-
EP1548503
European procedure
Extract from the Register of European Patents
EP About this file: EP1548503
| EP1548503 - Lithographic apparatus [Right-click to bookmark this link] | |||
| Former [2005/26] | Lithographic apparatus and device manufacturing mehtod | ||
| [2008/21] | Status | No opposition filed within time limit Status updated on 04.09.2009 Database last updated on 26.07.2024 | Most recent event Tooltip | 27.11.2009 | Lapse of the patent in a contracting state New state(s): GB | published on 30.12.2009 [2009/53] | Applicant(s) | For all designated states ASML Netherlands BV De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2005/26] | For all designated states ASML Netherlands BV 6501, De Run 5504 DR Veldhoven / NL | Inventor(s) | 01 /
Box, Wilhemus Josephus Vennestraat 3A 3941 Eksel / BE | 02 /
Eggink, Hendrik Jan Cederlaan 89 5616 SC Eindhoven / NL | [2005/26] | Representative(s) | van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/14] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2008/34] | Winckels, Johannes Hubertus F., et al Vereenigde Johan de Wittlaan 7 2517 JR Den Haag / NL | ||
| Former [2005/26] | Winckels, J.H.F., Mr. Ir., et al Vereenigde, Johan de Wittlaan 7 2517 JR Den Haag / NL | Application number, filing date | 04078390.4 | 14.12.2004 | [2005/26] | Priority number, date | US20030740832 | 22.12.2003 Original published format: US 740832 | [2005/26] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1548503 | Date: | 29.06.2005 | Language: | EN | [2005/26] | Type: | A3 Search report | No.: | EP1548503 | Date: | 04.10.2006 | [2006/40] | Type: | B1 Patent specification | No.: | EP1548503 | Date: | 29.10.2008 | Language: | EN | [2008/44] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 04.09.2006 | Classification | IPC: | G03F7/20 | [2005/26] | CPC: |
G03F7/707 (EP,KR,US);
G03F7/70875 (EP,KR,US);
G03F7/70783 (EP,KR,US);
G03F7/709 (EP,KR,US);
H01L21/67103 (KR)
| Designated contracting states | DE, FR, GB, IT, NL [2007/24] |
| Former [2005/26] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Lithographischer Apparat | [2008/21] | English: | Lithographic apparatus | [2008/21] | French: | Appareil lithographique | [2008/21] |
| Former [2005/26] | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | ||
| Former [2005/26] | Lithographic apparatus and device manufacturing mehtod | ||
| Former [2005/26] | Appareil lithographique et méthode de fabrication d'un dispositif | Examination procedure | 13.03.2007 | Examination requested [2007/17] | 05.04.2007 | Loss of particular rights, legal effect: designated state(s) | 23.05.2007 | Despatch of a communication from the examining division (Time limit: M06) | 30.07.2007 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, LT, LU, MC, PL, PT, RO, SE, SI, SK, TR | 07.01.2008 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time | 07.02.2008 | Reply to a communication from the examining division | 02.05.2008 | Communication of intention to grant the patent | 02.09.2008 | Fee for grant paid | 02.09.2008 | Fee for publishing/printing paid | Opposition(s) | 30.07.2009 | No opposition filed within time limit [2009/41] | Request for further processing for: | The application is deemed to be withdrawn due to failure to reply to the examination report | 07.02.2008 | Request for further processing filed | 07.02.2008 | Full payment received (date of receipt of payment) Request granted | 22.02.2008 | Decision despatched | Fees paid | Renewal fee | 12.12.2006 | Renewal fee patent year 03 | 13.12.2007 | Renewal fee patent year 04 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 11.05.2007 | AT M01 Not yet paid | 11.05.2007 | BE M01 Not yet paid | 11.05.2007 | BG M01 Not yet paid | 11.05.2007 | CH M01 Not yet paid | 11.05.2007 | CY M01 Not yet paid | 11.05.2007 | CZ M01 Not yet paid | 11.05.2007 | DK M01 Not yet paid | 11.05.2007 | EE M01 Not yet paid | 11.05.2007 | ES M01 Not yet paid | 11.05.2007 | FI M01 Not yet paid | 11.05.2007 | GR M01 Not yet paid | 11.05.2007 | HU M01 Not yet paid | 11.05.2007 | IE M01 Not yet paid | 11.05.2007 | IS M01 Not yet paid | 11.05.2007 | LT M01 Not yet paid | 11.05.2007 | LU M01 Not yet paid | 11.05.2007 | MC M01 Not yet paid | 11.05.2007 | PL M01 Not yet paid | 11.05.2007 | PT M01 Not yet paid | 11.05.2007 | RO M01 Not yet paid | 11.05.2007 | SE M01 Not yet paid | 11.05.2007 | SI M01 Not yet paid | 11.05.2007 | SK M01 Not yet paid | 11.05.2007 | TR M01 Not yet paid |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 29.10.2008 | NL | 29.10.2008 | GB | 29.01.2009 | [2010/01] |
| Former [2009/40] | IT | 29.10.2008 | |
| NL | 29.10.2008 | ||
| Former [2009/26] | NL | 29.10.2008 | Documents cited: | Search | [X]JP2003068626 ; | [A]EP1052548 (ASM LITHOGRAPHY BV [NL]) [A] 1,10,11 * abstract * * figures 1,2a * * paragraph [0001] ** paragraph [0021] - paragraph [0030] *; | [X]EP1286221 (CANON KK [JP]) [X] 1-11 * abstract * * figures 1-3 * * paragraph [0001] - paragraph [0009] * * paragraph [0015] - paragraph [0033] *; | [A]US6584168 (HARA SHINICHI [JP], et al) [A] 1,10,11 * abstract * * figures 1-4 * * column 1, line 16 - line 18 * * column 3, line 39 - line 67 * * column 7, line 34 - column 8, line 45 *; | [PX]EP1411391 (ASML HOLDING NV [NL]) [PX] 1-11 * abstract * * figures 1-6 * * paragraph [0001] * * paragraph [0011] * * paragraph [0052] - paragraph [0070] * | [X] - PATENT ABSTRACTS OF JAPAN, (20030703), vol. 2003, no. 07, & JP2003068626 A 20030307 (CANON INC) [X] 1-11 * abstract * * figure 1 * | by applicant | US5220171 |