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Extract from the Register of European Patents

EP About this file: EP1828828

EP1828828 - LASER ARRANGEMENT AND METHOD FOR PRODUCING A LASER ARRANGEMENT [Right-click to bookmark this link]
Former [2007/36]LENS, LASER ARRANGEMENT AND METHOD FOR PRODUCING A LASER ARRANGEMENT
[2010/47]
StatusNo opposition filed within time limit
Status updated on  06.01.2012
Database last updated on 29.07.2024
Most recent event   Tooltip06.01.2012No opposition filed within time limitpublished on 08.02.2012  [2012/06]
Applicant(s)For all designated states
OSRAM Opto Semiconductors GmbH
Leibnizstrasse 4
93055 Regensburg / DE
[2008/13]
Former [2008/12]For all designated states
Osram Opto Semiconductors GmbH
Leibnitzstrasse 4
93055 Regensburg / DE
Former [2007/36]For all designated states
Osram Opto Semiconductors GmbH
Wernerwerkstrasse 2
93049 Regensburg / DE
Inventor(s)01 / STEEGMÜLLER, Ulrich
Greflingerstrasse 7
93055 Regensburg / DE
02 / SINGER, Frank
Telemann Strasse 104
93128 Regenstauf / DE
03 / WEISS, Guido
Seifensiedergasse 4a
93059 Regensburg / DE
 [2007/36]
Representative(s)Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH
Schlossschmidstrasse 5
80639 München / DE
[N/P]
Former [2008/30]Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH Ridlerstrasse 55
80339 München / DE
Former [2007/36]Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH Ridlerstrasse 55
80339 München / DE
Application number, filing date05849666.212.12.2005
[2007/36]
WO2005DE02235
Priority number, dateDE2004106157621.12.2004         Original published format: DE102004061576
DE2005100605210.02.2005         Original published format: DE102005006052
[2007/36]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2006066543
Date:29.06.2006
Language:DE
[2006/26]
Type: A1 Application with search report 
No.:EP1828828
Date:05.09.2007
Language:DE
The application published by WIPO in one of the EPO official languages on 29.06.2006 takes the place of the publication of the European patent application.
[2007/36]
Type: B1 Patent specification 
No.:EP1828828
Date:02.03.2011
Language:DE
[2011/09]
Search report(s)International search report - published on:EP29.06.2006
ClassificationIPC:G02B6/42, G02B3/00
[2007/36]
CPC:
G02B3/04 (EP,US); G02B6/4206 (EP,US); G02B7/028 (EP,US);
H01S5/0232 (EP,US); H01S5/005 (EP,US); H01S5/02253 (EP,US);
H01S5/0234 (EP,US); H01S5/0237 (EP,US); H01S5/02469 (EP,US);
H01S5/02492 (EP,US); Y10T29/49002 (EP,US) (-)
Designated contracting statesDE [2007/40]
Former [2007/36]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:LASERANORDNUNG UND VERFAHREN ZUR HERSTELLUNG EINER LASERANORDNUNG[2010/47]
English:LASER ARRANGEMENT AND METHOD FOR PRODUCING A LASER ARRANGEMENT[2010/47]
French:ENSEMBLE LASER ET PROCEDE DE FABRICATION DUDIT ENSEMBLE LASER[2010/47]
Former [2007/36]LINSE, LASERANORDNUNG UND VERFAHREN ZUR HERSTELLUNG EINER LASERANORDNUNG
Former [2007/36]LENS, LASER ARRANGEMENT AND METHOD FOR PRODUCING A LASER ARRANGEMENT
Former [2007/36]LENTILLE, ENSEMBLE LASER ET PROCEDE DE FABRICATION DUDIT ENSEMBLE LASER
Entry into regional phase09.07.2007National basic fee paid 
09.07.2007Designation fee(s) paid 
09.07.2007Examination fee paid 
Examination procedure09.07.2007Examination requested  [2007/36]
14.01.2008Despatch of a communication from the examining division (Time limit: M04)
20.05.2008Reply to a communication from the examining division
06.07.2009Despatch of a communication from the examining division (Time limit: M04)
29.10.2009Reply to a communication from the examining division
02.11.2010Cancellation of oral proceeding that was planned for 30.11.2010
16.11.2010Communication of intention to grant the patent
30.11.2010Date of oral proceedings (cancelled)
14.01.2011Fee for grant paid
14.01.2011Fee for publishing/printing paid
Opposition(s)05.12.2011No opposition filed within time limit [2012/06]
Fees paidRenewal fee
24.12.2007Renewal fee patent year 03
24.12.2008Renewal fee patent year 04
22.12.2009Renewal fee patent year 05
22.12.2010Renewal fee patent year 06
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[DA]US4830454  (KARSTENSEN HOLGER [DE]) [DA] 1* column 2, line 28 *;
 [I]DE19527026  (SIEMENS AG [DE]) [I] 1-21 * column 2, line 1 - line 15; figure 1a * * column 3, line 5 - line 8 * * column 3, line 15 - line 16 *;
 [X]US5705025  (DIETRICH RALF [DE], et al) [X] 1-21 * column 3 *;
 [A]US5757830  (LIAU ZONG-LONG [US], et al) [A] 12 * column 4, line 60 - line 62 *;
 [X]US2001026658  (ALTHAUS HANS-LUDWIG [DE], et al) [X] 1-21 * paragraph [0024]; figure 2 *;
 [I]DE10142010  (OSRAM OPTO SEMICONDUCTORS GMBH [DE]) [I] 1-21 * paragraph [0021] - paragraph [0023] * * paragraph [0039] * * paragraph [0058] - paragraph [0063]; figure 4 *;
 [X]EP1460456  (LUCENT TECHNOLOGIES INC [US]) [X] 1-21 * paragraph [0044]; figures 3,4 * * column 10, line 55 * * paragraph [0047] *;
 [XI]  - STRZELECKA E M ET AL, "Fabrication of refractive microlenses in semiconductors by mask shape transfer in reactive ion etching", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, (199702), vol. 35, no. 1, ISSN 0167-9317, pages 385 - 388, XP004054083 [X] 1,2,4,5,11 * page 386, column L, line 35 - line 36 * * page 386, column R, line 1 - line 9 * * figure 3 * * page 388, column L, line 1 - line 6; table 1 * [I] 3,6-10,12-21

