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EP1564594
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EP About this file: EP1564594
| EP1564594 - Projection lens sytem for microlithography [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 16.12.2005 Database last updated on 22.08.2024 | Most recent event Tooltip | 16.12.2005 | Withdrawal of application | published on 01.02.2006 [2006/05] | Applicant(s) | For all designated states Carl Zeiss SMT AG Carl-Zeiss-Strasse 22 73447 Oberkochen / DE | [2005/33] | Inventor(s) | 01 /
Zaczek, Christoph Lauterner Strasse 37 73540 Heubach / DE | 02 /
Shafer, David 56 Drake Lane Fairfield Connecticut 06430 / US | 03 /
Ulrich, Wilhelm Lederackerring 44 73434 Aalen / DE | [2005/33] | Representative(s) | Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner mbB Kronenstrasse 30 70174 Stuttgart / DE | [N/P] |
| Former [2005/33] | Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner Kronenstrasse 30 70174 Stuttgart / DE | Application number, filing date | 05003231.7 | 16.02.2005 | [2005/33] | Priority number, date | US20040544492P | 17.02.2004 Original published format: US 544492 P | [2005/33] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP1564594 | Date: | 17.08.2005 | Language: | DE | [2005/33] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.06.2005 | Classification | IPC: | G03F7/20 | [2005/33] | CPC: |
G02B17/0892 (EP,US);
G02B17/045 (EP,US);
G02B27/283 (EP,US);
G03F7/70225 (EP,US)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR [2005/33] | Extension states | AL | Not yet paid | BA | Not yet paid | HR | Not yet paid | LV | Not yet paid | MK | Not yet paid | YU | Not yet paid | Title | German: | Projektionsobjektiv für die Mikrolithographie | [2005/33] | English: | Projection lens sytem for microlithography | [2005/33] | French: | Objectif de projection pour la microlithographie | [2005/33] | Examination procedure | 09.12.2005 | Application withdrawn by applicant [2006/05] |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]EP0341385 (IBM [US]) [X] 1-14 * page 4, line 34 - page 5, line 16; figure 1 *; | [X]US2002167734 (SCHUSTER KARL-HEINZ [DE]) [X] 1-14 * paragraphs [0026] , [0027] *; | [X]EP1260845 (ZEISS CARL SEMICONDUCTOR MFG [DE]) [X] 1-14 * paragraph [0050]; figure 1 *; | [X]US6556278 (TANAKA MASASHI [JP], et al) [X] 1-14* paragraph [0260]; figure 33 * |