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Extract from the Register of European Patents

EP About this file: EP1671362

EP1671362 - PRECISION POLYSILICON RESISTOR PROCESS [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  13.09.2013
Database last updated on 02.09.2024
Most recent event   Tooltip13.09.2013Application deemed to be withdrawnpublished on 16.10.2013  [2013/42]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [2006/25]For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / COOLBAUGH, Douglas, D.
c/o IBM U.K. Ltd.,Int. Property Law, Hursley Park
Winchester, Hampshire SO21 2JN / GB
02 / GREER, Heidi, L.
112 Brigham Hill Road
Essex Junction, VT 05452 / US
03 / RASSEL, Robert, M.
225 Granite Creek Road
Colchester, VT 05446 / US
 [2007/15]
Former [2006/25]01 / COOLBAUGH, Douglas, D.
21 Sage Circle
Essex Junction, VT 05452 / US
02 / GREER, Heidi, L.
112 Brigham Hill Road
Essex Junction, VT 05452 / US
03 / RASSEL, Robert, M.
225 Granite Creek Road
Colchester, VT 05446 / US
Representative(s)Litherland, David Peter
IBM United Kingdom Limited
Intellectual Property Department
Hursley Park
Winchester, Hampshire SO21 2JN / GB
[N/P]
Former [2006/25]Litherland, David Peter
IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester
Hampshire SO21 2JN / GB
Application number, filing date04789451.430.09.2004
[2006/25]
WO2004US32406
Priority number, dateUS2003060543930.09.2003         Original published format: US 605439
[2006/25]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2005034202
Date:14.04.2005
Language:EN
[2005/15]
Type: A2 Application without search report 
No.:EP1671362
Date:21.06.2006
Language:EN
The application published by WIPO in one of the EPO official languages on 14.04.2005 takes the place of the publication of the European patent application.
[2006/25]
Search report(s)International search report - published on:US10.11.2005
(Supplementary) European search report - dispatched on:EP26.03.2010
ClassificationIPC:H01L21/02, H01L27/07, // H01L27/08
[2010/17]
CPC:
H01L27/0738 (EP,US); H01L21/20 (KR); H01L21/265 (KR);
H01L28/20 (EP,US); H01L27/0802 (EP,US)
Former IPC [2006/25]H01L21/302, H01L21/461
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2006/25]
Extension statesALNot yet paid
HRNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:PRÄZISIERUNGS-POLYSILIZIUM-WIDERSTANDS-PROZESS[2006/25]
English:PRECISION POLYSILICON RESISTOR PROCESS[2006/25]
French:PROCEDE DE FABRICATION D'UNE RESISTANCE DE PRECISION EN POLYSILICIUM[2006/25]
Entry into regional phase18.04.2006National basic fee paid 
18.04.2006Search fee paid 
18.04.2006Designation fee(s) paid 
18.04.2006Examination fee paid 
Examination procedure18.04.2006Amendment by applicant (claims and/or description)
18.04.2006Examination requested  [2006/25]
20.05.2010Despatch of a communication from the examining division (Time limit: M06)
23.11.2010Reply to a communication from the examining division
07.12.2012Despatch of a communication from the examining division (Time limit: M04)
18.04.2013Application deemed to be withdrawn, date of legal effect  [2013/42]
27.05.2013Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2013/42]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  20.05.2010
Fees paidRenewal fee
14.09.2006Renewal fee patent year 03
18.09.2007Renewal fee patent year 04
10.10.2008Renewal fee patent year 05
23.09.2009Renewal fee patent year 06
22.09.2010Renewal fee patent year 07
19.09.2011Renewal fee patent year 08
20.09.2012Renewal fee patent year 09
Penalty fee
Additional fee for renewal fee
30.09.200805   M06   Fee paid on   10.10.2008
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search   [ ] - No further relevant documents disclosed
International search[X]US5656524  (EKLUND ROBERT H [US], et al);
 [Y]US6027964  (GARDNER MARK I [US], et al);
 [Y]US6436747  (SEGAWA MIZUKI [JP], et al)
ExaminationUS6255185
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.