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Extract from the Register of European Patents

EP About this file: EP1774405

EP1774405 - SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  12.06.2015
Database last updated on 11.09.2024
Most recent event   Tooltip12.06.2015No opposition filed within time limitpublished on 15.07.2015  [2015/29]
Applicant(s)For all designated states
Carl Zeiss SMT GmbH
Rudolf-Eber-Strasse 2
73447 Oberkochen / DE
[2011/10]
Former [2007/16]For all designated states
Carl Zeiss SMT AG
Rudolf-Eber-Strasse 2
73447 Oberkochen / DE
Inventor(s)01 / MENGEL, Markus
Täle 27
89522 Heidenheim / DE
02 / WEGMANN, Ulrich
Erlenweg 5
89551 Königsbronn / DE
03 / EHRMANN, Albrecht
Gewandweg 22
73432 Aalen / DE
04 / EMER, Wolfgang
Hannah-Arendt-Strasse 6
73431 Aalen / DE
05 / CLEMENT, Reiner
Reuttierstrasse 5
73340 Amstetten / DE
06 / MATHIJSSEN, Ludo
Becherlehenstrasse 40
73527 Schwäbisch Gmünd / DE
 [2007/23]
Former [2007/16]01 / MENGEL, Markus
Täle 27
89522 Heidenheim / DE
02 / WEGMANN, Ulrich
Erlenweg 5
89551 Königsbronn / DE
03 / EHRMANN, Albrecht
An der Eichhalde 2
89551 Königsbronn / DE
04 / EMER, Wolfgang
Hannah-Arendt-Strasse 6
73431 Aalen / DE
05 / CLEMENT, Reiner
Reuttierstrasse 5
73340 Amstetten / DE
06 / MATHIJSSEN, Ludo
Siechenberg 1
73529 Schwäbisch Gmünd / DE
Representative(s)Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner mbB
Postfach 10 40 36
70035 Stuttgart / DE
[N/P]
Former [2014/32]Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner
Postfach 10 40 36
70035 Stuttgart / DE
Former [2008/41]Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner
Postfach 10 40 36
70035 Stuttgart / DE
Former [2007/16]Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner
Postfach 10 40 36
70035 Stuttgart / DE
Application number, filing date05754724.202.06.2005
[2007/16]
WO2005EP05918
Priority number, dateUS20040576803P04.06.2004         Original published format: US 576803 P
[2007/16]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2005119368
Date:15.12.2005
Language:EN
[2005/50]
Type: A2 Application without search report 
No.:EP1774405
Date:18.04.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 15.12.2005 takes the place of the publication of the European patent application.
[2007/16]
Type: B1 Patent specification 
No.:EP1774405
Date:06.08.2014
Language:EN
[2014/32]
Search report(s)International search report - published on:EP11.05.2006
ClassificationIPC:G03F7/20
[2007/16]
CPC:
G03F7/70341 (EP,US); G03F7/20 (KR); G01M11/0257 (US);
G01M11/0214 (US); G01M11/0271 (US); G03F7/70591 (EP,US);
G03F7/70716 (EP,US); G03F7/70958 (EP,US); Y10T428/31 (EP,US) (-)
Designated contracting statesDE,   NL [2007/37]
Former [2007/16]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:SYSTEM ZUR MESSUNG DER BILDQUALITÄT EINES OPTISCHEN BILDGEBUNGSSYSTEMS[2007/16]
English:SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM[2007/16]
French:SYSTEME PERMETTANT DE MESURER LA QUALITE D'UNE IMAGE D'UN SYSTEME D'IMAGERIE OPTIQUE[2007/16]
Entry into regional phase22.12.2006National basic fee paid 
22.12.2006Designation fee(s) paid 
22.12.2006Examination fee paid 
Examination procedure22.12.2006Examination requested  [2007/16]
22.03.2007Amendment by applicant (claims and/or description)
24.05.2012Despatch of a communication from the examining division (Time limit: M06)
29.11.2012Reply to a communication from the examining division
05.03.2014Communication of intention to grant the patent
26.06.2014Fee for grant paid
26.06.2014Fee for publishing/printing paid
26.06.2014Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  24.05.2012
Opposition(s)07.05.2015No opposition filed within time limit [2015/29]
Fees paidRenewal fee
14.06.2007Renewal fee patent year 03
12.06.2008Renewal fee patent year 04
16.06.2009Renewal fee patent year 05
29.06.2010Renewal fee patent year 06
22.06.2011Renewal fee patent year 07
27.06.2012Renewal fee patent year 08
20.06.2013Renewal fee patent year 09
25.06.2014Renewal fee patent year 10
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[XA]WO9900689  (NORTHERN EDGE ASSOCIATES INC [CA], et al) [X] 1,3-21,25-30 * abstract * * figures 1-3 * * page 1, line 5 - line 19 * * page 7, line 14 - page 8, line 40 * * page 11, line 24 - page 12, line 4 * * page 14, line 1 - line 17 * * page 20, line 18 - page 21, line 11 * [A] 2,22-24,31;
 [X]EP1420300  (ASML NETHERLANDS BV [NL]) [X] 1,25,31 * abstract * * paragraph [0001] * * paragraph [0029] * * paragraph [0037] *;
 [XA]EP1416327  (ASML NETHERLANDS BV [NL]) [X] 1,25 * abstract * * figures 1-6 * * paragraph [0001] * * paragraph [0023] * * paragraph [0039] - paragraph [0041] * [A] 1;
 [DA]US5973773  (KOBAYASHI NAOYUKI [JP]) [DA] 1,25,31 * abstract * * figure 1 * * column 1, line 12 - line 13 * * column 2, line 31 - line 67 *;
 [A]JP2002071513
 [A]  - PATENT ABSTRACTS OF JAPAN, (20020703), vol. 2002, no. 07, & JP2002071513 A 20020308 (NIKON CORP) [A] 1,25,31 * abstract * * figure 1 *
ExaminationEP0418054
 EP0107331
by applicantUS5769954
 US5973773
 EP0418054
 EP0107331
 DE10261775
    - M.SWITKES; M.ROTHSCHILD, "Immersion Lithography at 157 nm", J.VAC.SCI. TECHNOL. B, (200111), vol. 19, no. 6, page 1FT
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.