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Extract from the Register of European Patents

EP About this file: EP1821336

EP1821336 - LOADING METHOD, EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD [Right-click to bookmark this link]
Former [2007/34]POSITION MEASUREMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT METHOD, LOADING METHOD, EXPOSURE METHOD, EXOPOSURE APPARATUS, AND DEVICE PRODUCTION METHOD
[2018/49]
StatusNo opposition filed within time limit
Status updated on  21.02.2020
Database last updated on 24.07.2024
FormerThe patent has been granted
Status updated on  15.03.2019
FormerGrant of patent is intended
Status updated on  29.11.2018
FormerExamination is in progress
Status updated on  07.06.2017
Most recent event   Tooltip16.07.2021Lapse of the patent in a contracting state
New state(s): HU
published on 18.08.2021  [2021/33]
Applicant(s)For all designated states
Nikon Corporation
15-3, Konan 2-chome
Minato-ku
Tokyo 108-6290 / JP
[2019/16]
Former [2015/36]For all designated states
Nikon Corporation
15-3, Konan 2-chome
Minato-ku
Tokyo 108-6290 / JP
Former [2010/30]For all designated states
NIKON CORPORATION
12-1, Yurakucho 1-chome Chiyoda-ku
Tokyo 100-8331 / JP
Former [2007/34]For all designated states
NIKON CORPORATION
Fuji Building, 2-3 Marunouchi 3-chome, Chiyoda-ku
Tokyo 100-8831 / JP
Inventor(s)01 / YASUDA, Masahiko c/o NIKON CORPORATION, 2-3
Marunouchi 3-chome, Chiyoda-ku, Tokyo;
1008331 / JP
02 / SUGIHARA, Taro c/o NIKON CORPORATION
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo;
1008331 / JP
 [2007/34]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2019/16]
Former [2008/34]Hooiveld, Arjen Jan Winfried
Arnold & Siedsma Sweelinckplein 1
2517 GK Den Haag / NL
Former [2007/34]Hooiveld, Arjen Jan Winfried
Arnold & Siedsma, Sweelinckplein 1
2517 GK Den Haag / NL
Application number, filing date05807063.218.11.2005
[2007/34]
WO2005JP21214
Priority number, dateJP2004033505018.11.2004         Original published format: JP 2004335050
[2007/34]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2006054682
Date:26.05.2006
Language:EN
[2006/21]
Type: A1 Application with search report 
No.:EP1821336
Date:22.08.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 26.05.2006 takes the place of the publication of the European patent application.
[2007/34]
Type: B1 Patent specification 
No.:EP1821336
Date:17.04.2019
Language:EN
[2019/16]
Search report(s)International search report - published on:JP26.05.2006
(Supplementary) European search report - dispatched on:EP09.02.2011
ClassificationIPC:G03F9/00, H01L21/027, G01B11/00, G03F7/20, H01L21/68
[2018/49]
CPC:
G03F7/70341 (EP,KR,US); G03F7/70775 (EP,KR,US); G03F7/2041 (KR);
G03F7/70691 (EP,KR,US); G03F7/707 (EP,KR,US); G03F7/70725 (EP,US);
G03F7/70975 (KR,US); G03F9/7011 (EP,KR,US); G03F9/7088 (EP,KR,US);
Y10T29/49002 (EP,US) (-)
Former IPC [2007/34]H01L21/027, G01B11/00, G03F7/20, H01L21/68
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2019/16]
Former [2007/34]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:LADEVERFAHREN, BELICHTUNGSVERFAHREN UND VORRICHTUNGSHERSTELLUNGSVERFAHREN[2018/49]
English:LOADING METHOD, EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD[2018/49]
French:PROCÉDÉ DE CHARGEMENT, PROCÉDÉ D'EXPOSITION, APPAREIL ET PROCÉDÉ DE FABRICATION DE DISPOSITIF[2018/49]
Former [2007/34]POSITIONSMESSVERFAHREN, POSITIONSSTEUERVERFAHREN, MESSVERFAHREN, LADEVERFAHREN, BELICHTUNGSVERFAHREN, BELICHTUNGSVORRICHTUNG UND BAUELEMENTE-HERSTELLUNGSVERFAHREN
Former [2007/34]POSITION MEASUREMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT METHOD, LOADING METHOD, EXPOSURE METHOD, EXOPOSURE APPARATUS, AND DEVICE PRODUCTION METHOD
Former [2007/34]PROCÉDÉ DE MESURE DE POSITION, PROCÉDÉ DE CONTRÔLE DE POSITION, PROCÉDÉ DE MESURE, PROCÉDÉ DE CHARGEMENT, PROCÉDÉ D EXPOSITION, APPAREIL D EXPOSITION ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
Entry into regional phase12.06.2007Translation filed 
12.06.2007National basic fee paid 
12.06.2007Search fee paid 
12.06.2007Designation fee(s) paid 
12.06.2007Examination fee paid 
Examination procedure12.06.2007Examination requested  [2007/34]
15.08.2011Amendment by applicant (claims and/or description)
25.05.2012Despatch of a communication from the examining division (Time limit: M06)
09.01.2013Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
18.03.2013Reply to a communication from the examining division
31.07.2014Despatch of a communication from the examining division (Time limit: M04)
24.11.2014Reply to a communication from the examining division
30.05.2017Despatch of a communication from the examining division (Time limit: M04)
03.08.2017Reply to a communication from the examining division
23.03.2018Despatch of a communication from the examining division (Time limit: M04)
02.07.2018Reply to a communication from the examining division
30.11.2018Communication of intention to grant the patent
28.02.2019Fee for grant paid
