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Extract from the Register of European Patents

EP About this file: EP1808407

EP1808407 - METHOD OF PATTERNING SELF-ORGANIZING MATERIAL, PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL AND METHOD OF PRODUCING THE SAME, AND PHOSOMASK USING PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  06.11.2015
Database last updated on 28.05.2024
Most recent event   Tooltip06.11.2015No opposition filed within time limitpublished on 09.12.2015  [2015/50]
Applicant(s)For all designated states
Japan Science and Technology Agency
1-8, Honcho 4-chome Kawaguchi-shi
Saitama 332-0012 / JP
[2007/29]
Inventor(s)01 / OHTAKE, Toshihito
6-21-7-106, Onoharahigashi Mino-shi
Osaka 562-0031 / JP
02 / NAKAMATSU, Ken-ichiro
3-25-1-C207, Koto, Shingu-cho
Tatsuno-shi Hyogo 679-5165 / JP
03 / MATSUI, Shinji
7-5-23-2, Tsujii Himeji-shi
Hyogo 678-0083 / JP
04 / TABATA, Hitoshi
5-1-603, Kamiyamada Suita-shi
Osaka 565-0872 / JP
05 / KAWAI, Tomoji
5-26-15-615, Onoharahigashi Mino-shi
Osaka 562-0031 / JP
 [2007/46]
Former [2007/29]01 / OHTAKE, Toshihito
6-21-7-106, Onoharahigashi Mino-shi
Osaka 562-0031 / JP
02 / NAKAMATSU, Ken-ichiro
1-163-501, Yamate Aioi-shi
Hyogo 678-0001 / JP
03 / MATSUI, Shinji
7-5-23-2, Tsujii Himeji-shi
Hyogo 678-0083 / JP
04 / TABATA, Hitoshi
5-1-603, Kamiyamada Suita-shi
Osaka 565-0872 / JP
05 / KAWAI, Tomoji
5-26-15-615, Onoharahigashi Mino-shi
Osaka 562-0031 / JP
Representative(s)Graf von Stosch, Andreas, et al
Graf von Stosch
Patentanwaltsgesellschaft mbH
Prinzregentenstrasse 22
80538 München / DE
[N/P]
Former [2009/29]Graf von Stosch, Andreas, et al
Graf von Stosch Patentanwaltsgesellschaft mbH Prinzregentenstrasse 22
80538 München / DE
Former [2008/52]Graf von Stosch, Andreas, et al
Graf von Stosch Patentanwaltsgesellschaft mbH Prinzregentenstrasse 22
80538 München / DE
Former [2008/40]Graf von Stosch, Andreas, et al
Bosch Graf von Stosch Jehle Patentanwaltsgesellschaft mbH Prinzregentenstrasse 22
80538 München / DE
Former [2007/29]Graf von Stosch, Andreas, et al
Bosch, Graf v. Stosch, Jehle Patentanwaltsgesellschaft mbH Flüggenstrasse 13
D-80639 München / DE
Application number, filing date05788374.629.09.2005
[2007/29]
WO2005JP17930
Priority number, dateJP2004028754930.09.2004         Original published format: JP 2004287549
[2007/29]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2006035859
Date:06.04.2006
Language:EN
[2006/14]
Type: A1 Application with search report 
No.:EP1808407
Date:18.07.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 06.04.2006 takes the place of the publication of the European patent application.
[2007/29]
Type: B1 Patent specification 
No.:EP1808407
Date:31.12.2014
Language:EN
[2015/01]
Search report(s)International search report - published on:JP06.04.2006
(Supplementary) European search report - dispatched on:EP23.11.2010
ClassificationIPC:B82B3/00, B82B1/00, C12M1/00, C12N15/09
[2014/32]
CPC:
B82Y10/00 (EP,US); G03F7/20 (US); B82Y40/00 (EP,US);
G03F7/0002 (EP,US); H10K71/611 (EP,US); G01N21/553 (EP,US);
G01N21/554 (EP,US); H10K71/821 (EP,US); Y10T428/24802 (EP,US) (-)
Former IPC [2007/29]B82B3/00, B82B1/00, G03F1/08, C12M1/00, C12N15/09
Designated contracting statesDE,   FR,   GB [2008/02]
Former [2007/29]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:VERFAHREN ZUM STRUKTURIEREN VON SELBSTORGANISIERENDEM MATERIAL, STRUKTURIERTES SUBSTRAT AUS SELBSTORGANISIERENDEM MATERIAL UND VERFAHREN ZU DESSEN HERSTELLUNG SOWIE DAS STRUKTURIERTE SUBSTRAT AUS SELBSTORGANISIERENDEM MATERIAL VERWENDENDE PHOTOMASKE[2007/29]
English:METHOD OF PATTERNING SELF-ORGANIZING MATERIAL, PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL AND METHOD OF PRODUCING THE SAME, AND PHOSOMASK USING PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL[2007/29]
French:PROCÉDÉ DE MISE EN MOTIFS DE MATÉRIAU AUTO-ORGANISATEUR, SUBSTRAT MIS EN MOTIFS DE MATÉRIAU AUTO-ORGANISATEUR ET PROCÉDÉ DE FABRICATION DUDIT SUBSTRAT ET PHOTOMASQUE UTILISANT LE SUBSTRAT MIS EN MOTIFS DE MATÉRIAU AUTO-ORGANISATEUR[2007/29]
Entry into regional phase27.04.2007Translation filed 
27.04.2007National basic fee paid 
27.04.2007Search fee paid 
27.04.2007Designation fee(s) paid 
27.04.2007Examination fee paid 
Examination procedure27.04.2007Examination requested  [2007/29]
29.04.2011Amendment by applicant (claims and/or description)
07.09.2011Despatch of a communication from the examining division (Time limit: M04)
04.01.2012Reply to a communication from the examining division
11.09.2013Despatch of a communication from the examining division (Time limit: M04)
10.01.2014Reply to a communication from the examining division
31.07.2014Communication of intention to grant the patent
21.11.2014Fee for grant paid
21.11.2014Fee for publishing/printing paid
21.11.2014Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  07.09.2011
Opposition(s)01.10.2015No opposition filed within time limit [2015/50]
Fees paidRenewal fee
12.09.2007Renewal fee patent year 03
15.09.2008Renewal fee patent year 04
11.09.2009Renewal fee patent year 05
14.09.2010Renewal fee patent year 06
29.09.2011Renewal fee patent year 07
12.09.2012Renewal fee patent year 08
12.09.2013Renewal fee patent year 09
12.09.2014Renewal fee patent year 10
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US6652808  (HELLER MICHAEL J [US], et al) [A] 1,2,4-6,8,10,12,14-19* column 6 - column 18; figures 2-4 *;
 [XI]WO2004055920  (PLASTIC LOGIC LTD [GB], et al) [X] 1,5,9 * page 5, line 12 - page 8, line 13; figure 1 * [I] 2-4,6-8,10-19
International search[A]  - SAIHITO OTAKE, "Nanoimprint o Riyo Shita Jiko Soshikika ni yoru DNA Nanopatterning", DA1 51 KAI OYO BUTSURIGAKU KANKEI RENGO KOENKAI KOEN YOKOSHU, (20040328), vol. 51, no. 3, page 1503, 30P-ZQ-1, XP002998284
 [A]  - A. PEPIN, "Nanoimprint lithography for the fabrication of DNA electrophoresis chips", MICROELECTRONIC ENGINEERING, (200207), vol. 61-62, pages 927 - 932, XP004360635

