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Extract from the Register of European Patents

EP About this file: EP1639412

EP1639412 - DEVELOPER COMPOSITION FOR RESISTS AND METHOD FOR FORMATION OF RESIST PATTERN [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  13.05.2016
Database last updated on 02.11.2024
Most recent event   Tooltip01.09.2017Lapse of the patent in a contracting statepublished on 04.10.2017  [2017/40]
Applicant(s)For all designated states
TOKYO OHKA KOGYO CO., LTD.
150, Nakamaruko Nakahara-ku
Kawasaki-shi, Kanagawa 211-0012 / JP
[2006/13]
Inventor(s)01 / WASHIO, Yasushi@c/o Tokyo Ohka Kogyo Co., Ltd.
150, Nakamaruko
Nakahara-ku
Kawasaki-shi Kanagawa 211-0012 / JP
02 / Saito, Koji@c/o Tokyo Ohka Kogyo Co., Ltd.
150, Nakamaruko
Nakahara-ku
Kawasaki-shi Kanagawa 211-0012 / JP
 [2015/28]
Former [2006/13]01 / WASHIO, Yasushi c/o Tokyo Ohka Kogyo Co., Ltd.
150, Nakamaruko Nakahara-ku
Kawasaki-shi Kanagawa 211-0012 / JP
02 / Saito, Koji c/o Tokyo Ohka Kogyo Co., Ltd.
150, Nakamaruko Nakahara-ku
Kawasaki-shi Kanagawa 211-0012 / JP
Representative(s)Hart-Davis, Jason, et al
Cabinet Beau de Loménie
158, rue de l'Université
75340 Paris Cedex 07 / FR
[2015/28]
Former [2010/15]Hart-Davis, Jason, et al
Cabinet Beau de Loménie 158, rue de l'Université
75340 Paris Cedex 07 / FR
Former [2006/13]Portal, Gérard, et al
Cabinet Beau de Loménie 158, rue de l'Université
75340 Paris Cédex 07 / FR
Application number, filing date04746546.322.06.2004
[2006/13]
WO2004JP09077
Priority number, dateJP2003018470827.06.2003         Original published format: JP 2003184708
[2006/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2005001578
Date:06.01.2005
Language:EN
[2005/01]
Type: A2 Application without search report 
No.:EP1639412
Date:29.03.2006
Language:EN
The application published by WIPO in one of the EPO official languages on 06.01.2005 takes the place of the publication of the European patent application.
[2006/13]
Type: B1 Patent specification 
No.:EP1639412
Date:08.07.2015
Language:EN
[2015/28]
Search report(s)International search report - published on:EP08.12.2005
ClassificationIPC:G03F7/32
[2006/13]
CPC:
G03F7/322 (EP,US); G03F7/32 (KR)
Designated contracting statesDE,   FR,   IT,   NL [2015/28]
Former [2006/40]DE,  FR,  IT,  NL 
Former [2006/13]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:ENTWICKLER-ZUSAMMENSETZUNG FÜR RESISTS UND VERFAHREN ZUR BILDUNG EINER RESIST-STRUKTUR[2006/13]
English:DEVELOPER COMPOSITION FOR RESISTS AND METHOD FOR FORMATION OF RESIST PATTERN[2006/13]
French:COMPOSITIONS DE DEVELOPPEMENT POUR RESERVES ET PROCEDE DE FORMATION DE CONFIGURATION DE RESERVES[2006/13]
Entry into regional phase05.12.2005National basic fee paid 
05.12.2005Designation fee(s) paid 
05.12.2005Examination fee paid 
Examination procedure06.12.2005Examination requested  [2006/13]
17.10.2012Despatch of a communication from the examining division (Time limit: M04)
25.02.2013Reply to a communication from the examining division
12.03.2015Communication of intention to grant the patent
27.05.2015Fee for grant paid
27.05.2015Fee for publishing/printing paid
27.05.2015Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  17.10.2012
Opposition(s)11.04.2016No opposition filed within time limit [2016/24]
Fees paidRenewal fee
10.05.2006Renewal fee patent year 03
17.04.2007Renewal fee patent year 04
19.03.2008Renewal fee patent year 05
30.04.2009Renewal fee patent year 06
14.04.2010Renewal fee patent year 07
19.04.2011Renewal fee patent year 08
30.03.2012Renewal fee patent year 09
17.04.2013Renewal fee patent year 10
18.04.2014Renewal fee patent year 11
22.04.2015Renewal fee patent year 12
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Lapses during opposition  TooltipNL08.07.2015
[2017/40]
Cited inInternational search[Y]US5985525  (SATO MITSURU [JP], et al) [Y] 1-3 * the whole document *;
 [Y]EP0272686  (FUJI PHOTO FILM CO LTD [JP]) [Y] 1-3 * the whole document *;
 [A]EP0323836  (FUJI PHOTO FILM CO LTD [JP]) [A] * the whole document *;
 [A]US6329126  (TANAKA HATSUYUKI [JP], et al);
 [DA]JPH04204454
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19921110), vol. 016, no. 540, Database accession no. (P - 1450), & JP04204454 A 19920724 (TOKYO OHKA KOGYO CO LTD) [DA] * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.