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EP1463105
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EP About this file: EP1463105
| EP1463105 - Semiconductor device and method of manufacturing the same by a transfer technique [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 03.02.2017 Database last updated on 01.02.2025 | Most recent event Tooltip | 03.02.2017 | Application deemed to be withdrawn | published on 08.03.2017 [2017/10] | Applicant(s) | For:AT
BE
BG
Sharp Kabushiki Kaisha 22-22, Nagaike-cho Abeno-ku Osaka Osaka 545-8522 / JP | [N/P] |
| Former [2004/40] | For:AT
BE
BG
Sharp Kabushiki Kaisha 22-22, Nagaike-cho, Abeno-ku Osaka, Osaka 545-8522 / JP | Inventor(s) | 01 /
Takafuji, Yutaka 13-8 3-chome Jingu Nara-shi 631-0804, Nara / JP | 02 /
Itoga, Takashi 303-1-301 4-chome Omiya-cho Nara-shi 630-8115, Nara / JP | [2004/40] | Representative(s) | Suckling, Andrew Michael Marks & Clerk LLP 2nd Floor, Wytham Court 11 West Way Oxford OX2 0JB / GB | [N/P] |
| Former [2004/40] | Suckling, Andrew Michael Marks & Clerk, 4220 Nash Court, Oxford Business Park South Oxford, Oxfordshire OX4 2RU / GB | Application number, filing date | 04101161.0 | 19.03.2004 | [2004/40] | Priority number, date | JP20030077283 | 20.03.2003 Original published format: JP 2003077283 | [2004/40] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1463105 | Date: | 29.09.2004 | Language: | EN | [2004/40] | Type: | A3 Search report | No.: | EP1463105 | Date: | 03.10.2012 | Language: | EN | [2012/40] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 04.09.2012 | Classification | IPC: | H01L21/60, H01L21/68, H01L21/762 | [2004/40] | CPC: |
H10D86/0214 (EP,US);
H01L21/6835 (EP,US);
H01L21/76254 (EP,US);
H01L21/76259 (EP,US);
H01L24/24 (EP,US);
H01L24/26 (EP,US);
H01L24/82 (EP,US);
H01L24/83 (EP,US);
H10D86/40 (EP,US);
H10D86/411 (EP,US);
H10D86/60 (EP,US);
H01L2221/68359 (EP,US);
H01L2221/68363 (EP,US);
H01L2224/24226 (EP,US);
H01L2224/8319 (EP,US);
H01L2224/8385 (EP,US);
H01L2224/83894 (EP,US);
H01L2924/01004 (EP,US);
H01L2924/01005 (EP,US);
H01L2924/01006 (EP,US);
H01L2924/01013 (EP,US);
H01L2924/01015 (EP,US);
H01L2924/01019 (EP,US);
H01L2924/01021 (EP,US);
H01L2924/01023 (EP,US);
H01L2924/01029 (EP,US);
H01L2924/0103 (EP,US);
H01L2924/01033 (EP,US);
H01L2924/01039 (EP,US);
H01L2924/01046 (EP,US);
H01L2924/0105 (EP,US);
H01L2924/01056 (EP,US);
H01L2924/01074 (EP,US);
H01L2924/01078 (EP,US);
H01L2924/01082 (EP,US);
H01L2924/0132 (EP,US);
H01L2924/04953 (EP,US);
H01L2924/07802 (EP,US);
H01L2924/09701 (EP,US);
H01L2924/12041 (EP,US);
H01L2924/12042 (EP,US);
H01L2924/12044 (EP,US);
H01L2924/1305 (EP,US);
H01L2924/1306 (EP,US);
H01L2924/13091 (EP,US);
| C-Set: |
H01L2924/0132, H01L2924/01013, H01L2924/01014 (US,EP);
H01L2924/0132, H01L2924/01013, H01L2924/01029 (US,EP);
H01L2924/0132, H01L2924/01022, H01L2924/01074 (US,EP);
H01L2924/12042, H01L2924/00 (EP,US);
H01L2924/12044, H01L2924/00 (US,EP);
H01L2924/1305, H01L2924/00 (EP,US);
H01L2924/1306, H01L2924/00 (EP,US);
H01L2924/13091, H01L2924/00 (EP,US); | Designated contracting states | DE, NL [2013/24] |
| Former [2004/40] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Halbleiteranordnung und Verfahren zur dessen Herstellung durch Transfertechnik | [2004/40] | English: | Semiconductor device and method of manufacturing the same by a transfer technique | [2004/40] | French: | Dispositif à semi-conducteur et procede de fabrication associe par la technique de transfert | [2004/40] | Examination procedure | 14.11.2012 | Examination requested [2012/52] | 04.04.2013 | Loss of particular rights, legal effect: designated state(s) | 10.05.2013 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, PL, PT, RO, SE, SI, SK, TR | 01.10.2016 | Application deemed to be withdrawn, date of legal effect [2017/10] | 31.10.2016 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2017/10] | Fees paid | Renewal fee | 09.03.2006 | Renewal fee patent year 03 | 14.03.2007 | Renewal fee patent year 04 | 14.03.2008 | Renewal fee patent year 05 | 13.03.2009 | Renewal fee patent year 06 | 15.03.2010 | Renewal fee patent year 07 | 15.03.2011 | Renewal fee patent year 08 | 14.03.2012 | Renewal fee patent year 09 | 11.03.2013 | Renewal fee patent year 10 | 12.03.2014 | Renewal fee patent year 11 | 24.03.2015 | Renewal fee patent year 12 | Penalty fee | Additional fee for renewal fee | 31.03.2016 | 13 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0209173 (PHILIPS NV [NL]); | [Y]EP1039513 (CANON KK [JP]); | [A]WO0193325 (COMMISSARIAT ENERGIE ATOMIQUE [FR], et al); | [XYI]WO0243124 (SOITEC SILICON ON INSULATOR [FR], et al) |