Den Haag / NL
Former [2005/23]Winckels, J.H.F., Mr. Ir., et al
Vereenigde, Johan de Wittlaan 7
2517 JR Den Haag / NL
Application number, filing date04078219.526.11.2004
[2005/23]
Priority number, dateUS2003072703504.12.2003         Original published format: US 727035
[2005/23]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1538484
Date:08.06.2005
Language:EN
[2005/23]
Search report(s)(Supplementary) European search report - dispatched on:EP08.04.2005
ClassificationIPC:G03F7/20
[2005/23]
CPC:
G03F7/70858 (EP,KR,US); G03F7/70916 (EP,KR,US); G03F7/70091 (KR)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2006/09]
Former [2005/23]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:EUV-Beleuchtungssystem und Lithographischer Apparat[2005/23]
English:EUV illumination system and lithographic apparatus[2005/23]
French:Système d'illumination pour l'UV extrême et appareil lithographique[2005/23]
Examination procedure26.09.2005Examination requested  [2005/47]
09.12.2005Loss of particular rights, legal effect: designated state(s)
20.03.2006Despatch of a communication from the examining division (Time limit: M06)
04.04.2006Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, LU, MC, PL, PT, RO, SE, SI, SK, TR
29.08.2006Reply to a communication from the examining division
10.04.2007Date of oral proceedings
12.07.2007Despatch of communication that the application is refused, reason: substantive examination [2007/48]
12.07.2007Minutes of oral proceedings despatched
22.09.2007Application refused, date of legal effect [2007/48]
Fees paidRenewal fee
13.11.2006Renewal fee patent year 03
Penalty fee
Penalty fee Rule 85a EPC 1973
16.01.2006AT   M01   Not yet paid
16.01.2006BE   M01   Not yet paid
16.01.2006BG   M01   Not yet paid
16.01.2006CH   M01   Not yet paid
16.01.2006CY   M01   Not yet paid
16.01.2006CZ   M01   Not yet paid
16.01.2006DK   M01   Not yet paid
16.01.2006EE   M01   Not yet paid
16.01.2006ES   M01   Not yet paid
16.01.2006FI   M01   Not yet paid
16.01.2006GR   M01   Not yet paid
16.01.2006HU   M01   Not yet paid
16.01.2006IE   M01   Not yet paid
16.01.2006IS   M01   Not yet paid
16.01.2006LU   M01   Not yet paid
16.01.2006MC   M01   Not yet paid
16.01.2006PL   M01   Not yet paid
16.01.2006PT   M01   Not yet paid
16.01.2006RO   M01   Not yet paid
16.01.2006SE   M01   Not yet paid
16.01.2006SI   M01   Not yet paid
16.01.2006SK   M01   Not yet paid
16.01.2006TR   M01   Not yet paid
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]EP0858249  (HITACHI LTD [JP]) [X] 1-3,5-10,12-16 * column 11, line 47 - column 12, line 32 * * figure 5 *;
 [X]EP1223468  (ASML NETHERLANDS BV [NL]) [X] 1-3,5-10,12-16 * paragraph [0026] - paragraph [0032] ** figure 2 *;
 [X]US2003190012  (AHMAD IMTIAZ [DE]) [X] 1-16 * paragraph [0031] - paragraph [0072] * * figure - *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.