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Extract from the Register of European Patents

EP About this file: EP1782455

EP1782455 - IC CHIP AND ITS MANUFACTURING METHOD [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  11.07.2014
Database last updated on 13.09.2024
Most recent event   Tooltip11.07.2014Application deemed to be withdrawnpublished on 13.08.2014  [2014/33]
Applicant(s)For all designated states
Semiconductor Energy Laboratory Co., Ltd.
398, Hase
Atsugi-shi, Kanagawa 243-0036 / JP
[N/P]
Former [2007/19]For all designated states
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, Hase
Atsugi-shi, Kanagawa 243-0036 / JP
Inventor(s)01 / TSURUME, Takuya, SEMICONDUCTOR ENERGY LAB. CO. LTD
398, Hase, Atsugi-shi
Kanagawa 2430036 / JP
02 / DAIRIKI, Koji, SEMICONDUCTOR ENERGY LAB. CO., LTD.
398, Hase, Atsugi-shi
Kanagawa 2430036 / JP
03 / KUSUMOTO, Naoto, SEMICONDUCTOR ENERGY LAB. CO. LTD
398, Hase, Atsugi-shi
Kanagawa 2430036 / JP
 [2007/19]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstrasse 4
80802 München / DE
[N/P]
Former [2007/19]Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
Maximilianstrasse 58
80538 München / DE
Application number, filing date05760110.606.07.2005
[2007/19]
WO2005JP12875
Priority number, dateJP2004020390609.07.2004         Original published format: JP 2004203906
[2007/19]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2006006611
Date:19.01.2006
Language:EN
[2006/03]
Type: A1 Application with search report 
No.:EP1782455
Date:09.05.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 19.01.2006 takes the place of the publication of the European patent application.
[2007/19]
Search report(s)International search report - published on:JP19.01.2006
(Supplementary) European search report - dispatched on:EP07.06.2013
ClassificationIPC:H01L21/02, H01L27/12, H01L21/301, H01L21/822, H01L27/04, H01L21/336, H01L29/786, H01L21/304, G06K19/07, G06K19/077, B32B37/22, B32B38/00, H01L21/67, H01L21/683, H01L23/48, // H01L21/786, H01L27/13
[2013/28]
CPC:
H01L21/67132 (EP,US); H01L21/02 (KR); B32B37/226 (EP,US);
B32B38/0004 (EP,US); H01L21/30 (KR); H01L21/304 (KR);
H01L21/6835 (EP,US); H01L21/6836 (EP,US); H01L24/27 (EP,US);
H01L24/29 (EP,US); H01L24/97 (EP,US); H01L27/1203 (EP,US);
H01L27/1255 (EP,US); H01L27/1266 (EP,US); B32B2305/342 (EP,US);
B32B2457/14 (EP,US); H01L21/786 (EP,US); H01L2221/68313 (EP,US);
H01L2221/68327 (EP,US); H01L2221/68336 (EP,US); H01L2221/6834 (EP,US);
H01L2221/68354 (EP,US); H01L2221/68363 (EP,US); H01L2221/68377 (EP,US);
H01L2221/68381 (EP,US); H01L2224/83191 (EP,US); H01L2924/01006 (EP,US);
H01L2924/01015 (EP,US); H01L2924/01033 (EP,US); H01L2924/01049 (EP,US);
H01L2924/0105 (EP,US); H01L2924/01079 (EP,US); H01L2924/01082 (EP,US);
H01L2924/14 (EP,US); H01L2924/15788 (EP,US); H01L2924/19043 (EP,US) (-)
C-Set:
H01L2924/15788, H01L2924/00 (EP,US)
Former IPC [2007/19]H01L21/02, H01L27/12, H01L21/301, H01L21/822, H01L27/04, H01L21/336, H01L29/786, H01L21/304, G06K19/07, G06K19/077
Designated contracting statesDE,   FI,   FR,   GB,   NL [2007/42]
Former [2007/19]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:IC-CHIP UND VERFAHREN ZU SEINER HERSTELLUNG[2007/19]
English:IC CHIP AND ITS MANUFACTURING METHOD[2007/19]
French:PUCE DE CI ET METHODE DE FABRICATION DE CELLE-CI[2007/19]
Entry into regional phase09.01.2007National basic fee paid 
09.01.2007Search fee paid 
09.01.2007Designation fee(s) paid 
09.01.2007Examination fee paid 
Examination procedure09.01.2007Examination requested  [2007/19]
08.01.2014Application deemed to be withdrawn, date of legal effect  [2014/33]
24.02.2014Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2014/33]
Fees paidRenewal fee
30.07.2007Renewal fee patent year 03
30.07.2008Renewal fee patent year 04
10.07.2009Renewal fee patent year 05
14.07.2010Renewal fee patent year 06
12.07.2011Renewal fee patent year 07
13.07.2012Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.07.201309   M06   Not yet paid
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Documents cited:Search[Y]US5972154  (KONYA TOMONORI [JP]) [Y] 1,9-12 * abstract * * figure 2 * * column 1, line 14 - column 2, line 2 *;
 [Y]JP2000321601  (SONY CORP) [Y] 1,9-12 * abstract * * figures 1-8 ** paragraphs [0031] - [0049] *;
 [X]US2003027369  (YAMAZAKI SHUNPEI [JP]) [X] 13 * figure 5C * * paragraphs [0094] - [0109] *;
 [Y]US2003048404  (SOHN SE IL [KR], et al) [Y] 1,9-12 * paragraphs [0006] - [0008] * * figure 4E *;
 [E]EP1635391  (SEMICONDUCTOR ENERGY LAB [JP]) [E] 1,9-12 * figure 9 * * paragraphs [0083] - [0098] *
International search[Y]JPH1120360  (SEIKO EPSON CORP);
 [Y]JPH11212116  (HITACHI LTD);
 [Y]JP2004094492  (KONICA MINOLTA HOLDINGS INC)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.