DOI:   http://dx.doi.org/10.1016/S0167-9317(02)00511-7
 [A]  - IKUHIKO YAMADA, "DNA o Template ni Mochiita Kinzoku Nano Biryushi no Hairetsu", DAI 51 KAI OYO BUTSURIGAKU KANKEI RENGO KOENKAI KOEN YOKOSHU, (20040328), vol. 51, no. 3, page 1503, 30P-ZQ-2, XP002998285
 [A]  - KAORU KOJIMA, "DNA o Template to shita Kin Particle no Ichijigen Hairetsu", DAI 65 KAI OYO BUTSURI GAKKAI GAKUJUTSU KOENKAI KOEN YOKOSHU, (20040901), vol. 65, no. 3, page 1205, 2P-ZT-17, XP002998286
Examination   - SAIHITO OTAKE, "Nanoimprint o Riyo Shita Jiko Soshikika ni yoru DNA Nanopatterning", OYO BUTSURIGAKU KANKEI RENGO KOENKAI KOEN YOKUSHU, XX, XX, (20040328), vol. 51, no. 3, pages 1503,30P - ZQ, XP002998284
by applicant   - L. R. HARRIOT.; S. D. BERGER.; C. BIDDICK.; M. I. BLAKEY.; S. W. BOWLER; K. BRADY.; R. M. CAMARDA.; W. F. CONNELLY.; A. CRORKEN.;, J. VAC. SCI. TECHNOL., (1996), vol. B14, no. 6, pages 3825 - 3828
    - T. YOSHIMURA.; H. SHIRAISHI.; J. YAMAMOTO.; S. OKAZAKI., APPL. PHYS. LETT., (1993), pages 764 - 766
    - J. YAMAMOTO.; S. UCHINO.; T. HATTORI.; T. YOSHIMURA.; F. MURAI., JPN. J. APPL. PHYS., (1996), pages 6511 - 6516
    - G. GROSS.; R. KAESMAIER., J. VAC. SCI. TECHNOL., (1998), vol. B16, no. 6
    - JUN TANIGUCHI; IWAO MIYAMOTO; MASANORI FURUMURO; SHINJI MATSUI, JOURNAL OF THE JAPAN SOCIETY FOR ABRASIVE TECHNOLOGY, (2002), vol. 46, no. 6, pages 282 - 285
    - TOSHIHITO OTAKE; KENICHIRO NAKAMATSU; SHINJI MATSUI; HITOSHI TABATA; TOMOJI KAAI, "The spring meeting of Jpn. Soci. of Appl. Phys.", DIGEST OF THE SPRING MEETING IN 2004, (20040330), page 1503
    - M. UEDA.; H. IWASAKI.; O. KUROSAWA.; M. WASHIZU., JPN. J. APPL. PHYS., (1999), pages 2118 - 2119
    - D.I.C.WANG; G.M.WHITESIDES; D.E.INGBER, SCIENCE, (1994), vol. 264
    - A. KUMAR.; H. A. BIEBUYCK.; G .WHITESIDES, LANGMUIR, (1994), pages 1498 - 1511
    - K. KEREN; R.S.BERMAN; E.BRAUN, NANO LETT., (2004), page 323
    - J.RICHTER; M.MERTIG; W. POMPE, APPL. PHYS. LETT., (2001), page 536
    - E.BRAUN; Y.EICHEN; U.SIVAN, NATURE, (1998), page 775
    - R.SEIDEL; M.MERTIG; W. POMPE, SURF. INTERFACE ANAL., (2002), page 151
    - S.O.KELLY; J.K.BARTON; N.M.JACKSON; L.D.MCPHERSON; A.B.POTTER; E.M.SPAIN; M.J.ALLEN; M.G.HILL, LANGMUIR, (1998), page 6781
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.