28.02.2019Fee for publishing/printing paid
28.02.2019Receipt of the translation of the claim(s)
Divisional application(s)EP14160957.8  / EP2772803
EP14161585.6  / EP2772804
EP18157586.1  / EP3346486
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  25.05.2012
Opposition(s)20.01.2020No opposition filed within time limit [2020/13]
Request for further processing for:The application is deemed to be withdrawn due to failure to reply to the examination report
18.03.2013Request for further processing filed
18.03.2013Full payment received (date of receipt of payment)
Request granted
30.07.2013Decision despatched
Fees paidRenewal fee
12.06.2007Renewal fee patent year 03
28.11.2008Renewal fee patent year 04
26.11.2009Renewal fee patent year 05
25.11.2010Renewal fee patent year 06
29.11.2011Renewal fee patent year 07
28.11.2012Renewal fee patent year 08
28.11.2013Renewal fee patent year 09
25.11.2014Renewal fee patent year 10
24.11.2015Renewal fee patent year 11
10.11.2016Renewal fee patent year 12
13.11.2017Renewal fee patent year 13
14.11.2018Renewal fee patent year 14
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Lapses during opposition  TooltipHU18.11.2005
AT17.04.2019
CY17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
MC17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
GB18.11.2019
IE18.11.2019
LU18.11.2019
BE30.11.2019
CH30.11.2019
FR30.11.2019
LI30.11.2019
NL01.12.2019
[2021/33]
Former [2021/26]AT17.04.2019
CY17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
MC17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
GB18.11.2019
IE18.11.2019
LU18.11.2019
BE30.11.2019
CH30.11.2019
FR30.11.2019
LI30.11.2019
NL01.12.2019
Former [2020/51]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
MC17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
GB18.11.2019
IE18.11.2019
LU18.11.2019
BE30.11.2019
CH30.11.2019
FR30.11.2019
LI30.11.2019
NL01.12.2019
Former [2020/48]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
MC17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
GB18.11.2019
IE18.11.2019
LU18.11.2019
CH30.11.2019
FR30.11.2019
LI30.11.2019
NL01.12.2019
Former [2020/46]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
MC17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
IE18.11.2019
LU18.11.2019
CH30.11.2019
LI30.11.2019
NL01.12.2019
Former [2020/45]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
MC17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
LU18.11.2019
CH30.11.2019
LI30.11.2019
NL01.12.2019
Former [2020/36]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
MC17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
LU18.11.2019
CH30.11.2019
LI30.11.2019
Former [2020/35]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
LU18.11.2019
CH30.11.2019
LI30.11.2019
Former [2020/34]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
CH30.11.2019
LI30.11.2019
Former [2020/26]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SI17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
Former [2020/17]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SK17.04.2019
TR17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
Former [2020/12]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
IT17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SK17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
Former [2020/11]AT17.04.2019
CZ17.04.2019
DK17.04.2019
EE17.04.2019
ES17.04.2019
FI17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
SK17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
Former [2020/10]AT17.04.2019
CZ17.04.2019
DK17.04.2019
ES17.04.2019
FI17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
RO17.04.2019
SE17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
Former [2020/09]CZ17.04.2019
DK17.04.2019
ES17.04.2019
FI17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
SE17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
Former [2020/04]ES17.04.2019
FI17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
SE17.04.2019
BG17.07.2019
GR18.07.2019
IS17.08.2019
PT19.08.2019
Former [2019/52]ES17.04.2019
FI17.04.2019
LT17.04.2019
LV17.04.2019
PL17.04.2019
SE17.04.2019
BG17.07.2019
GR18.07.2019
PT19.08.2019
Former [2019/51]ES17.04.2019
FI17.04.2019
LT17.04.2019
LV17.04.2019
SE17.04.2019
BG17.07.2019
GR18.07.2019
PT19.08.2019
Former [2019/48]ES17.04.2019
FI17.04.2019
LT17.04.2019
SE17.04.2019
PT19.08.2019
Former [2019/47]ES17.04.2019
FI17.04.2019
LT17.04.2019
Documents cited:Search[I]WO2004086468  (NIPPON KOGAKU KK [JP], et al) [I] 1-57 * page 1, paragraphs 1, 2 * * page 15, paragraph 3 - page 16, paragraph 1 * * figures 1, 20 *;
 EP1598855  [ ] (NIKON CORP [JP]) [ ] * paragraphs [0001] , [ 0002] , [ 0046] , [ 0047] ** figures 1, 20 *
International search[X]WO2004053955  (NIKON CORP [JP], et al);
 [X]JP2004207710  (NIKON CORP);
 [A]JP2004207696  (NIKON CORP);
 [A]JP2004259966  (NIKON CORP)
ExaminationUS5194743
 US6225012
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.