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Extract from the Register of European Patents

EP About this file: EP1511070

EP1511070 - Integrated circuit capacitor in multi-level metallization [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  02.04.2010
Database last updated on 24.08.2024
Most recent event   Tooltip02.04.2010Application deemed to be withdrawnpublished on 05.05.2010  [2010/18]
Applicant(s)For all designated states
Texas Instruments Incorporated
13500 North Central Expressway
PO Box 655474
Dallas, Texas 75265 / US
[N/P]
Former [2005/09]For all designated states
TEXAS INSTRUMENTS INCORPORATED
13500 North Central Expressway , PO Box 655474
Dallas 75265 / US
Inventor(s)01 / Hong, Qi-Zhong
4621 Deer Valley Lane
Richardson, TX Texas 75082 / US
 [2005/09]
Representative(s)Holt, Michael, et al
Texas Instruments Limited
European Patent Department
3rd Floor
401 Grafton Gate
Milton Keynes MK9 1AQ / GB
[N/P]
Former [2008/33]Holt, Michael, et al
Texas Instruments Limited European Patents Department 800 Pavilion Drive
Northampton NN4 7YL / GB
Former [2005/09]Holt, Michael, et al
Texas Instruments Ltd., PO Box 5069
Northampton, Northamptonshire NN4 7ZE / GB
Application number, filing date04104015.520.08.2004
[2005/09]
Priority number, dateUS2003065010026.08.2003         Original published format: US 650100
[2005/09]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1511070
Date:02.03.2005
Language:EN
[2005/09]
Type: A3 Search report 
No.:EP1511070
Date:01.10.2008
[2008/40]
Search report(s)(Supplementary) European search report - dispatched on:EP01.09.2008
ClassificationIPC:H01L21/02, H01L23/522, // H01L21/314, H01L21/316, H01L21/768
[2008/40]
CPC:
H01L28/75 (EP,US); H01L23/5223 (EP,US); H01L21/02164 (EP);
H01L21/0217 (EP); H01L21/02178 (EP); H01L21/02181 (EP);
H01L21/022 (EP); H01L21/3144 (US); H01L21/31612 (US);
H01L21/31616 (US); H01L21/31645 (US); H01L21/3185 (US);
H01L28/55 (EP,US); H01L2924/0002 (EP,US) (-)
C-Set:
H01L2924/0002, H01L2924/00 (EP,US)
Former IPC [2005/09]H01L21/02
Designated contracting statesDE,   FR,   GB,   NL [2009/36]
Former [2009/24]DE,  FR,  GB 
Former [2005/09]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Kondensator eines integrierten Schaltkreises in einer mehrschichtigen Metallisierung[2005/09]
English:Integrated circuit capacitor in multi-level metallization[2005/09]
French:Condensateur d'un circuit intégré dans une métallisation à niveaux multiples[2005/09]
Examination procedure01.04.2009Examination requested  [2009/20]
02.04.2009Loss of particular rights, legal effect: designated state(s)
06.05.2009Despatch of a communication from the examining division (Time limit: M06)
12.05.2009Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IT, LU, MC, PL, PT, RO, SE, SI, SK, TR
12.05.2009Despatch of communication of loss of particular rights: designated state(s) NL
17.11.2009Application deemed to be withdrawn, date of legal effect  [2010/18]
21.12.2009Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2010/18]
Fees paidRenewal fee
31.08.2006Renewal fee patent year 03
31.08.2007Renewal fee patent year 04
01.09.2008Renewal fee patent year 05
31.08.2009Renewal fee patent year 06
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Documents cited:Search[X]US2003027385  (PARK BYUNG-LYUL [KR], et al) [X] 1-7 * paragraphs [0032] - [0036]; figures 3-6 *;
 [X]US2003027386  (LEE KI-YOUNG [KR]) [X] 1-7* paragraphs [0025] - [0031]; figures 8-11 *;
 [X]US2003102522  (LEE KI-YOUNG [KR]) [X] 1-7 * paragraphs [0041] - [0048]; figures 7-12 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.