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Extract from the Register of European Patents

EP About this file: EP1693886

EP1693886 - SUBSTRATE TREATMENT DEVICE CONTROL METHOD AND SUBSTRATE TREATMENT DEVICE [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  03.10.2014
Database last updated on 25.09.2024
Most recent event   Tooltip03.10.2014Application deemed to be withdrawnpublished on 05.11.2014  [2014/45]
Applicant(s)For all designated states
TOKYO ELECTRON LIMITED
3-6 Akasaka 5-chome Minato-ku
Tokyo 107-8481 / JP
[N/P]
Former [2006/34]For all designated states
TOKYO ELECTRON LIMITED
3-6 Akasaka 5-chome Minato-ku
Tokyo 107-8481 / JP
Inventor(s)01 / SHINOZUKA, S. Tokyo Elec.Kyushu Limited Koshi Plant
1-1, Fukuhara, Koshi-machi
Kikuchi-gun, Kumamoto 861-1116 / JP
02 / WADA, S. Tokyo Electron Kyushu Limited Koshi Plant
1-1, Fukuhara, Koshi-machi
Kikuchi-gun, Kumamoto 861-1116 / JP
03 / YAMASHITA, Masami
2655, Tsukure Kikuyo-machi, Kikuchi-gun
Kumamoto 869-1197 / JP
 [2006/34]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastrasse 30
81925 München / DE
[N/P]
Former [2006/34]HOFFMANN EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Application number, filing date04820143.830.11.2004
[2006/34]
WO2004JP17752
Priority number, dateJP2003041010509.12.2003         Original published format: JP 2003410105
[2006/34]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2005057633
Date:23.06.2005
Language:EN
[2005/25]
Type: A1 Application with search report 
No.:EP1693886
Date:23.08.2006
Language:EN
The application published by WIPO in one of the EPO official languages on 23.06.2005 takes the place of the publication of the European patent application.
[2006/34]
Search report(s)International search report - published on:JP23.06.2005
(Supplementary) European search report - dispatched on:EP20.07.2011
ClassificationIPC:H01L21/027, G03F7/16, H01L21/00, H01L21/68
[2011/33]
CPC:
H01L21/67745 (EP,KR,US); H01L21/67276 (EP,KR,US); G03F7/162 (EP,KR,US);
G03F7/3021 (EP,KR,US); H01L21/67253 (KR)
Former IPC [2006/34]H01L21/027, G03F7/16
Designated contracting statesDE,   FR [2007/12]
Former [2006/34]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
HRNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:SUBSTRATBEHANDLUNGS-EINRICHTUNGSSTEUERVERFAHREN UND SUBSTRATBEHANDLUNGSEINRICHTUNG[2006/34]
English:SUBSTRATE TREATMENT DEVICE CONTROL METHOD AND SUBSTRATE TREATMENT DEVICE[2006/34]
French:PROCEDE DE COMMANDE DE DISPOSITIF DE TRAITEMENT DE SURFACE ET DISPOSITIF DE TRAITEMENT DE SURFACE[2006/34]
Entry into regional phase08.06.2006Translation filed 
08.06.2006National basic fee paid 
08.06.2006Search fee paid 
08.06.2006Designation fee(s) paid 
08.06.2006Examination fee paid 
Examination procedure08.06.2006Examination requested  [2006/34]
25.02.2013Despatch of a communication from the examining division (Time limit: M04)
25.06.2013Reply to a communication from the examining division
03.06.2014Application deemed to be withdrawn, date of legal effect  [2014/45]
30.06.2014Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2014/45]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  25.02.2013
Fees paidRenewal fee
23.11.2006Renewal fee patent year 03
26.11.2007Renewal fee patent year 04
27.03.2008Renewal fee patent year 05
27.11.2009Renewal fee patent year 06
23.11.2010Renewal fee patent year 07
23.11.2011Renewal fee patent year 08
14.11.2012Renewal fee patent year 09
Penalty fee
Additional fee for renewal fee
30.11.201310   M06   Not yet paid
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Documents cited:Search[A]US2002009658  (SATO NORIKATSU [JP], et al) [A] 1,8* the whole document *;
 [YA]EP1300874  (TOKYO ELECTRON LTD [JP]) [Y] 4-6,11-14 * the whole document * [A] 1,8;
 [XY]JP2003115426  (DAINIPPON SCREEN MFG) [X] 1-3,7-10,15,16 * paragraphs [0022] - [0025] - [0034] , [0035] , [0042] - [0044] - [0100] * [Y] 4-6,11-14
International search[X]JP2003115426  (DAINIPPON SCREEN MFG);
 [A]JP2003045776  (DAINIPPON SCREEN MFG);
 [A]JP2003037043  (DAINIPPON SCREEN MFG);
 [A]JPH10172902  (NIKON CORP)
by applicantJP2000223401
 JP2003115426
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.