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EP1636828
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EP About this file: EP1636828
| EP1636828 - COMPOSITIONS AND METHODS FOR HIGH-EFFICIENCY CLEANING/POLISHING OF SEMICONDUCTOR WAFERS [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 24.04.2009 Database last updated on 02.11.2024 | Most recent event Tooltip | 24.04.2009 | Withdrawal of application | published on 27.05.2009 [2009/22] | Applicant(s) | For all designated states ADVANCED TECHNOLOGY MATERIALS, INC. 7 Commerce Drive Danbury, CT 06810 / US | [2006/12] | Inventor(s) | 01 /
KORZENSKI, Michael, B. 110 Woodcrest Lane Danbury, CT 06810 / US | 02 /
XU, Chongying 8 Heather Court New Milford, CT 06776 / US | 03 /
BAUM, Thomas, H. 2 Handol Lane New Fairfield, CT 06810 / US | 04 /
MINSEK, David 20 Skyline Drive New Milford, CT 06776 / US | 05 /
GHENCIU, Eliodor, G. 638 Forege Spring Lane King of Prussia, PA 19406 / US | [2006/12] | Representative(s) | Viering, Jentschura & Partner mbB Patent- und Rechtsanwälte Grillparzerstrasse 14 81675 München / DE | [N/P] |
| Former [2008/28] | Viering, Jentschura & Partner Postfach 22 14 43 80504 München / DE | ||
| Former [2006/12] | Viering, Jentschura & Partner Postfach 22 14 43 80504 München / DE | Application number, filing date | 04755330.0 | 15.06.2004 | [2006/12] | WO2004US19088 | Priority number, date | US20030602172 | 24.06.2003 Original published format: US 602172 | [2006/12] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO2005004199 | Date: | 13.01.2005 | Language: | EN | [2005/02] | Type: | A2 Application without search report | No.: | EP1636828 | Date: | 22.03.2006 | Language: | EN | The application published by WIPO in one of the EPO official languages on 13.01.2005 takes the place of the publication of the European patent application. | [2006/12] | Search report(s) | International search report - published on: | US | 10.08.2006 | Classification | IPC: | C11D1/00, C11D3/30, B08B3/08, B08B3/04 | [2006/41] | CPC: |
G03F7/425 (EP,US);
H01L21/304 (KR);
C11D7/261 (EP,US);
C11D7/28 (EP,US);
C11D7/3209 (EP,US);
C11D7/5013 (EP,US);
H01L21/02063 (EP,US);
H01L21/31133 (EP,US);
C11D2111/22 (EP,US);
|
| Former IPC [2006/12] | H01L21/00 | Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR [2006/12] | Extension states | AL | Not yet paid | HR | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | Title | German: | ZUSAMMENSETZUNGEN UND VERFAHREN ZUM HOCHEFFIZIENTEN REINIGEN/POLIEREN VON HALBLEITER-WAFERN | [2006/12] | English: | COMPOSITIONS AND METHODS FOR HIGH-EFFICIENCY CLEANING/POLISHING OF SEMICONDUCTOR WAFERS | [2006/12] | French: | COMPOSITIONS ET METHODES DESTINEES AU NETTOYAGE/POLISSAGE A HAUT RENDEMENT DE PLAQUETTES SEMI-CONDUCTRICES | [2006/12] | Entry into regional phase | 23.12.2005 | National basic fee paid | 23.12.2005 | Search fee paid | 23.12.2005 | Designation fee(s) paid | 23.12.2005 | Examination fee paid | Examination procedure | 04.01.2005 | Request for preliminary examination filed International Preliminary Examining Authority: US | 23.12.2005 | Amendment by applicant (claims and/or description) | 23.12.2005 | Examination requested [2006/12] | 15.04.2009 | Application withdrawn by applicant [2009/22] | Fees paid | Renewal fee | 23.12.2005 | Renewal fee patent year 03 | 02.07.2007 | Renewal fee patent year 04 | 28.03.2008 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]US2003022800 (PETERS DARRYL W [US], et al); | [A]US6554912 (SAHBARI JAVAD J [US]) |