DOI:   http://dx.doi.org/10.1016/S0167-9317(96)00206-7
 [X]  - MCINTYRE K J ET AL, "HIGH-NA, ANAMORPHIC OR ASPHERIC MICROLENSES FOR TELECOMMUNICATIONS AND DATA STORAGE", TRENDS IN OPTICS AND PHOTONICS. DIFFRACTIVE OPTICS AND MICRO-OPTICS. TECHNICAL DIGEST. POSTCONFERENCE EDITION, (20000618), vol. 41, pages 278 - 280, XP001120385 [X] 1-21 * the whole document *
 [A]  - NEMOTO S, "TRANSFORMATION OF WAIST PARAMETERS OF A GAUSSIAN BEAM BY A THICK LENS", APPLIED OPTICS, OSA, OPTICAL SOCIETY OF AMERICA, WASHINGTON, DC, US, (19900220), vol. 29, no. 6, ISSN 0003-6935, pages 809 - 816, XP000101334 [A] 1 * page 813, column L, paragraph 1; figures 9,10 *

DOI:   http://dx.doi.org/10.1364/AO.29.000809
 [I]  - LIAU Z L ET AL, "SIMPLE COMPACT DIODE-LASER/MICROLENS PACKAGING", IEEE JOURNAL OF QUANTUM ELECTRONICS, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, (199703), vol. 33, no. 3, ISSN 0018-9197, pages 457 - 461, XP000680490 [I] 1-21 * the whole document *

DOI:   http://dx.doi.org/10.1109/3.556015
 [A]  - LIAU Z L ET AL, "ACCURATE FABRICATION OF ANAMORPHIC MICROLENSES AND EFFICIENT COLLIMATION OF TAPERED UNSTABLE-RESONATOR DIODE LASERS", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, (19940620), vol. 64, no. 25, ISSN 0003-6951, pages 3368 - 3370, XP000454590 [A] 1-7 * figure 3 *

DOI:   http://dx.doi.org/10.1063/1.111277
ExaminationUS5963577
by applicantUS4830454
 DE19527026
 US5757830
 US5963577
 DE10142010
    - "Fabrication of refractive microlenses in semiconductors by mask shape transfer in reactive ion etching", STRZELECKA E. M. ET AL., Microelectronic Engineering, ELSEVIER PUBLISHERS BV., (199702), vol. 35, pages 385 - 388
    - LIAU Z. L. ET AL., "Simple Compact Diode-Laser/Microlens Packaging", IEEE JOURNAL OF QUANTUM ELECTRONICS, (199703), vol. 33, no. 3, pages 457 - 461
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.