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EP1930775
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EP About this file: EP1930775
| EP1930775 - RINSING LIQUID FOR LITHOGRAPHY AND METHOD FOR RESIST PATTERN FORMATION [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 20.02.2009 Database last updated on 02.11.2024 | Most recent event Tooltip | 20.02.2009 | Withdrawal of application | published on 25.03.2009 [2009/13] | Applicant(s) | For all designated states TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | [2008/24] | Inventor(s) | 01 /
SAWADA, Yoshihiro; c/o TOKYO OHKA KOGYO CO. LTD., 150, Nakamaruko, Nakahara-ku, Kawasaki-shi Kana gawa; 2110012 / JP | 02 /
WAKIYA, Kazumasa; c/o TOKYO OHKA KOGYO CO. LTD., 150, Nakamaruko, Nakahara-ku, Kawasaki-shi Kanag awa; 2110012 / JP | 03 /
KOSHIYAMA, Jun; c/o TOKYO OHKA KOGYO CO. LTD., 150, Nakamaruko, Nakahara-ku, Kawasaki-shi Kanagaw a; 2110012 / JP | 04 /
MIYAMOTO, Atsushi; c/o TOKYO OHKA KOGYO CO. LTD., 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kana gawa; 2110012 / JP | 05 /
TAJIMA, Hidekazu; c/o TOKYO OHKA KOGYO CO. LTD., 150, Nakamaruko, Nakahara-ku, Kawasaki-shi Kanag awa; 2110012 / JP | [2008/24] | Representative(s) | Hayes, Adrian Chetwynd Boult Wade Tennant Verulam Gardens 70 Gray's Inn Road London WC1X 8BT / GB | [N/P] |
| Former [2008/24] | Hayes, Adrian Chetwynd Boult Wade Tennant, Verulam Gardens 70 Gray's Inn Road London WC1X 8BT / GB | Application number, filing date | 05781041.8 | 29.08.2005 | [2008/24] | WO2005JP15630 | Priority number, date | JP20040254940 | 01.09.2004 Original published format: JP 2004254940 | [2008/24] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2006025303 | Date: | 09.03.2006 | Language: | EN | [2006/10] | Type: | A1 Application with search report | No.: | EP1930775 | Date: | 11.06.2008 | Language: | EN | The application published by WIPO in one of the EPO official languages on 09.03.2006 takes the place of the publication of the European patent application. | [2008/24] | Search report(s) | International search report - published on: | JP | 09.03.2006 | Classification | IPC: | G03F7/32, H01L21/027 | [2008/24] | CPC: |
H01L21/0273 (EP,US);
G03F7/32 (EP,KR,US)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR [2008/24] | Title | German: | SPÜLFLÜSSIGKEIT FÜR DIE LITHOGRAPHIE UND VERFAHREN ZUR ERZEUGUNG EINER RESISTSTRUKTUR | [2008/24] | English: | RINSING LIQUID FOR LITHOGRAPHY AND METHOD FOR RESIST PATTERN FORMATION | [2008/24] | French: | LIQUIDE DE RINÇAGE POUR LITHOGRAPHIE ET PROCÉDÉ DE FORMATION D"UN MOTIF RÉSISTANT | [2008/24] | Entry into regional phase | 28.03.2007 | Translation filed | 28.03.2007 | National basic fee paid | 28.03.2007 | Search fee paid | 28.03.2007 | Designation fee(s) paid | 28.03.2007 | Examination fee paid | Examination procedure | 28.03.2007 | Examination requested [2008/24] | 14.05.2008 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GB, GR, HU, IE, IS, LT, LU, LV, MC, PL, PT, RO, SE, SI, SK, TR | 04.02.2009 | Application withdrawn by applicant [2009/13] | Fees paid | Renewal fee | 28.08.2007 | Renewal fee patent year 03 | 25.03.2008 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [Y]JPH11295902 (KAO CORP); | [Y]JPH07335519 (HITACHI LTD); | [Y]JPH07142349 (MITSUBISHI ELECTRIC CORP); | [Y]JP2003107744 (KAO CORP); | [Y]JP2004184648 (CLARIANT JAPAN KK, et al); | [Y]JP2000250229 (NEC CORP); | [Y]JP2002174908 (NIKON CORP) |