EP1671362 - PRECISION POLYSILICON RESISTOR PROCESS [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 13.09.2013 Database last updated on 02.09.2024 | Most recent event Tooltip | 13.09.2013 | Application deemed to be withdrawn | published on 16.10.2013 [2013/42] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
Former [2006/25] | For all designated states International Business Machines Corporation New Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
COOLBAUGH, Douglas, D. c/o IBM U.K. Ltd.,Int. Property Law, Hursley Park Winchester, Hampshire SO21 2JN / GB | 02 /
GREER, Heidi, L. 112 Brigham Hill Road Essex Junction, VT 05452 / US | 03 /
RASSEL, Robert, M. 225 Granite Creek Road Colchester, VT 05446 / US | [2007/15] |
Former [2006/25] | 01 /
COOLBAUGH, Douglas, D. 21 Sage Circle Essex Junction, VT 05452 / US | ||
02 /
GREER, Heidi, L. 112 Brigham Hill Road Essex Junction, VT 05452 / US | |||
03 /
RASSEL, Robert, M. 225 Granite Creek Road Colchester, VT 05446 / US | Representative(s) | Litherland, David Peter IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester, Hampshire SO21 2JN / GB | [N/P] |
Former [2006/25] | Litherland, David Peter IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester Hampshire SO21 2JN / GB | Application number, filing date | 04789451.4 | 30.09.2004 | [2006/25] | WO2004US32406 | Priority number, date | US20030605439 | 30.09.2003 Original published format: US 605439 | [2006/25] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO2005034202 | Date: | 14.04.2005 | Language: | EN | [2005/15] | Type: | A2 Application without search report | No.: | EP1671362 | Date: | 21.06.2006 | Language: | EN | The application published by WIPO in one of the EPO official languages on 14.04.2005 takes the place of the publication of the European patent application. | [2006/25] | Search report(s) | International search report - published on: | US | 10.11.2005 | (Supplementary) European search report - dispatched on: | EP | 26.03.2010 | Classification | IPC: | H01L21/02, H01L27/07, // H01L27/08 | [2010/17] | CPC: |
H01L27/0738 (EP,US);
H01L21/20 (KR);
H01L21/265 (KR);
H01L28/20 (EP,US);
H01L27/0802 (EP,US)
|
Former IPC [2006/25] | H01L21/302, H01L21/461 | Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR [2006/25] | Extension states | AL | Not yet paid | HR | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | Title | German: | PRÄZISIERUNGS-POLYSILIZIUM-WIDERSTANDS-PROZESS | [2006/25] | English: | PRECISION POLYSILICON RESISTOR PROCESS | [2006/25] | French: | PROCEDE DE FABRICATION D'UNE RESISTANCE DE PRECISION EN POLYSILICIUM | [2006/25] | Entry into regional phase | 18.04.2006 | National basic fee paid | 18.04.2006 | Search fee paid | 18.04.2006 | Designation fee(s) paid | 18.04.2006 | Examination fee paid | Examination procedure | 18.04.2006 | Amendment by applicant (claims and/or description) | 18.04.2006 | Examination requested [2006/25] | 20.05.2010 | Despatch of a communication from the examining division (Time limit: M06) | 23.11.2010 | Reply to a communication from the examining division | 07.12.2012 | Despatch of a communication from the examining division (Time limit: M04) | 18.04.2013 | Application deemed to be withdrawn, date of legal effect [2013/42] | 27.05.2013 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2013/42] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 20.05.2010 | Fees paid | Renewal fee | 14.09.2006 | Renewal fee patent year 03 | 18.09.2007 | Renewal fee patent year 04 | 10.10.2008 | Renewal fee patent year 05 | 23.09.2009 | Renewal fee patent year 06 | 22.09.2010 | Renewal fee patent year 07 | 19.09.2011 | Renewal fee patent year 08 | 20.09.2012 | Renewal fee patent year 09 | Penalty fee | Additional fee for renewal fee | 30.09.2008 | 05   M06   Fee paid on   10.10.2008 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [ ] - No further relevant documents disclosed | International search | [X]US5656524 (EKLUND ROBERT H [US], et al); | [Y]US6027964 (GARDNER MARK I [US], et al); | [Y]US6436747 (SEGAWA MIZUKI [JP], et al) | Examination | US6255185 |